Abstract: A method for manufacturing a grating is provided. The method includes the steps as follows: a) forming a first insulating layer on a substrate; b) forming a silicon oxide layer on the first insulating layer; c) forming and hard baking a photoresist on the silicon oxide layer for defining a plurality of specific zones; d) etching the first insulating layer and the silicon oxide layer within the specific zones respectively for forming a plurality of concaves; e) forming a second insulating layer on the silicon oxide layer; f) defining a plurality of grating zones onto the second insulating layer, and forming an adhesive layer and a conductive layer on the grating zones in sequence; g) removing parts of the second insulating layer located outside of the grating zones; and h) removing the silicon oxide layer for exposing a plurality of grating structures within the grating zone.

Abstract: The micro grating structure is provided. The micro grating structure includes a substrate; a first supporting structure and a second supporting structure; a first structure post and a second structure post, wherein the first structure post and the second structure post are mounted on the substrate between the first supporting structure and the second supporting structure; and a grating mounted between the first structure post and the second structure post and comprising a first, a second, a third and a fourth torsion beams, wherein the first and the second torsion beams are connected to the first and the second supporting structures respectively, the third and the fourth torsion beams are connected to the first and the second structure posts respectively, and the first, the second, the third and the fourth torsion beams are twisted by an electrostatic force so as to enable the grating to be inclined at an angle with respect to the substrate.

Abstract: The micro grating structure is provided. The micro grating structure includes a substrate; a first supporting structure and a second supporting structure; a first structure post and a second structure post, wherein the first structure post and the second structure post are mounted on the substrate between the first supporting structure and the second supporting structure; and a grating mounted between the first structure post and the second structure post and comprising a first, a second, a third and a fourth torsion beams, wherein the first and the second torsion beams are connected to the first and the second supporting structures respectively, the third and the fourth torsion beams are connected to the first and the second structure posts respectively, and the first, the second, the third and the fourth torsion beams are twisted by an electrostatic force so as to enable the grating to be inclined at an angle with respect to the substrate.

Abstract: A method for manufacturing a grating is provided. The method includes the steps as follows: a) forming a first insulating layer on a substrate; b) forming a silicon oxide layer on the first insulating layer; c) forming and hard baking a photoresist on the silicon oxide layer for defining a plurality of specific zones; d) etching the first insulating layer and the silicon oxide layer within the specific zones respectively for forming a plurality of concaves; e) forming a second insulating layer on the silicon oxide layer; f) defining a plurality of grating zones onto the second insulating layer, and forming an adhesive layer and a conductive layer on the grating zones in sequence; g) removing parts of the second insulating layer located outside of the grating zones; and h) removing the silicon oxide layer for exposing a plurality of grating structures within the grating zone.