Abstract: A display panel, a mask plate, a method for manufacturing the display panel, and a display device are provided. The display panel includes a display area and a peripheral area surrounding the display area, and the display panel further includes: at least two integrated chips located in the peripheral area of the display area and arranged along a boundary direction of the display area; at least one flow rate regulating structure is respectively located between two adjacent integrated chips and located on a side of the integrated chips remote from the display area, and the flow rate regulating structure is configured to adjust a flow rate of process liquid.

Abstract: The present disclosure relates to a manufacturing method for an array substrate, including: forming a first electrode material layer, a conductive enhancement material layer and a protective material layer in sequence, oxidation resistance of the protective material layer being stronger than that of the conductive enhancement material layer; forming a mask pattern on a side of the protective material layer away from the first electrode material layer, the mask pattern including a first portion and a second portion, and a thickness of the first portion being greater than that of the second portion; performing ashing on the mask pattern to remove the second portion to expose the protective material layer covered by the second portion; patterning the first electrode material layer to form a first electrode; and patterning the protective material layer and the conductive enhancement material layer to form a protective layer and a conductive enhancement layer.

Abstract: An array substrate has a display zone and a transition zone located on at least one side of the display zone. The array substrate includes a first base substrate, an insulating layer group, a first electrode layer and a conductive enhancement layer, wherein the insulating layer group is arranged on one side of the first base substrate, the insulating layer group is provided with a recess, and the recess is located in the transition zone; the first electrode layer is arranged on the side of the insulating layer group away from the first base substrate; and the conductive enhancement layer is arranged on the side of the first electrode layer away from the first base substrate, and the orthographic projection of the conductive enhancement layer on the first base substrate is located within the orthographic projection of the first electrode layer on the first base substrate.

Abstract: The present disclosure relates to a manufacturing method for an array substrate, including: forming a first electrode material layer, a conductive enhancement material layer and a protective material layer in sequence, oxidation resistance of the protective material layer being stronger than that of the conductive enhancement material layer; forming a mask pattern on a side of the protective material layer away from the first electrode material layer, the mask pattern including a first portion and a second portion, and a thickness of the first portion being greater than that of the second portion; performing ashing on the mask pattern to remove the second portion to expose the protective material layer covered by the second portion; patterning the first electrode material layer to form a first electrode; and patterning the protective material layer and the conductive enhancement material layer to form a protective layer and a conductive enhancement layer.

Abstract: A display panel, a mask plate, a method for manufacturing the display panel, and a display device are provided. The display panel includes a display area and a peripheral area surrounding the display area, and the display panel further includes: at least two integrated chips located in the peripheral area of the display area and arranged along a boundary direction of the display area; at least one flow rate regulating structure is respectively located between two adjacent integrated chips and located on a side of the integrated chips remote from the display area, and the flow rate regulating structure is configured to adjust a flow rate of process liquid.

Abstract: The embodiments of the invention disclose an array substrate, a manufacturing method thereof, and a display panel. The array substrate comprises a base substrate, and a first conductive layer, an insulating layer and a second conductive layer arranged on the base substrate sequentially, the insulating layer comprising a via hole region, a semi-retaining region outside the via hole region and a full-retaining region encircling the semi-retaining region and the via hole region. Since the via hole region is surrounded by the semi-retaining region, the thickness of the insulating layer around the via hole is reduced, and thus the influence of the material of the insulating layer left on a rim of the via hole can be reduced. Moreover, since the height difference of the insulating layer is divided into two segments, the influence by height difference in the overall thickness of the insulating layer can be diminished.

Abstract: The present disclosure provides an insulation machine platform, a substrate-contact type apparatus, and a static electricity elimination method. The insulation machine platform includes: a machine platform body including at least one vent hole, and at least one static electricity elimination device; the at least one vent hole corresponds to the at least one static electricity elimination device being located at a position corresponding to the at least one vent hole, respectively, wherein the machine platform body has a supporting surface, underneath which the static electricity elimination device is located, for receiving a substrate. The substrate-contact type apparatus includes the insulation machine platform.

Abstract: The present disclosure provides an insulation machine platform, a substrate-contact type apparatus, and a static electricity elimination method. The insulation machine platform includes: a machine platform body including at least one vent hole, and at least one static electricity elimination device; the at least one vent hole corresponds to the at least one static electricity elimination device being located at a position corresponding to the at least one vent hole, respectively, wherein the machine platform body has a supporting surface, underneath which the static electricity elimination device is located, for receiving a substrate. The substrate-contact type apparatus includes the insulation machine platform.