Patents by Inventor Yanir Hainick
Yanir Hainick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11946875Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.Type: GrantFiled: September 27, 2022Date of Patent: April 2, 2024Assignee: NOVA LTD.Inventors: Gilad Barak, Dror Shafir, Yanir Hainick, Shahar Gov
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Publication number: 20230177655Abstract: There are provided systems and methods for digital optical aberration correction and spectral imaging. An optical system may comprise an optical imaging unit, to form an optical image near an image plane of the optical system; a wavefront imaging sensor unit located near the image plane, to provide raw digital data on an optical field and image output near the image plane; and a control unit for processing the raw digital data and the image output to provide deblurred image output, wherein the control unit comprises a storage unit that stores instructions and a processing unit to execute the instructions to receive the image input and the raw digital data of the optical field impinging on the wavefront imaging sensor and generate a deblurred image based on an analysis of the optical mutual coherence function at the imaging plane.Type: ApplicationFiled: May 12, 2021Publication date: June 8, 2023Inventors: Yoav Berlatzky, Yanir Hainick
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Publication number: 20230130231Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.Type: ApplicationFiled: September 27, 2022Publication date: April 27, 2023Applicant: NOVA LTD.Inventors: Gilad BARAK, Dror SHAFIR, Yanir HAINICK, Shahar Gov
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Publication number: 20230029930Abstract: There are provided systems and methods for imaging, measuring an object, and characterizing a sample. An optical, speckle-based imaging system may comprise an illumination unit comprising at least one coherent light source to illuminate a sample; a collection unit for collecting input light from the sample, the collection unit consisting of an imaging optics and a wavefront imaging sensor; and a control unit coupled to the illumination unit and the collection unit for analyzing the input light and generating a speckle wavefront image, wherein the at least one coherent light source is to generate primary speckles in the sample or thereon, and the imaging optics is to capture a secondary speckle pattern induced by the illumination unit in the sample or thereon.Type: ApplicationFiled: January 13, 2021Publication date: February 2, 2023Inventors: Yoav Berlatzky, Yanir Hainick
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Publication number: 20220390858Abstract: Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting an earlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation.Type: ApplicationFiled: June 21, 2022Publication date: December 8, 2022Inventors: GILAD BARAK, MICHAEL CHEMAMA, SMADAR FERBER, YANIR HAINICK, BORIS LEVANT, ZE'EV LINDENFELD, DROR SHAFIR, YURI SHIRMAN, ELAD SCHLEIFER
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Publication number: 20220326159Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.Type: ApplicationFiled: March 15, 2022Publication date: October 13, 2022Applicant: NOVA LTD.Inventors: Gilad Barak, Yanir HAINICK, Yonatan OREN, Vladimir Machavariani
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Patent number: 11460415Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.Type: GrantFiled: May 26, 2020Date of Patent: October 4, 2022Assignee: NOVA LTD.Inventors: Gilad Barak, Dror Shafir, Yanir Hainick, Shahar Gov
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Patent number: 11366398Abstract: Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting an earlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation.Type: GrantFiled: July 18, 2019Date of Patent: June 21, 2022Assignee: NOVA LTDInventors: Gilad Barak, Michael Chemama, Smadar Ferber, Yanir Hainick, Boris Levant, Ze'Ev Lindenfeld, Dror Shafir, Yuri Shirman, Elad Schleifer
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Publication number: 20220120690Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.Type: ApplicationFiled: October 19, 2021Publication date: April 21, 2022Inventors: GILAD BARAK, YANIR HAINICK, YONATAN OREN
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Patent number: 11275027Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.Type: GrantFiled: February 18, 2020Date of Patent: March 15, 2022Assignee: NOVA LTDInventors: Gilad Barak, Yanir Hainick, Yonatan Oren, Vladimir Machavariani
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Publication number: 20210364451Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.Type: ApplicationFiled: June 6, 2021Publication date: November 25, 2021Applicant: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad BARAK, Danny GROSSMAN, Dror SHAFIR, Yoav BERLATZKY, Yanir HAINICK
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Patent number: 11150190Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.Type: GrantFiled: August 3, 2020Date of Patent: October 19, 2021Assignee: NOVA LTDInventors: Gilad Barak, Yanir Hainick, Yonatan Oren
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Patent number: 11029258Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.Type: GrantFiled: December 24, 2018Date of Patent: June 8, 2021Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad Barak, Danny Grossman, Dror Shafir, Yoav Berlatzky, Yanir Hainick
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Publication number: 20210003508Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.Type: ApplicationFiled: August 3, 2020Publication date: January 7, 2021Inventors: GILAD BARAK, YANIR HAINICK, YONATAN OREN
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Publication number: 20200355622Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.Type: ApplicationFiled: May 26, 2020Publication date: November 12, 2020Inventors: GILAD BARAK, DROR SHAFIR, YANIR HAINICK, SHAHAR GOV
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Patent number: 10761036Abstract: Determining parameters of a patterned structure located on top of an underneath layered structure, where input data is provided which includes first measured data PMD being a function ƒ of spectral intensity I? and phase ?, PMD=ƒ(I?; ?), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure, and where a general function F is also provided describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD), where the general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.Type: GrantFiled: April 30, 2019Date of Patent: September 1, 2020Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Boris Levant, Yanir Hainick, Vladimir Machavariani, Roy Koret, Gilad Barak
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Publication number: 20200256799Abstract: A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.Type: ApplicationFiled: February 18, 2020Publication date: August 13, 2020Inventors: GILAD BARAK, YANIR HAINICK, YONATAN OREN, VLADIMIR MACHAVARIANI
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Patent number: 10732116Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.Type: GrantFiled: December 15, 2016Date of Patent: August 4, 2020Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad Barak, Yanir Hainick, Yonatan Oren
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Patent number: 10663408Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.Type: GrantFiled: July 29, 2019Date of Patent: May 26, 2020Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad Barak, Dror Shafir, Yanir Hainick, Shahar Gov
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Patent number: 10564106Abstract: A method and system are presented for use in measuring one or more characteristics of patterned structures. The method comprises: providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the characteristic(s) to be measured; processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme; analyzing the distribution of Raman-contribution efficiency and determining the characteristic(s) of the structure.Type: GrantFiled: December 15, 2016Date of Patent: February 18, 2020Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad Barak, Yanir Hainick, Yonatan Oren, Vladimir Machavariani