Patents by Inventor Yann P M Nedelec

Yann P M Nedelec has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8105557
    Abstract: A microreactor assembly [100] is provided comprising a fluidic interconnect backbone [10] and plurality of fluidic microstructures. Interconnect input/output ports [12] of the fluidic interconnect backbone [10] are interfaced with microchannel input/output ports [14] of the fluidic microstructures at a plurality of non-polymeric interconnect seals [50]. Interconnect microchannels [15] are defined entirely by the fluidic interconnect backbone [10] and extend between the non-polymeric interconnect seals [50] without interruption by additional sealed interfaces. At least one of the fluidic microstructures [20, 30, 40] may comprise a mixing microstructure formed by a molding process. Another of the fluidic microstructures [20, 30, 40] may comprise an extruded reactor body. Still another fluidic microstructure [20, 30, 40] may comprise a quench-flow or hydrolysis microreactor formed by a hot-pressing method.
    Type: Grant
    Filed: January 28, 2009
    Date of Patent: January 31, 2012
    Assignee: Corning Incorporated
    Inventors: Jean-Pierre Henri Rene Lereboullet, Olivier Lobet, Yann P M Nedelec, Ronan Tanguy
  • Patent number: 8021739
    Abstract: A unitary structure (10) is comprised of two or more planar substrates (30, 40) fused together by a glass or glass-ceramic sintered frit structure (20) disposed therebetween. The pattern of the sintered patterned frit material defines passages (70) therein, and the sintered frit structure (20) has a characteristic minimum feature size (60) in a direction parallel to the substrates. Particles of the frit material have a poly-dispersed size distribution up to a maximum frit particle size, in a maximum length dimension, and the minimum feature size or dimension (60) of the sintered patterned frit material is greater than 2 times the maximum frit particle size, desirably about 3 times or more, and less than 6.25 times the maximum frit particle size, desirably about 5 times or less, most desirably about 4 times or less. A method for making the structure (10) is also disclosed.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: September 20, 2011
    Assignee: Corning Incorporated
    Inventor: Yann P M Nedelec
  • Patent number: 7753580
    Abstract: A class of designs is provided for a mixer in micro reactors where the design principle includes at least one injection zone in a continuous flow path where at least two fluids achieve initial upstream contact and an effective mixing zone (i.e. adequate flow of fluids and optimal pressure drop) containing a series of mixer elements in the path. Each mixer element is preferably designed with a chamber at each end in which an obstacle is placed (thereby reducing the typical inner dimension of the chamber) and with optional restrictions in the channel segments. The obstacles are preferably cylindrical pillars but can have any geometry within a range of dimensions and may be in series or parallel along the flow path to provide the desired flow-rate, mixing and pressure-drop. The injection zone may have two or more interfaces and may include one or more cores to control fluids before mixing.
    Type: Grant
    Filed: June 10, 2005
    Date of Patent: July 13, 2010
    Assignee: Corning, Incorporated
    Inventors: Pierre Woehl, Jean-Pierre Themont, Yann P M Nedelec
  • Publication number: 20090191102
    Abstract: A microreactor assembly [100] is provided comprising a fluidic interconnect backbone [10] and plurality of fluidic microstructures. Interconnect input/output ports [12] of the fluidic interconnect backbone [10] are interfaced with microchannel input/output ports [14] of the fluidic microstructures at a plurality of non-polymeric interconnect seals [50]. Interconnect microchannels [15] are defined entirely by the fluidic interconnect backbone [10] and extend between the non-polymeric interconnect seals [50] without interruption by additional sealed interfaces. At least one of the fluidic microstractures [20, 30, 40] may comprise a mixing microstructure formed by a molding process. Another of the fluidic microstructures [20, 30, 40] may comprise an extruded reactor body. Still another fluidic microstructure [20, 30, 40] may comprise a quench-flow or hydrolysis microreactor formed by a hot-pressing method.
    Type: Application
    Filed: January 28, 2009
    Publication date: July 30, 2009
    Inventors: Jean-Pierre Henri Rene Lereboullet, Olivier Lobet, Yann P. M. Nedelec, Ronan Tanguy
  • Publication number: 20070261750
    Abstract: A unitary structure (10) is comprised of two or more planar substrates (30, 40) fused together by a glass or glass-ceramic sintered patterned frit material (20) disposed therebetween. The pattern of the sintered patterned frit material defines passages (70) therein, and the sintered patterned frit material (20) has a characteristic minimum feature size (60) in a direction parallel to the substrates. Particles of the frit material have a poly-dispersed size distribution up to a maximum frit particle size, in a maximum length dimension, and the minimum feature size (60) of the sintered patterned frit material is greater than 2 times the maximum frit particle size, desirably about 3 times or more, and less than 6.25 times the maximum frit particle size, desirably about 5 times or less, most desirably about 4 times or less. A method for making the structure (10) is also disclosed.
    Type: Application
    Filed: March 9, 2007
    Publication date: November 15, 2007
    Inventor: Yann P. M. Nedelec
  • Patent number: 6770425
    Abstract: Self-aligned aperture masks are produced using a positive-acting photoresist (18) which is developed with a liquid developer. The apertures (30) of the mask have lower levels of inter-aperture variability than masks produced using mechanical transfer of toner particles (FIGS. 4-5 and 7-8), both for the apertures of a given mask and between masks.
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: August 3, 2004
    Assignee: Corning Incorporated
    Inventors: Michael D. Brady, Céline C. Guermeur, Yann P. M. Nédeléc
  • Publication number: 20030202244
    Abstract: Self-aligned aperture masks are produced using a positive-acting photoresist (18) which is developed with a liquid developer. The apertures (30) of the mask have lower levels of inter-aperture variability than masks produced using mechanical transfer of toner particles (FIGS. 4-5 and 7-8), both for the apertures of a given mask and between masks.
    Type: Application
    Filed: April 15, 2003
    Publication date: October 30, 2003
    Applicant: Corning Incorporated
    Inventors: Michael D. Brady, Celine C. Guermeur, Yann P. M. Nedelec
  • Publication number: 20020177082
    Abstract: Self-aligned aperture masks are produced using a positive-acting photoresist (18) which is developed with a liquid developer. The apertures (30) of the mask have lower levels of inter-aperture variability than masks produced using mechanical transfer of toner particles (FIGS. 4-5 and 7-8), both for the apertures of a given mask and between masks.
    Type: Application
    Filed: February 7, 2002
    Publication date: November 28, 2002
    Applicant: Corning Precision Lens Incorporated
    Inventors: Michael D. Brady, Celine C. Guermeur, Yann P. M. Nedelec