Abstract: Provided herein are novel compounds, for example, compounds having a Formula (I), or a pharmaceutically acceptable N salt thereof. Also provided herein are methods of preparing the compounds and methods of using the compounds, for example, in inhibiting TYK2, and/or function of IL-12, IL-23 and/or INF-alpha, and/or in treating various associated diseases or disorders.

Abstract: A transmitting apparatus includes a signal generation circuit and an adjustment circuit. The signal generation circuit is configured to send, to a receiving apparatus, a serial data signal that carries a training sequence and valid data, where the training sequence is used to train a skew or an equalization of the serial data signal, and the valid data is used to detect an amplitude of the serial data signal. The adjustment circuit is configured to receive indication information from the receiving apparatus, and adjust a transmission parameter of the serial data signal based on the indication information, where the transmission parameter includes at least one of the skew, the equalization, or the amplitude.

Abstract: Disclosed is a method for efficiently synthesizing primary amines, which comprises using carbonyl compounds or alcohol compounds as reaction substrate, liquid ammonia or alcohol solutions of ammonia as nitrogen source, and hydrogen as hydrogen source, and reacting in reaction medium catalyzed by a cobalt-based catalyst to obtain the primary amines. Due to high catalytic activity, the method can realize the reductive amination of carbonyl compounds and the hydrogen-borrowing amination of alcohol compounds at low temperatures in a short time to obtain the primary amines with high yield, and is applicable to a wide range of substrates. The obtained primary amines can be used as raw materials with high extra value for producing polymers, medicines, dyes and surfactants. Further, the cobalt-based catalyst has a good industrial application prospect because it is magnetic which can facilitate separation and recycling of the catalyst.

Abstract: The present disclosure provides a secondary imaging optical lithography method and apparatus.

Abstract: Disclosed is a method for efficiently synthesizing primary amines, which comprises using carbonyl compounds or alcohol compounds as reaction substrate, liquid ammonia or alcohol solutions of ammonia as nitrogen source, and hydrogen as hydrogen source, and reacting in reaction medium catalyzed by a cobalt-based catalyst to obtain the primary amines. Due to high catalytic activity, the method can realize the reductive amination of carbonyl compounds and the hydrogen-borrowing amination of alcohol compounds at low temperatures in a short time to obtain the primary amines with high yield, and is applicable to a wide range of substrates. The obtained primary amines can be used as raw materials with high extra value for producing polymers, medicines, dyes and surfactants. Further, the cobalt-based catalyst has a good industrial application prospect because it is magnetic which can facilitate separation and recycling of the catalyst.

Abstract: Disclosed is a method for preparing aromatic hydrocarbons by hydrocracking a polymer containing aromatic rings, which includes reacting the polymer fragment with hydrogen under the action of a catalyst at a temperature of no more than 350° C.; separating a reaction product to obtain the aromatic hydrocarbons. The catalyst comprises a carrier and an active ingredient supported on the carrier, the active ingredient is at least one selected from Ru, Rh, Pt, Pd, Fe, Ni, Cu and Co, the carrier is at least one selected from metal oxide, phosphate, molecular sieve, SiO2 and sulfonated carbon, the metal oxide is at least one selected from Al2O3, Nb2O5, Nb2O5—Al2O3, Nb2O5—SiO2, TiO2, ZrO2, CeO2 and MoO3; the phosphate is at least one selected from NbOPO4 and ZrOPO4; and the molecule sieve is at least one selected from Nb-SBA-15, Nafion, H-ZSM-5, H-Beta and H-Y.

Abstract: The present disclosure relates to a field of dry etching technology. The present disclosure provides an ultra-large area scanning reactive ion etching machine and an etching method thereof. The ultra-large area scanning reactive ion etching machine includes: an injection chamber (101), an etching reaction chamber (102), a transition chamber (103), and an etching ion generation chamber (104). By moving a sample holder (111) among the injection chamber (100), the etching reaction chamber (102) and the transition chamber (103) in a scanning direction, a scanning etching is performed on a sample (100) placed on the sample holder (111), which may realize a large-area, uniform and efficient etching.

Abstract: Disclosed is a method for preparing aromatic hydrocarbons by hydrocracking a polymer containing aromatic rings, which includes reacting the polymer fragment with hydrogen under the action of a catalyst at a temperature of no more than 350° C.; separating a reaction product to obtain the aromatic hydrocarbons. The catalyst comprises a carrier and an active ingredient supported on the carrier, the active ingredient is at least one selected from Ru, Rh, Pt, Pd, Fe, Ni, Cu and Co, the carrier is at least one selected from metal oxide, phosphate, molecular sieve, SiO2 and sulfonated carbon, the metal oxide is at least one selected from Al2O3, Nb2O5, Nb2O5—Al2O3, Nb2O5—SiO2, TiO2, ZrO2, CeO2 and MoO3; the phosphate is at least one selected from NbOPO4 and ZrOPO4; and the molecule sieve is at least one selected from Nb-SBA-15, Nafion, H-ZSM-5, H-Beta and H-Y.

Abstract: The present disclosure proposes an apparatus for coating photoresist and a method for coating photoresist. The apparatus for coating photoresist comprises a gas supply unit (10) configured to supply gas to a photoresist application unit (20); wherein the photoresist application unit (20) comprises: a device cavity (202) enclosed by sidewalls, a bottom plate and a cover plate (206), a rotation platform (204) configured to carry a substrate (205) and bring the substrate to rotate; a guide unit conformal with the substrate, and configured to uniformly blow the gas supplied by the gas supply unit over a surface of the substrate on which the photoresist is coated; and a gas extraction unit (203) configured to extract gas from the device cavity (202). The present disclosure realizes uniformly and rapidly coating the photoresist on a large substrate.

Abstract: The embodiments of the present disclosure propose a negative refraction imaging lithographic method and equipment. The lithographic method includes: coating photoresist on a device substrate; fabricating a negative refraction imaging structure, wherein the negative refraction imaging structure exhibits optical negative refraction in response to beam emitted by exposure source; pressing a mask to be close to the negative refraction imaging structure; disposing the mask and the negative refraction imaging structure above the device substrate at a projection distance; and light emitted by the exposure source passes through the mask, the negative refraction imaging structure, the projection gap and is sequentially projected onto the photoresist for exposure.

Abstract: The present disclosure proposes an apparatus for coating photoresist and a method for coating photoresist. The apparatus for coating photoresist comprises a gas supply unit (10) configured to supply gas to a photoresist application unit (20); wherein the photoresist application unit (20) comprises: a device cavity (202) enclosed by sidewalls, a bottom plate and a cover plate (206), a rotation platform (204) configured to carry a substrate (205) and bring the substrate to rotate; a guide unit conformal with the substrate, and configured to uniformly blow the gas supplied by the gas supply unit over a surface of the substrate on which the photoresist is coated; and a gas extraction unit (203) configured to extract gas from the device cavity (202). The present disclosure realizes uniformly and rapidly coating the photoresist on a large substrate.

Abstract: The present disclosure provides a secondary imaging optical lithography method and apparatus.

Abstract: A method for regulating the phase of a wide-band electromagnetic wave uses a meta-surface sub-wavelength structure and the meta-surface sub-wavelength structure. The sub-wavelength structure is used as a basic unit of the meta-surface, and the basic unit is arranged in an array according to a regular order determined by the predetermined phase to generate a geometrical phase distribution with the spatial continuity and the spectral achromaticity between 0 and 2?, so that the phase is controlled and modulated in a two dimensional plane. The operating bandwidth may cover the entire electromagnetic spectrum, and a variety of optical devices such as reflective focusing/imaging elements, transmission focusing/imaging elements, prisms, orbital angular momentum generator may be realized. As an extension of the phase regulation, the method may also realize other novel electromagnetic wave functions such as wideband absorption and radar cross section reduction.

Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.

Abstract: Methods and systems for producing isosorbide from biomass are disclosed. In one embodiment, a method of producing isosorbide from biomass may include contacting biomass, a catalyst mixture of a noble metal and a first solid acid, and hydrogen to form a first reaction mixture, and heating the first reaction mixture to form at least one intermediate compound. Further, the intermediate compound is contacted with a second solid acid to form a second reaction mixture, and heating the second reaction mixture to form isosorbide.

Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.

Abstract: Methods and systems for producing one or more alkanes from biomass by hydrodeoxygenation are disclosed. Biomass may be converted to one or more alkanes by heating the biomass with a catalyst mixture that includes a noble metal and at least one of a transition metal and derivative thereof. The catalyst mixture may further include a solid acid. Heating may be performed at a single temperature and pressure.