Patents by Inventor Yao-I Tung

Yao-I Tung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • OPERATIVE METHOD OF A MANUFACTURING SYSTEM
    Publication number: 20080279674
    Abstract: An operative method of a manufacturing system for processing a substrate is provided. The manufacturing system includes at least a handling system, two deposition apparatus groups, an etching apparatus group, a photolithography apparatus group and two photoresist-striping apparatus groups. The handling system has a plurality of handling paths comprising at least two connected ring paths, which are connected in a common path. These deposition apparatus groups and the photoresist-striping apparatus groups are located on the two ring paths respectively. The etching apparatus group is located on the common path. The photolithography apparatus group is located on the two ring paths between the two deposition apparatus groups. The manufacturing system of the present invention thus combines the advantages of the group-type manufacturing system and the continuous-type manufacturing system.
    Type: Application
    Filed: July 22, 2008
    Publication date: November 13, 2008
    Applicant: Chunghwa Picture Tubes, LTD.
    Inventors: Yao-I Tung, Yu-Jen Tsai, Wei-Liang Lee, Ching-Hsiang Chang, Sung-Hsing Yeh
  • Manufacturing system and operative method thereof
    Publication number: 20060182542
    Abstract: A manufacturing system is provided. The manufacturing system includes at least a handling system, two deposition apparatus groups, an etching apparatus group, a photolithography apparatus group and two photoresist-striping apparatus groups. The handling system has a plurality of handling paths comprising at least two connected ring paths, which are connected in a common path. These deposition apparatus groups and the photoresist-striping apparatus groups are located on the two ring paths respectively. The etching apparatus group is located on the common path. The photolithography apparatus group is located on the two ring paths between the two deposition apparatus groups. The manufacturing system of the present invention thus combines the advantages of the group-type manufacturing system and the continuous-type manufacturing system.
    Type: Application
    Filed: June 23, 2005
    Publication date: August 17, 2006
    Inventors: Yao-I Tung, Yu-Jen Tsai, Wei-Liang Lee, Ching-Hsiang Chang, Sung-Hsing Yeh