Patents by Inventor Yanko Sarov

Yanko Sarov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220392734
    Abstract: Certain improvements of multi-beam raster units such as multi-beam generating units and multi-beam deflector units of a multi-beam charged particle microscopes are provided. The improvements include design, fabrication and adjustment of multi-beam raster units including apertures of specific shape and dimensions. The improvements can enable multi-beam generation and multi-beam deflection or stigmation with higher precision. The improvements can be relevant for routine applications of multi-beam charged particle microscopes, for example in semiconductor inspection and review, where high reliability and high reproducibility and low machine-to-machine deviations are desirable.
    Type: Application
    Filed: August 18, 2022
    Publication date: December 8, 2022
    Inventors: Yanko Sarov, Ulrich Bihr, Hans Fritz, Dirk Zeidler, Georg Kurij, Ralf Lenke, AndrĂ¡s G. Major, Christof Riedesel
  • Patent number: 11239054
    Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.
    Type: Grant
    Filed: November 16, 2020
    Date of Patent: February 1, 2022
    Assignee: Carl Zeiss MultiSEM GmbH
    Inventors: Yanko Sarov, Jan Horn, Ulrich Bihr, Christof Riedesel, Erik Essers
  • Publication number: 20210217577
    Abstract: A method of operating a multi-beam particle beam system includes: generating a multiplicity of particle beams such that they each pass through multipole elements that are either intact or defective; focusing the particle beams in a predetermined plane; determining excitations for the deflection elements of the multipole elements; exciting the deflection elements of the multipole elements that are intact with the determined excitations; modifying the determined excitations for the deflection elements of the multipole elements that are defective; and exciting the deflection elements of the defective multipole elements with the modified excitations. Modifying the determined excitations includes adding corrective excitations to the determined excitations. The corrective excitations are the same for all deflection elements of the defective multipole element.
    Type: Application
    Filed: March 29, 2021
    Publication date: July 15, 2021
    Inventors: Dirk Zeidler, Christof Riedesel, Arne Thoma, Georgo Metalidis, Joerg Jacobi, Stefan Schubert, Ralf Lenke, Ulrich Bihr, Yanko Sarov, Georg Kurij
  • Publication number: 20210066037
    Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.
    Type: Application
    Filed: November 16, 2020
    Publication date: March 4, 2021
    Inventors: Yanko Sarov, Jan Horn, Ulrich Bihr, Christof Riedesel, Erik Essers
  • Patent number: 10854423
    Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: December 1, 2020
    Assignee: Carl Zeiss MultiSEM GmbH
    Inventors: Yanko Sarov, Jan Horn, Ulrich Bihr, Christof Riedesel, Erik Essers
  • Patent number: 10761317
    Abstract: A displacement device for pivoting a mirror element with two degrees of freedom of pivoting includes an electrode structure including actuator electrodes. The actuator electrodes are comb electrodes. All actuator electrodes are arranged in a single plane. The actuator electrodes form a direct drive for pivoting the mirror element.
    Type: Grant
    Filed: August 31, 2017
    Date of Patent: September 1, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Hauf, Yanko Sarov
  • Publication number: 20190259575
    Abstract: A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.
    Type: Application
    Filed: February 15, 2019
    Publication date: August 22, 2019
    Inventors: Yanko Sarov, Jan Horn, Ulrich Bihr, Christof Riedesel, Erik Essers
  • Patent number: 10101507
    Abstract: A mirror device includes at least one electrically conductive shielding element, which forms a mechanism for producing an electric field in a region adjacent to at least one side surface and/or a rear side of a mirror body.
    Type: Grant
    Filed: June 13, 2017
    Date of Patent: October 16, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Yanko Sarov, Markus Holz, Fabian Haacker, Mark Christof Wengler, Markus Hauf
  • Publication number: 20170363861
    Abstract: A displacement device for pivoting a mirror element with two degrees of freedom of pivoting includes an electrode structure including actuator electrodes. The actuator electrodes are comb electrodes. All actuator electrodes are arranged in a single plane. The actuator electrodes form a direct drive for pivoting the mirror element.
    Type: Application
    Filed: August 31, 2017
    Publication date: December 21, 2017
    Inventors: Markus Hauf, Yanko Sarov
  • Publication number: 20170276842
    Abstract: A mirror device includes at least one electrically conductive shielding element, which forms a mechanism for producing an electric field in a region adjacent to at least one side surface and/or a rear side of a mirror body.
    Type: Application
    Filed: June 13, 2017
    Publication date: September 28, 2017
    Inventors: Yanko Sarov, Markus Holz, Fabian Haacker, Christof Wengler, Markus Hauf
  • Patent number: 8689359
    Abstract: The present invention relates to an apparatus and a method for investigating surface properties of different materials, which make it possible to carry out atomic force microscopy with a simplified and faster shear force method. The apparatus according to the invention is characterized by perpendicular orientation of the measuring tip of a self-actuated cantilever with respect to the surface of the sample. A piezoresistive sensor and a bimorph actuator are preferably DC-isolated. The measuring tip is in the form of a carbon nanotube, in particular. A plurality of cantilevers can be arranged in the form of a cantilever array which is characterized by a comb-like arrangement of individual pre-bent cantilevers. The method according to the invention is distinguished by a fast feedback signal on account of the distance between the measuring tip and the surface to be investigated being regulated using the change in a DC signal which supplies the actuator.
    Type: Grant
    Filed: June 26, 2008
    Date of Patent: April 1, 2014
    Assignee: Nano Analytik GmbH
    Inventors: Ivo W. Rangelow, Tzvetan Ivanov, Burkhard Volland, Teodor Gotszalk, Miroslaw Woszczyna, Jerzy Mielczarski, Yanko Sarov