Abstract: A plurality of gate trenches is formed into a semiconductor substrate in an active cell region. One or more other trenches are formed in a different region. Each gate trench has a first conductive material in lower portions and a second conductive material in upper portions. In the gate trenches, a first insulating layer separates the first conductive material from the substrate, a second insulating layer separates the second conductive material from the substrate and a third insulating material separates the first and second conductive materials. The other trenches contain part of the first conductive material in a half-U shape in lower portions and part of the second conductive material in upper portions. In the other trenches, the third insulating layer separates the first and second conductive materials. The first insulating layer is thicker than the third insulating layer, and the third insulating layer is thicker than the second.

Abstract: Data to be moved from a source system to a target system, for a set of tenants, is first identified. It is then isolated into its own container. The contents are then moved.

Abstract: A data storage system includes a source database and a target database. A data isolation component is configured to identify content in the source database that will be moved to the target database. A data move component is configured to move the content identified in the source database to the target database. Upon completion of moving the content from the source database to the target database, the move component is configured to update a mapping database in a single operation such that data access request for the moved content are directed to the target database.

Abstract: A magnetic write apparatus has a media-facing surface (MFS), a pole, a trailing shield, coil(s) and a write gap between the pole and trailing shield. The pole includes leading and trailing surfaces, a main portion having a first bevel and an additional portion having a second bevel and adjoining the main portion. The first bevel adjoins the MFS and is at a nonzero, acute first bevel angle from a direction perpendicular to the MFS. The second bevel is recessed from the MFS by not more than eighty nanometers, oriented at a second bevel angle from the direction and offset from the first bevel by a taper having a taper angle that is greater than the first bevel angle. The additional portion is at least ten nanometers and not more than sixty nanometers thick as measured from the first bevel.

Abstract: This invention discloses a semiconductor power device disposed in a semiconductor substrate including an active cell areas and a termination area. The semiconductor power device further comprises a plurality of gate trenches formed at a top portion of the semiconductor substrate in the active cell area wherein each of the gate trenches is partially filled with a conductive gate material with a top portion of the trenches filled by a high density plasma (HDP) insulation layer. The semiconductor power device further comprises mesa areas of the semiconductor substrate disposed between the gate trenches wherein the mesa areas are recessed and having a top mesa surface disposed vertically below a top surface of the HDP insulation layer wherein the HDP insulation layer covering over the conductive gate material constituting a stick-out boundary-defining layer surrounding the recessed mesa areas in the active cell areas between the gate trenches.

Abstract: A plurality of gate trenches is formed into a semiconductor substrate in an active cell region. One or more other trenches are formed in a different region. Each gate trench has a first conductive material in lower portions and a second conductive material in upper portions. In the gate trenches, a first insulating layer separates the first conductive material from the substrate, a second insulating layer separates the second conductive material from the substrate and a third insulating material separates the first and second conductive materials. The other trenches contain part of the first conductive material in a half-U shape in lower portions and part of the second conductive material in upper portions. In the other trenches, the third insulating layer separates the first and second conductive materials. The first insulating layer is thicker than the third insulating layer, and the third insulating layer is thicker than the second.

Abstract: A plurality of gate trenches is formed into a semiconductor substrate in an active cell region. One or more other trenches are formed in a different region. Each gate trench has a first conductive material in lower portions and a second conductive material in upper portions. In the gate trenches, a first insulating layer separates the first conductive material from the substrate, a second insulating layer separates the second conductive material from the substrate and a third insulating material separates the first and second conductive materials. The other trenches contain part of the first conductive material in a half-U shape in lower portions and part of the second conductive material in upper portions. In the other trenches, the third insulating layer separates the first and second conductive materials. The first insulating layer is thicker than the third insulating layer, and the third insulating layer is thicker than the second.

Abstract: A magnetic transducer has air-bearing surface (ABS) and includes a main pole and at least one coil. The coil(s) energize the main pole. The main pole includes a yoke and a pole tip having an ABS-facing surface. The pole tip includes a sidewall having a radius of curvature and a chisel angle. The chisel angle is measured between a yoke direction perpendicular to the ABS and a tangent the sidewall. The chisel angle for the pole tip continuously increases in the yoke direction to a maximum a first distance from the ABS-facing surface in the yoke direction. The radius of curvature for the pole tip has a minimum radius of curvature a second distance from the ABS-facing surface in the yoke direction. The first distance is greater than the second distance.

Abstract: The systems and methods described herein include a technique for generating both reproducible and interpretable gene signatures. The technique involves resampling a data set and choosing genes having a high frequency of emergence. In particular, the systems and methods described herein include repeated sampling of data sets, ranking genes based on frequency of occurrence in gene signatures generated through the repeated sampling process, and iteratively selecting the best gene signature.

Abstract: A coating composition for pre-treating a substrate prior to inkjet printing thereon, and an inkjet receiving medium including a substrate and having a topmost layer coated thereon, where the coating composition has a solids content which includes at least 30 wt % of one or more aqueous soluble salts of multivalent metal cations, and particles had primarily of polymer having a Rockwell Hardness of less than R90 and having a mode equivalent spherical diameter of at least about 2 micrometers. When coated, the composition provides at least 0.01 g/m2 of particles included primarily of polymer having a Rockwell Hardness of less than R90 and which have an equivalent spherical diameter of i) at least about 2 micrometers and ii) at least 0.1 micrometer greater than the minimum coated thickness of the topmost layer.

Abstract: Described herein are systems and methods for correcting a data set and classifying the data set in an integrated manner. A training data set, a training class set, and a test data set are received. A first classifier is generated for the training data set by applying a machine learning technique to the training data set and the training class set, and a first test class set is generated by classifying the elements in the test data set according to the first classifier. For each of multiple iterations, the training data set is transformed, the test data set is transformed, and a second classifier is generated by applying a machine learning technique to the transformed training data set. A second test class set is generated according to the second classifier, and the first test class set is compared to the second test class set.

Abstract: Described herein are systems and methods for classifying a data set using an ensemble classification technique. Classifiers are iteratively generated by applying machine learning techniques to a training data set, and training class sets are generated by classifying the elements in the training data set according to the classifiers. Objective values are computed based on the training class sets, and objective values associated with different classifiers are compared until a desired number of iterations is reached, and a final training class set is output.

Abstract: Apparatus and methods for detecting wave front aberration of a projection objective lens in a photolithography machine are disclosed. The apparatus comprises: a light source system configured to generate an illuminating beam; a spatial filter configured to receive the illuminating beam and generate ideal spherical wave; a splitter plate arranged downstream to the spatial filter at a predetermined angle with respect to an optical axis of the spherical wave and having a transflective film being applied on a surface thereof; the projection objective lens configured to receive a beam from the splitter plate and generate an output beam; a spherical mirror configured to reflect the output beam from the projection objective lens to the projection objective lens, light passing through the projection objective lens being reflected by the splitter plate; and an interferometer configured to receive light reflected by the splitter plate and measure the wave front aberration of the projection objective lens.

Abstract: Apparatus and methods for detecting wave front aberration of a projection objective lens in a photolithography machine are disclosed. The apparatus comprises: a light source system configured to generate an illuminating beam; a spatial filter configured to receive the illuminating beam and generate ideal spherical wave; a splitter plate arranged downstream to the spatial filter at a predetermined angle with respect to an optical axis of the spherical wave and having a transflective film being applied on a surface thereof; the projection objective lens configured to receive a beam from the splitter plate and generate an output beam; a spherical mirror configured to reflect the output beam from the projection objective lens to the projection objective lens, light passing through the projection objective lens being reflected by the splitter plate; and an interferometer configured to receive light reflected by the splitter plate and measure the wave front aberration of the projection objective lens.

Abstract: A system for configuring base station parameters comprises a base station, a mobile station and a code generating system. Additionally, a method for configuring base station parameters comprises steps of: after a code generating system generates an operation code, the operation code is sent to a base station via a mobile station, wherein the operation code includes information required for performing a configuration operation; the base station, if determining the operation code as received to be valid, then performs the corresponding configuration operation according to the information required for performing the configuration operation. According to the present invention, without depending on the base station controller and other network elements such as a network management system, the base station can implement message interaction over air link, i.e.

Abstract: A coating composition for pre-treating a substrate prior to inkjet printing thereon, and an inkjet receiving medium comprising a substrate and having a topmost layer coated thereon, where the coating composition has a solids content which comprises at least 30 wt % of one or more aqueous soluble salts of multivalent metal cations, and particles comprised primarily of polymer having a Rockwell Hardness of less than R90 and having a mode equivalent spherical diameter of at least about 2 micrometers. When coated, the composition provides at least 0.01 g/m2 of particles comprised primarily of polymer having a Rockwell Hardness of less than R90 and which have an equivalent spherical diameter of i) at least about 2 micrometers and ii) at least 0.1 micrometer greater than the minimum coated thickness of the topmost layer.

Abstract: A coating composition for pre-treating a substrate prior to inkjet printing thereon, and an inkjet receiving medium comprising a substrate and having a topmost layer coated thereon, where the coating composition and topmost layer comprise one or more aqueous-soluble salts of multivalent metal cations, a cationic polyelectrolyte comprising amidine moieties, and one or more second polymer which is distinct from the cationic polyelectrolyte and which is selected from the group consisting of a polyamide-epichlorohydrin, a polyamine solution polymer, and a waterborne or water-dispersible polyurethane. The topmost layer is advantageously at a solid content of from 0.1 to 5 g/m2, and comprises from 30-90 wt % of the one or more aqueous soluble salts of multivalent metal cations, at least 0.01 g/m2 of the cationic polyelectrolyte comprising amidine moieties, and at least 0.005 g/m2 of the second polymer which is distinct from the cationic polyelectrolyte comprising amidine moieties.

Abstract: A coating composition for pre-treating a substrate prior to inkjet printing thereon, and an inkjet receiving medium comprising a substrate and having a topmost layer coated thereon, where the coating composition and topmost layer comprise one or more aqueous-soluble salts of multivalent metal cations, a cationic polyelectrolyte comprising amidine moieties, and one or more second polymer which is distinct from the cationic polyelectrolyte and which is selected from the group consisting of a polyamide-epichlorohydrin, a polyamine solution polymer, and a waterborne or water-dispersible polyurethane. The topmost layer is advantageously at a solid content of from 0.1 to 5 g/m2, and comprises from 30-90 wt % of the one or more aqueous soluble salts of multivalent metal cations, at least 0.01 g/m2 of the cationic polyelectrolyte comprising amidine moieties, and at least 0.005 g/m2 of the second polymer which is distinct from the cationic polyelectrolyte comprising amidine moieties.

Abstract: A process is provided for etching a mask layer and removal of residue from a structure having an area sheltered from directional etching. The structure has a shape that forms a silhouette area obstructed from being etched by anisotropic bombardment originating from a first direction, and a mask formed over the mask layer over the structure; A first etch process removes at least a part of the mask layer and retains at least a part of mask layer in the sheltered area. A second etch process removes at least a part of the mask layer in the sheltered area by hydrogen based microwave plasma etching.

Abstract: The embodiments of the present disclosure disclose a LDMOS device and the method for making the LDMOS device. The LDMOS device comprises at least one capacitive region formed in the drift region. Each capacitive region comprises a polysilicon layer and a thick oxide layer separating the polysilicon layer from the drift region. The LDMOS device in accordance with the embodiments of the present disclosure can improve the breakdown voltage while a low on-resistance is maintained.