Patents by Inventor Yanpo ZHAO

Yanpo ZHAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9903704
    Abstract: A three-DOF (Degree of Freedom) heterodyne grating interferometer displacement measurement system comprises a dual-frequency laser, a grating interferometer, a measurement grating, receivers and an electronic signal processing component; the grating interferometer comprises a polarizing beam splitter, a reference grating and dioptric elements; the measurement system realizes displacement measurement on the basis of grating diffraction, the optical Doppler Effect and the optical beat frequency principle. Three linear displacements can be output by the system when the grating interferometer and the measurement grating perform a three-DOF linear relative motion. The measurement system can reach sub-nanometer and higher resolution and precision, and can simultaneously measure three linear displacements.
    Type: Grant
    Filed: June 5, 2014
    Date of Patent: February 27, 2018
    Assignee: TSINGHUA UNIVERSITY
    Inventors: Yu Zhu, Leijie Wang, Ming Zhang, Zhao Liu, Rong Cheng, Kaiming Yang, Dengfeng Xu, Weinan Ye, Li Zhang, Yanpo Zhao, Huichao Qin, Li Tian, Jin Zhang, Wensheng Yin, Haihua Mu, Jinchun Hu
  • Patent number: 9904183
    Abstract: A coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100) of the reticle stage, a balance mass (200), a drive motor, a mask plate (101, 102), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.
    Type: Grant
    Filed: April 17, 2015
    Date of Patent: February 27, 2018
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Yu Zhu, Ming Zhang, Fan Zhi, Zhao Liu, Rong Cheng, Kaiming Yang, Li Zhang, Huichao Qin, Yanpo Zhao, Li Tian, Weinan Ye, Jin Zhang, Wensheng Yin, Haihua Mu, Jinchun Hu
  • Patent number: 9791789
    Abstract: A magnetically suspended coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100), a balance mass (200), a drive motor, a mask plate (101), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.
    Type: Grant
    Filed: April 17, 2015
    Date of Patent: October 17, 2017
    Assignees: TSINGHUA UNIVERSITY, BEIJING U-PRECISION TECH CO., LTD.
    Inventors: Ming Zhang, Yu Zhu, Fan Zhi, Rong Cheng, Kaiming Yang, Zhao Liu, Li Zhang, Huichao Qin, Yanpo Zhao, Li Tian, Weinan Ye, Jin Zhang, Wensheng Yin, Haihua Mu, Jinchun Hu
  • Publication number: 20170115580
    Abstract: A coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100) of the reticle stage, a balance mass (200), a drive motor, a mask plate (101, 102), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.
    Type: Application
    Filed: April 17, 2015
    Publication date: April 27, 2017
    Inventors: Yu ZHU, Ming ZHANG, Fan ZHI, Zhao LIU, Rong CHENG, Kaiming YANG, Li ZHANG, Huichao QIN, Yanpo ZHAO, Li TIAN, Weinan YE, Jin ZHANG, Wensheng YIN, Haihua MU, Jinchun HU
  • Publication number: 20170052461
    Abstract: A magnetically suspended coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100), a balance mass (200), a drive motor, a mask plate (101), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.
    Type: Application
    Filed: April 17, 2015
    Publication date: February 23, 2017
    Inventors: Ming ZHANG, Yu ZHU, Fan ZHI, Rong CHENG, Kaiming YANG, Zhao LIU, Li ZHANG, Huichao QIN, Yanpo ZHAO, Li TIAN, Weinan YE, Jin ZHANG, Wensheng YIN, Haihua MU, Jinchun HU
  • Publication number: 20160153764
    Abstract: A three-DOF (Degree of Freedom) heterodyne grating interferometer displacement measurement system comprises a dual-frequency laser, a grating interferometer, a measurement grating, receivers and an electronic signal processing component; the grating interferometer comprises a polarizing spectroscope, a reference grating and dioptric elements; the measurement system realizes displacement measurement on the basis of grating diffraction, the optical Doppler Effect and the optical beat frequency principle. Three linear displacements can be output by the system when the grating interferometer and the measurement grating perform a three-DOF linear relative motion. The measurement system can reach sub-nanometer and even higher resolution and precision, and can simultaneously measure three linear displacements. The measurement system has the advantages of being environmentally insensitive, high in measurement precision, small in size, light in weight, etc.
    Type: Application
    Filed: June 5, 2014
    Publication date: June 2, 2016
    Inventors: Yu ZHU, Leijie WANG, Ming ZHANG, Zhao LIU, Rong CHENG, Kaiming YANG, Dengfeng XU, Weinan YE, Li ZHANG, Yanpo ZHAO, Huichao QIN, Li TIAN, Jin ZHANG, Wensheng YIN, Haihua MU, Jinchun HU
  • Publication number: 20160138903
    Abstract: A two-DOF heterodyne grating interferometer displacement measurement system, comprising a dual-frequency laser, a grating interferometer, a measurement grating, receivers and an electronic signal processing component, wherein the grating interferometer comprises a polarizing spectroscope, a reference grating and dioptric elements. The measurement system achieves the displacement measurement on the basis of the grating diffraction, the optical Doppler effect and the optical beat frequency principle. When the grating interferometer and the measurement grating conduct two-DOF linear relative motion, the system can output two linear displacements. The measurement system can achieve sub-nanometer or even higher resolution and accuracy, and can simultaneously measure two linear displacements.
    Type: Application
    Filed: June 5, 2014
    Publication date: May 19, 2016
    Applicant: TSINGHUA UNIVERSITY
    Inventors: Ming ZHANG, Yu ZHU, Leijie WANG, Kaiming YANG, Zhao LIU, Rong CHENG, Hao LIU, Dengfeng XU, Weinan YE, Li ZHANG, Yanpo ZHAO, Li TIAN, Jin ZHANG, Jinchun HU, Haihua MU, Wensheng YIN, Huichao QIN