Patents by Inventor Yan-Ru WU

Yan-Ru WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240168373
    Abstract: A photoresist composition includes a mixture. The mixture includes a first photosensitive material and a second photosensitive material. The first photosensitive material is a 6-Sn oxide cluster, a 12-Sn oxide cluster or a combination thereof. The second photosensitive material has a composition being different from a composition of the first photosensitive material.
    Type: Application
    Filed: June 13, 2023
    Publication date: May 23, 2024
    Applicants: Taiwan Semiconductor Manufacturing Company, Ltd., National Tsing Hua University
    Inventors: Jui-Hsiung LIU, Tsai-Sheng GAU, Burn Jeng LIN, Yan-Ru WU, Ting-An LIN, Han-Tsung TSAI, Po-Hsiung CHEN