Patents by Inventor Yang-Chih Hsueh

Yang-Chih Hsueh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250149497
    Abstract: A bonding tool for bonding semiconductor dies to a semiconductor wafer is provided. The bonding tool includes a wafer chuck, an edge support, a hard plate, and a buffer layer. The wafer chuck carries the semiconductor wafer and the semiconductor dies placed on the semiconductor wafer. The edge support is disposed on the wafer chuck, the semiconductor wafer and the semiconductor dies are laterally surrounded by the edge support, and a top surface of the edge support substantially levels with surfaces of the semiconductor dies. The hard plate is movably disposed over the semiconductor dies, the edge support and the wafer chuck. The buffer layer is disposed on a bottom surface of the hard plate, and the buffer layer is in contact with the top surface of the edge support and the semiconductor dies when the hard plate moves towards the edge support.
    Type: Application
    Filed: November 8, 2023
    Publication date: May 8, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ming-Tsu Chung, Yung-Chi Lin, Yan-Zuo Tsai, Yang-Chih Hsueh
  • Publication number: 20250070045
    Abstract: In a package device, wherein integrated circuit devices are bonded to a substrate, stress arising from mechanical strain, CTE mismatch, and the like can be alleviated or eliminated by incorporating stress buffering air gaps into a protective material, such as a gap fill oxide. The air gaps can be formed by tuning and changing deposition parameters during the deposition process and/or by tuning the size and placement of adjacent integrated circuit devices in the package, and/or by forming trenches in the protective material prior to the bonding process.
    Type: Application
    Filed: January 3, 2024
    Publication date: February 27, 2025
    Inventors: Ming-Tsu Chung, Yung-Chi Lin, Yan-Zuo Tsai, Yang-Chih Hsueh
  • Publication number: 20250062204
    Abstract: A package includes a first die over and bonded to a first side of a second die, where the second die includes a first substrate, a first interconnect structure over the first substrate, a seal ring disposed within the first interconnect structure, first dummy through substrate vias (TSVs) extending through edge regions of the first substrate of the second die and in physical contact with the seal ring, and functional TSVs extending through a central region of the first substrate of the second die.
    Type: Application
    Filed: January 4, 2024
    Publication date: February 20, 2025
    Inventors: Yan-Zuo Tsai, Ming-Tsu Chung, Yang-Chih Hsueh, Yung-Chi Lin
  • Publication number: 20250062136
    Abstract: A method includes bonding a device die onto a package component. The device die includes a semiconductor substrate, and a through-via extending into the semiconductor substrate. The method further includes depositing a dielectric liner lining sidewalls of the device die, depositing a dielectric layer on the dielectric liner, and planarizing the dielectric layer and the device die. Remaining portions of the dielectric liner and the dielectric layer form a gap-filling region, and a top end of the through-via is revealed. An implantation process is performed to introduce a stress modulation dopant into at least one of the dielectric liner and the dielectric layer. A redistribution line is formed over and electrically connecting to the through-via.
    Type: Application
    Filed: November 20, 2023
    Publication date: February 20, 2025
    Inventors: Ming-Tsu Chung, Yung-Chi Lin, Yan-Zuo Tsai, Yang-Chih Hsueh, Ming-Shih Yeh
  • Publication number: 20250062247
    Abstract: A method includes depositing a dielectric layer on a package component having a first warpage, and performing an implantation process to implant the dielectric layer with a stress modulation dopant. After the implantation process, the package component has a second warpage smaller than the first warpage.
    Type: Application
    Filed: November 7, 2023
    Publication date: February 20, 2025
    Inventors: Yang-Chih Hsueh, Yan-Zuo Tsai, Ming-Tsu Chung, Yung-Chi Lin
  • Publication number: 20240170320
    Abstract: A die bonding device is provided to pick up a die and place the die on a carrier. The die bonding device includes a pick-and-placer and a vacuum generator. The pick-and-placer includes an adsorption surface, a first channel and a second channel, and the first channel and the second channel are not connected to each other. The vacuum generator includes a first vacuum pump and a second vacuum pump, the first vacuum pump is connected to the first channel via a pipeline, the second vacuum pump is connected to the second channel via another pipeline, the first vacuum pump and the second vacuum pump make the pick-and-placer adsorb the die to the adsorption surface during a vacuum holding period, and the first vacuum pump and the second vacuum pump respectively make the pick-and-placer release the die to the carrier sequentially in a vacuum release period.
    Type: Application
    Filed: January 19, 2023
    Publication date: May 23, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yan-Zuo TSAI, Yang-Chih HSUEH, Yung-Chi LIN
  • Patent number: 11948920
    Abstract: Provided are a semiconductor device and a method for manufacturing the same, and a semiconductor package. The semiconductor device includes a die stack and a cap substrate. The die stack includes a first die, second dies stacked on the first die, and a third die stacked on the second dies. The first die includes first through semiconductor vias. Each of the second dies include second through semiconductor vias. The third die includes third through semiconductor vias. The cap substrate is disposed on the third die of the die stack. A sum of a thickness of the third die and a thickness of the cap substrate ranges from about 50 ?m to about 80 ?m.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: April 2, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: I-Chun Hsu, Yan-Zuo Tsai, Chia-Yin Chen, Yang-Chih Hsueh, Yung-Chi Lin, Tsang-Jiuh Wu, Wen-Chih Chiou
  • Publication number: 20230063851
    Abstract: Provided are a semiconductor device and a method for manufacturing the same, and a semiconductor package. The semiconductor device includes a die stack and a cap substrate. The die stack includes a first die, second dies stacked on the first die, and a third die stacked on the second dies. The first die includes first through semiconductor vias. Each of the second dies include second through semiconductor vias. The third die includes third through semiconductor vias. The cap substrate is disposed on the third die of the die stack. A sum of a thickness of the third die and a thickness of the cap substrate ranges from about 50 ?m to about 80 ?m.
    Type: Application
    Filed: August 30, 2021
    Publication date: March 2, 2023
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: I-Chun Hsu, Yan-Zuo Tsai, Chia-Yin Chen, Yang-Chih Hsueh, Yung-Chi Lin, Tsang-Jiuh Wu, Wen-Chih Chiou
  • Patent number: 10867831
    Abstract: A method and apparatus for bonding semiconductor devices are disclosed. In an embodiment, the method may include attaching a first die to a flip head of a flip module, flipping the first die with the flip module, removing the first die from the flip module after flipping the first die, inspecting the flip head of the flip module for contamination after removing the first die, cleaning the flip head with an in situ cleaning module after inspecting the flip head, and attaching a second die to the flip head after cleaning the flip head.
    Type: Grant
    Filed: August 14, 2020
    Date of Patent: December 15, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yan-Zuo Tsai, Yang-Chih Hsueh, Chia-Yin Chen, Fu-Kang Tien, Ebin Liao, Wen-Chih Chiou
  • Publication number: 20200373185
    Abstract: A method and apparatus for bonding semiconductor devices are disclosed. In an embodiment, the method may include attaching a first die to a flip head of a flip module, flipping the first die with the flip module, removing the first die from the flip module after flipping the first die, inspecting the flip head of the flip module for contamination after removing the first die, cleaning the flip head with an in situ cleaning module after inspecting the flip head, and attaching a second die to the flip head after cleaning the flip head.
    Type: Application
    Filed: August 14, 2020
    Publication date: November 26, 2020
    Inventors: Yan-Zuo Tsai, Yang-Chih Hsueh, Chia-Yin Chen, Fu-Kang Tien, Ebin Liao, Wen-Chih Chiou
  • Patent number: 10748803
    Abstract: A method and apparatus for bonding semiconductor devices are disclosed. In an embodiment, the method may include attaching a first die to a flip head of a flip module, flipping the first die with the flip module, removing the first die from the flip module after flipping the first die, inspecting the flip head of the flip module for contamination after removing the first die, cleaning the flip head with an in situ cleaning module after inspecting the flip head, and attaching a second die to the flip head after cleaning the flip head.
    Type: Grant
    Filed: April 22, 2019
    Date of Patent: August 18, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yan-Zuo Tsai, Yang-Chih Hsueh, Chia-Yin Chen, Fu-Kang Tien, Ebin Liao, Wen-Chih Chiou
  • Publication number: 20190244851
    Abstract: A method and apparatus for bonding semiconductor devices are disclosed. In an embodiment, the method may include attaching a first die to a flip head of a flip module, flipping the first die with the flip module, removing the first die from the flip module after flipping the first die, inspecting the flip head of the flip module for contamination after removing the first die, cleaning the flip head with an in situ cleaning module after inspecting the flip head, and attaching a second die to the flip head after cleaning the flip head.
    Type: Application
    Filed: April 22, 2019
    Publication date: August 8, 2019
    Inventors: Yan-Zuo Tsai, Yang-Chih Hsueh, Chia-Yin Chen, Fu-Kang Tien, Ebin Liao, Wen-Chih Chiou
  • Patent number: 10269611
    Abstract: A method and apparatus for bonding semiconductor devices are disclosed. In an embodiment, the method may include attaching a first die to a flip head of a flip module, flipping the first die with the flip module, removing the first die from the flip module after flipping the first die, inspecting the flip head of the flip module for contamination after removing the first die, cleaning the flip head with an in situ cleaning module after inspecting the flip head, and attaching a second die to the flip head after cleaning the flip head.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: April 23, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yan-Zuo Tsai, Yang-Chih Hsueh, Chia-Yin Chen, Fu-Kang Tien, Ebin Liao, Wen-Chih Chiou
  • Patent number: 10032698
    Abstract: An interconnection structure and method disclosed for providing an interconnection structure that includes conductive features having reduced topographic variations. The interconnection structure includes a contact pad disposed over a substrate. The contact pad includes a first layer of a first conductive material and a second layer of a second conductive material over the first layer. The first conductive material and the second conductive material are made of substantially the same material and have a first average grain size and a second average grain size that is smaller than the first average grain size. The interconnection structure also includes a passivation layer covering the substrate and the contact pad, and the passivation layer has an opening exposing the contact pad.
    Type: Grant
    Filed: June 5, 2017
    Date of Patent: July 24, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Hsiao Yun Lo, Yung-Chi Lin, Yang-Chih Hsueh, Tsang-Jiuh Wu, Wen-Chih Chiou
  • Patent number: 9901917
    Abstract: The present invention provides methods and designs of enclosed-channel reactor system for manufacturing catalysts or supports. Both of the configuration designs force the gaseous precursors and purge gas flow through the channel surface of reactor. The precursors will transform to thin film or particle catalysts or supports under adequate reaction temperature, working pressure and gas concentration. The reactor body is either sealed or enclosed for isolation from atmosphere. Another method using super ALD cycles is also proposed to grow alloy catalysts or supports with controllable concentration. The catalysts prepared by the method and system in the present invention are noble metals, such as platinum, palladium, rhodium, ruthenium, iridium and osmium, or transition metals such as iron, silver, cobalt, nickel and tin, while supports are silicon oxide, aluminum oxide, zirconium oxide, cerium oxide or magnesium oxide, or refractory metals, which can be chromium, molybdenum, tungsten or tantalum.
    Type: Grant
    Filed: May 17, 2016
    Date of Patent: February 27, 2018
    Assignee: NATIONAL APPLIED RESEARCH LABORATORIES
    Inventors: Chi-Chung Kei, Bo-Heng Liu, Chien-Pao Lin, Chien-Nan Hsiao, Yang-Chih Hsueh, Tsong-Pyng Perng
  • Publication number: 20170271242
    Abstract: An interconnection structure and method disclosed for providing an interconnection structure that includes conductive features having reduced topographic variations. The interconnection structure includes a contact pad disposed over a substrate. The contact pad includes a first layer of a first conductive material and a second layer of a second conductive material over the first layer. The first conductive material and the second conductive material are made of substantially the same material and have a first average grain size and a second average grain size that is smaller than the first average grain size. The interconnection structure also includes a passivation layer covering the substrate and the contact pad, and the passivation layer has an opening exposing the contact pad.
    Type: Application
    Filed: June 5, 2017
    Publication date: September 21, 2017
    Inventors: Hsiao Yun Lo, Yung-Chi Lin, Yang-Chih Hsueh, Tsang-Jiuh Wu, Wen-Chih Chiou
  • Patent number: 9673132
    Abstract: An interconnection structure and method disclosed for providing an interconnection structure that includes conductive features having reduced topographic variations. The interconnection structure includes a contact pad disposed over a substrate. The contact pad includes a first layer of a first conductive material and a second layer of a second conductive material over the first layer. The first conductive material and the second conductive material are made of substantially the same material and have a first average grain size and a second average grain size that is smaller than the first average grain size. The interconnection structure also includes a passivation layer covering the substrate and the contact pad, and the passivation layer has an opening exposing the contact pad.
    Type: Grant
    Filed: October 9, 2014
    Date of Patent: June 6, 2017
    Assignee: Taiwan Semiconductor Manufacting Company, Ltd.
    Inventors: Hsiao Yun Lo, Yung-Chi Lin, Yang-Chih Hsueh, Tsang-Jiuh Wu, Wen-Chih Chiou
  • Publication number: 20160256863
    Abstract: The present invention provides methods and designs of enclosed-channel reactor system for manufacturing catalysts or supports. Both of the configuration designs force the gaseous precursors and purge gas flow through the channel surface of reactor. The precursors will transform to thin film or particle catalysts or supports under adequate reaction temperature, working pressure and gas concentration. The reactor body is either sealed or enclosed for isolation from atmosphere. Another method using super ALD cycles is also proposed to grow alloy catalysts or supports with controllable concentration. The catalysts prepared by the method and system in the present invention are noble metals, such as platinum, palladium, rhodium, ruthenium, iridium and osmium, or transition metals such as iron, silver, cobalt, nickel and tin, while supports are silicon oxide, aluminum oxide, zirconium oxide, cerium oxide or magnesium oxide, or refractory metals, which can be chromium, molybdenum, tungsten or tantalum.
    Type: Application
    Filed: May 17, 2016
    Publication date: September 8, 2016
    Inventors: Chi-Chung Kei, Bo-Heng Liu, Chien-Pao Lin, Chien-Nan Hsiao, Yang-Chih Hsueh, Tsong-Pyng Perng
  • Patent number: 9381509
    Abstract: The present invention provides methods and designs of enclosed-channel reactor system for manufacturing catalysts or supports. Both of the configuration designs force the gaseous precursors and purge gas flow through the channel surface of reactor. The precursors will transform to thin film or particle catalysts or supports under adequate reaction temperature, working pressure and gas concentration. The reactor body is either sealed or enclosed for isolation from atmosphere. Another method using super ALD cycles is also proposed to grow alloy catalysts or supports with controllable concentration. The catalysts prepared by the method and system in the present invention are noble metals, such as platinum, palladium, rhodium, ruthenium, iridium and osmium, or transition metals such as iron, silver, cobalt, nickel and tin, while supports are silicon oxide, aluminum oxide, zirconium oxide, cerium oxide or magnesium oxide, or refractory metals, which can be chromium, molybdenum, tungsten or tantalum.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: July 5, 2016
    Assignee: NATIONAL APPLIED RESEARCH LABORATORIES
    Inventors: Chi-Chung Kei, Bo-Heng Liu, Chien-Pao Lin, Chien-Nan Hsiao, Yang-Chih Hsueh, Tsong-Pyng Perng
  • Publication number: 20150054174
    Abstract: An interconnection structure and method disclosed for providing an interconnection structure that includes conductive features having reduced topographic variations. The interconnection structure includes a contact pad disposed over a substrate. The contact pad includes a first layer of a first conductive material and a second layer of a second conductive material over the first layer. The first conductive material and the second conductive material are made of substantially the same material and have a first average grain size and a second average grain size that is smaller than the first average grain size. The interconnection structure also includes a passivation layer covering the substrate and the contact pad, and the passivation layer has an opening exposing the contact pad.
    Type: Application
    Filed: October 9, 2014
    Publication date: February 26, 2015
    Inventors: Hsiao Yun Lo, Yung-Chi Lin, Yang-Chih Hsueh, Tsang-Jiuh Wu, Wen-Chih Chiou