Patents by Inventor Yang Kyoo Han
Yang Kyoo Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10173967Abstract: According to one embodiment of the present invention, an azo polymer forms a complex with a lithium ion and a sodium ion among alkali metal ions, but does not form a complex with a potassium ion. Therefore, the azo polymer is expected to be utilized as a material for a sensor capable of selectively detecting a specific alkali metal ion, or as a novel material capable of selectively trapping a specific alkali metal ion from a solution in which metal ions are mixed.Type: GrantFiled: December 2, 2015Date of Patent: January 8, 2019Assignees: LG Chem, Ltd., IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)Inventors: Yang Kyoo Han, In-Joon Byun, Sung Soo Yoon, Je Gwon Lee
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Patent number: 9957363Abstract: The present invention relates to a method for forming a metal nanowire or a metal nanomesh. More particularly, the present invention relates to a method for forming a metal nanowire or a metal nanomesh capable of forming a variety of metal nanowires or metal nanomeshes in a desired shape by a simplified method.Type: GrantFiled: September 5, 2013Date of Patent: May 1, 2018Assignees: LG CHEM, LTD., IUCF-HYUInventors: Yang Kyoo Han, Je Gwon Lee, Hyun Jin Lee, No Ma Kim, Sung Soo Yoon, Eun Ji Shin
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Publication number: 20170240504Abstract: According to one embodiment of the present invention, an azo polymer forms a complex with a lithium ion and a sodium ion among alkali metal ions, but does not form a complex with a potassium ion. Therefore, the azo polymer is expected to be utilized as a material for a sensor capable of selectively detecting a specific alkali metal ion, or as a novel material capable of selectively trapping a specific alkali metal ion from a solution in which metal ions are mixed.Type: ApplicationFiled: December 2, 2015Publication date: August 24, 2017Applicants: LG Chem, Ltd., IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)Inventors: Yang Kyoo Han, In-Joon Byun, Sung Soo Yoon, Je Gwon Lee
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Patent number: 9493588Abstract: The present invention relates to a diblock copolymer that may facilitate formation of a finer nano pattern, and be used for manufacture of an electronic device including a nano pattern or a bio sensor, and the like, a method for preparing the same, and a method for forming a nano pattern using the same, The diblock copolymer comprises a hard segment including at least one specific acrylamide-based repeat unit, and a soft segment including at least one (meth)acrylate-based repeat unit.Type: GrantFiled: March 16, 2012Date of Patent: November 15, 2016Assignee: LG CHEM, LTD.Inventors: Yang-Kyoo Han, Je-Gwon Lee, Su-Hwa Kim
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Patent number: 9495991Abstract: The present invention relates to a method for forming a silicon oxide nanopattern, in which the method can be used to easily form a nanodot or nanohole-type nanopattern, and a metal nanopattern formed by using the same can be properly applied to a next-generation magnetic recording medium for storage information, etc., a method for forming a metal nanopattern, and a magnetic recording medium for information storage using the same. The method for forming a silicon oxide nanopattern includes the steps of forming a block copolymer thin film including specific hard segments and soft segments containing a (meth)acrylate-based repeating unit on silicon oxide of a substrate; conducting orientation of the thin film; selectively removing the soft segments from the block copolymer thin film; and conducting reactive ion etching of silicon oxide using the block copolymer thin film from which the soft segments are removed, as a mask to form a silicon oxide nanodot or nanohole pattern.Type: GrantFiled: September 9, 2013Date of Patent: November 15, 2016Assignees: LG CHEM, LTD., IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)Inventors: Yang Kyoo Han, Je Gwon Lee, Hyun Jin Lee, No Ma Kim, Sung Soo Yoon, Eun Ji Shin, Yeon Sik Jung
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Patent number: 9353236Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.Type: GrantFiled: June 23, 2015Date of Patent: May 31, 2016Assignee: LG Chem, Ltd.Inventors: Yang-Kyoo Han, Je-Gwon Lee, Ji-soo Jeong, Dae-Won Sohn, Sung-Hwan Han, Hyun-Hoon Song, Kwan-Mook Kim
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Patent number: 9322115Abstract: The present invention relates to a porous electrospun fiber with uniform minute pores and very large surface area, and thus porous electrospun fiber can be preferably applicable to various uses that need mesoporous materials, and a method of preparing the same. The porous electrospun fiber comprises an acrylamide-based polymer.Type: GrantFiled: August 26, 2011Date of Patent: April 26, 2016Assignees: LG CHEM, LTD., IUCF-HYU (Industry University Cooperation Foundation Hanyang University)Inventors: Yang-Kyoo Han, Su-Hwa Kim, Je-Gwon Lee
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Patent number: 9281481Abstract: The present invention relates to a polymeric fluorescent material, which comprises a novel acrylamide polymer so that it may emit fluorescence with higher efficiency and can be available especially for a white or blue light emitting material. The polymeric fluorescent material comprises a mesoporous acrylamide polymer including at least one repeating unit.Type: GrantFiled: June 15, 2012Date of Patent: March 8, 2016Assignee: LG CHEM LTD.Inventors: Yang-Kyoo Han, Je-Gwon Lee, Su-Hwa Kim
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Patent number: 9273181Abstract: Provided is a novel aromatic polyester-based polymer. The aromatic polyester-based polymer includes the repeating unit represented by the following Chemical Formula I and contains at least one aromatic diol monomer. The aromatic polyester-based polymer has a high glass transition temperature and excellent heat resistance, mechanical properties and transparency, as well as shows excellent formability and processability into films or the like, and thus solves the problems occurring in the conventional crystalline or amorphous engineering plastic materials. In addition, the aromatic polyester-based polymer may be applied to next-generation engineering plastic composite materials, such as matrix resins of composite materials for cars and airplanes. The aromatic polyester-based polymer may also be applied to flexible substrates for next-generation flexible displays, solar cells or electronic paper requiring transparency and high heat resistance at the same time.Type: GrantFiled: October 10, 2014Date of Patent: March 1, 2016Assignee: IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)Inventors: Yang-Kyoo Han, Minhee Jang, Byung Kook Lee, Injoon Byun
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Publication number: 20160039991Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.Type: ApplicationFiled: June 23, 2015Publication date: February 11, 2016Inventors: Yang-Kyoo HAN, Je-Gwon LEE, Ji-soo JEONG, Dae-Won SOHN, Sung-Hwan HAN, Hyun-Hoon SONG, Kwan-Mook KIM
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Publication number: 20150376329Abstract: Provided is a novel aromatic polyester-based polymer. The aromatic polyester-based polymer includes the repeating unit represented by the following Chemical Formula I and contains at least one aromatic diol monomer. The aromatic polyester-based polymer has a high glass transition temperature and excellent heat resistance, mechanical properties and transparency, as well as shows excellent formability and processability into films or the like, and thus solves the problems occurring in the conventional crystalline or amorphous engineering plastic materials. In addition, the aromatic polyester-based polymer may be applied to next-generation engineering plastic composite materials, such as matrix resins of composite materials for cars and airplanes. The aromatic polyester-based polymer may also he applied to flexible substrates for next-generation flexible displays, solar cells or electronic paper requiring transparency and high heal resistance at the same time.Type: ApplicationFiled: October 10, 2014Publication date: December 31, 2015Applicant: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITYInventors: Yang-Kyoo Han, Minhee Jang, Byung Kook Lee, Injoon Byun
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Patent number: 9175116Abstract: The present invention relates to a polymeric water repellent material including novel acrylamide polymer, which can be used in various field because it demonstrates controllable and excellent water repellency together with water adhesiveness. The polymeric water repellent material comprises an acrylamide polymer including at least one repeating unit.Type: GrantFiled: June 15, 2012Date of Patent: November 3, 2015Assignees: LG CHEM, LTD., IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)Inventors: Yang-Kyoo Han, Je-Gwon Lee, Su-Hwa Kim
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Patent number: 9169200Abstract: The present invention relates to a polymer supported reagent comprising a novel crosslinked mesoporous polymer, enabling a simple and easy production of an azoxy compound or an azo compound from an aromatic nitro compound, and a method of selectively reducing an aromatic nitro compound by using the same. The polymer supported reagent comprises a certain acrylamide mesoporous crosslinked polymer.Type: GrantFiled: March 16, 2012Date of Patent: October 27, 2015Assignees: LG CHEM, LTD., IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)Inventors: Yang-Kyoo Han, Jin Cho, Sang-Mi Lee, Seung-Hoon Shin
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Publication number: 20150232628Abstract: The present invention relates to a method for forming a metal nanowire or a metal nanomesh. More particularly, the present invention relates to a method for forming a metal nanowire or a metal nanomesh capable of forming a variety of metal nanowires or metal nanomeshes in a desired shape by a simplified method.Type: ApplicationFiled: September 5, 2013Publication date: August 20, 2015Applicant: IUCF-HYU (Industry-University Cooperation Founda- tion Hanyang University)Inventors: Yang Kyoo Han, Je Gwon Lee, Hyun Jin Lee, No Ma Kim, Sung Soo Yoon, Eun Ji Shin
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Patent number: 9109063Abstract: The present invention relates to an acrylamide-based mesoporous polymer and its preparation method, where the acrylamide-based mesoporous polymer is fabricated by a simple preparation method to have uniform minute pores controllable in pore size and thereby applicable to a wide variety of fields. The acrylamide-based mesoporous polymer includes at least one of a defined repeating unit and contains a plurality of pores having a diameter of 2.0 to 10.0 nm in the solid state.Type: GrantFiled: August 26, 2011Date of Patent: August 18, 2015Assignees: LG Chem, Ltd., IUCF-HYU (Industry-University Cooperation Foundation Hanyang UniversityInventors: Yang-Kyoo Han, Je-Gwon Lee, Ji-soo Jeong, Dae-Won Sohn, Sung-Hwan Han, Hyun-Hoon Song, Kwan-Mook Kim
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Publication number: 20150228298Abstract: The present invention relates to a method for forming a silicon oxide nanopattern, in which the method can be used to easily form a nanodot or nanohole-type nanopattern, and a metal nanopattern formed by using the same can be properly applied to a next-generation magnetic recording medium for storage information, etc., a method for forming a metal nanopattern, and a magnetic recording medium for information storage using the same. The method for forming a silicon oxide nanopattern includes the steps of forming a block copolymer thin film including specific hard segments and soft segments containing a (meth)acrylate-based repeating unit on silicon oxide of a substrate; conducting orientation of the thin film; selectively removing the soft segments from the block copolymer thin film; and conducting reactive ion etching of silicon oxide using the block copolymer thin film from which the soft segments are removed, as a mask to form a silicon oxide nanodot or nanohole pattern.Type: ApplicationFiled: September 9, 2013Publication date: August 13, 2015Inventors: Yang Kyoo Han, Je Gwon Lee, Hyun Jin Lee, No Ma Kim, Sung Soo Yoon, Eun Ji Shin, Yeon Sik Jung
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Patent number: 9051181Abstract: The present invention relates to a gas storage material comprising a novel mesoporous polymer, that shows superior gas storage efficiency and can stably adsorb and desorb gas, and method for gas storage using thereof. The gas storage material comprises an acrylamide-based polymer.Type: GrantFiled: August 26, 2011Date of Patent: June 9, 2015Assignees: LG CHEM, LTD., IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)Inventors: Yang-Kyoo Han, Je-Gwon Lee, Su-Hwa Kim, Jae-Yong Kim, Sang-Hwa Lee
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Patent number: 8916672Abstract: The present disclosure relates to a transparent polyarylene ether polymer with high heat resistance and a method for preparing the same. More particularly, the present disclosure relates to a polyarylene ether polymer and a method for preparing the same, wherein the polyarylene ether polymer has a repeating structure in which cardo-type aromatic diols having a large molecular volume, polyether sulfones which are amorphous polymers having a high glass transition temperature and superior film formability, and polyether ketones which are crystalline polymers having superior heat resistance and mechanical properties are sequentially arranged. The polyarylene ether polymer is both transparent and heat resistant and, thus, can be used, for example, for a flexible plastic substrate.Type: GrantFiled: December 10, 2010Date of Patent: December 23, 2014Assignee: ICUF-HYU (Industry-University Cooperation Foundation Hanyang University)Inventors: Yang Kyoo Han, Gyoung Pyo Kong, Moon Ki Kim, Bo Ra Hong, Hyun Aee Chun
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Patent number: 8911537Abstract: The present invention relates to an adsorbent of volatile organic compounds (VOCs) comprising a novel mesoporous polymer, that shows improved adsorption property, and adsorption method of VOCs using thereof. The adsorbent comprises an acrylamide-based polymer.Type: GrantFiled: August 26, 2011Date of Patent: December 16, 2014Assignees: LG Chem, Ltd., IUCF-HYU (Industry-University Cooperation Foundation Hanyang UniversityInventors: Yang-Kyoo Han, Je-Gwon Lee, Su-Hwa Kim
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Publication number: 20130266790Abstract: The present invention relates to a polymeric water repellent material including novel acrylamide polymer, which can be used in various field because it demonstrates controllable and excellent water repellency together with water adhesiveness. The polymeric water repellent material comprises an acrylamide polymer including at least one repeating unit.Type: ApplicationFiled: June 15, 2012Publication date: October 10, 2013Applicant: IUCF-HYU (Industry-University Cooperation Foundation Hanyang UniveristyInventors: Yang-Kyoo Han, Je-Gwon Lee, Su-Hwa Kim