Patents by Inventor Yann Roussillon

Yann Roussillon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150263197
    Abstract: A photovoltaic device includes a substrate and has a transparent conductive oxide layer, a conductive back layer, and at least one intermediate semiconductor layer formed thereon. An isolation scribe divides and electrically isolates the oxide layer, the back layer and the semiconductor layer to define two photovoltaic cells. A conductor extends across the isolation scribe and connects the back layer of one photovoltaic cell to the oxide layer of the other photovoltaic cell.
    Type: Application
    Filed: March 13, 2015
    Publication date: September 17, 2015
    Inventors: Scott Jansen, Casimir P. Kotarba, Jonathan Pappas, Rick Powell, Yann Roussillon, Erica Van Nortwick, Charles Wickersham
  • Patent number: 8631757
    Abstract: Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber; at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
    Type: Grant
    Filed: February 11, 2009
    Date of Patent: January 21, 2014
    Assignee: Nanosolar, Inc.
    Inventors: Yann Roussillon, Jeremy H. Scholz, Addison Shelton, Geoff T. Green, Piyaphant Utthachoo
  • Patent number: 8601973
    Abstract: Methods and devices are provided for improved sputtering systems. In one embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
    Type: Grant
    Filed: September 2, 2008
    Date of Patent: December 10, 2013
    Assignee: Nanosolar, Inc.
    Inventors: Yann Roussillon, Piyaphant Utthachoo
  • Publication number: 20100300352
    Abstract: Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber; at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
    Type: Application
    Filed: October 17, 2008
    Publication date: December 2, 2010
    Inventors: Yann Roussillon, Piyaphant Utthachoo, Geoffrey T. Green, Addison Shelton, Jeremy H. Scholz
  • Publication number: 20100050935
    Abstract: Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber; at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
    Type: Application
    Filed: February 11, 2009
    Publication date: March 4, 2010
    Inventors: Yann Roussillon, Jeremy H. Scholz, Addison Shelton, Geoff T. Green, Piyaphant Utthachoo
  • Publication number: 20090120359
    Abstract: Methods and devices are provided for improved sputtering systems. In one embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
    Type: Application
    Filed: September 2, 2008
    Publication date: May 14, 2009
    Inventors: Yann Roussillon, Piyaphant Utthachoo
  • Publication number: 20090032108
    Abstract: An absorber layer of a photovoltaic device may be formed on an aluminum or metallized polymer foil substrate. A nascent absorber layer containing one or more elements of group IB and one or more elements of group IIIA is formed on the substrate. The nascent absorber layer and/or substrate is then rapidly heated from an ambient temperature to an average plateau temperature range of between about 200° C. and about 600° C. and maintained in the average plateau temperature range 1 to 30 minutes after which the temperature is reduced.
    Type: Application
    Filed: March 31, 2008
    Publication date: February 5, 2009
    Inventors: Craig Leidholm, Brent Bollman, Yann Roussillon
  • Publication number: 20080302413
    Abstract: An absorber layer of a photovoltaic device may be formed on an aluminum or metallized polymer foil substrate. A nascent absorber layer containing one or more elements of group IB and one or more elements of group IIIA is formed on the substrate. The nascent absorber layer and/or substrate is then rapidly heated from an ambient temperature to an average plateau temperature range of between about 200° C. and about 600° C. and maintained in the average plateau temperature range 1 to 30 minutes after which the temperature is reduced.
    Type: Application
    Filed: March 31, 2008
    Publication date: December 11, 2008
    Inventors: Craig Leidholm, Brent Bollman, Yann Roussillon
  • Patent number: 7098058
    Abstract: A method of making a photovoltaic device using light energy and a solution to normalize electric potential variations in the device. A semiconductor layer having nonuniformities comprising areas of aberrant electric potential deviating from the electric potential of the top surface of the semiconductor is deposited onto a substrate layer. A solution containing an electrolyte, at least one bonding material, and positive and negative ions is applied over the top surface of the semiconductor. Light energy is applied to generate photovoltage in the semiconductor, causing a redistribution of the ions and the bonding material to the areas of aberrant electric potential. The bonding material selectively bonds to the nonuniformities in a manner such that the electric potential of the nonuniformities is normalized relative to the electric potential of the top surface of the semiconductor layer. A conductive electrode layer is then deposited over the top surface of the semiconductor layer.
    Type: Grant
    Filed: January 13, 2005
    Date of Patent: August 29, 2006
    Assignee: University of Toledo
    Inventors: Victor G. Karpov, Yann Roussillon, Diana Shvydka, Alvin D. Compaan, Dean M. Giolando
  • Publication number: 20050257824
    Abstract: A photovoltaic cell can include a thin capping layer between a buffer layer and a first semiconductor layer to chemically and electrically isolate the buffer layer from the first semiconductor layer.
    Type: Application
    Filed: May 24, 2004
    Publication date: November 24, 2005
    Inventors: Michael Maltby, Dean Giolando, Yann Roussillon