Abstract: A photomask includes a transparent substrate for passage of an exposure light, and a plurality of photomask pattern units formed on a surface of the transparent substrate. Each of the photomask pattern units includes a first light-blocking layer connected to the surface of the transparent substrate, and a second light-blocking layer formed on a surface of the first light-blocking layer opposite to the transparent substrate. The first and second light-blocking layers block the exposure light, or permit passage of light energy lower than threshold energy of photoresist on the substrate.

Abstract: A method for double patterning lithography which is applied to a semiconductor substrate to form a plurality of trenches, includes a pattern formation process. In the pattern formation process, a plurality of predetermined patterns corresponding to the trenches are formed by using a graphic data system. A first pattern file and second pattern file are respectively formed. The first pattern file and the second pattern file respectively include a plurality of first patterns and a plurality of second patterns. The first patterns and the second patterns are intersected with each other to define a plurality of overlapped regions corresponding to the predetermined patterns. At least one of the first pattern file and the second file includes a plurality of dummy patterns therebeside. A photomask layout for double patterning lithography is also provided.

Abstract: A photomask includes a transparent substrate for passage of an exposure light, and a plurality of photomask pattern units formed on a surface of the transparent substrate. Each of the photomask pattern units includes a first light-blocking layer connected to the surface of the transparent substrate, and a second light-blocking layer formed on a surface of the first light-blocking layer opposite to the transparent substrate. The first and second light-blocking layers block the exposure light, or permit passage of light energy lower than threshold energy of photoresist on the substrate.

Abstract: A cushioning mechanism for shoe midsole in one embodiment includes a base affixed to an outsole of the shoe and including a front cavity; a pivot member affixed to an insole of the shoe, a front end of the pivot member being pivotably secured to that of the base and the pivot member including a projecting element on a bottom, the projecting element having a concave portion; a cushioning member disposed in the cavity; a transverse sliding member disposed in a rear end of the cushioning member and having a concave portion; and an inclined suspension member having one end urged against the concave portion of the projecting element and retained thereat, and the other end urged against the concave portion of the sliding member and retained thereat.