Patents by Inventor Yao-Jen Yeh

Yao-Jen Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11164722
    Abstract: A method of tuning an ion implantation apparatus is disclosed. The method includes operations of applying any wafer acceptance test (WAT) recipe to a test sample, calculating a recipe for a direct current (DC) final energy magnet (FEM), calculating a real energy of the DC FEM, verifying the tool energy shift, and obtaining a peak spectrum of the DC FEM.
    Type: Grant
    Filed: July 29, 2019
    Date of Patent: November 2, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yi-Hsiung Lin, Yao-Jen Yeh, Chia-Lin Ou, Cheng-En Lee, Hsuan-Pang Liu
  • Publication number: 20210043422
    Abstract: The present disclosure relates to a method includes generating ions with an ion source of an ion implantation apparatus based on an ion implantation recipe. The method includes accelerating the generated ions based on an ion energy setting in the ion implantation recipe and determining an energy spectrum of the accelerated ions. The method also includes analyzing a relationship between the determined energy spectrum and the ion energy setting. The method further includes adjusting at least one parameter of a final energy magnet (FEM) of the ion implantation apparatus based on the analyzed relationship.
    Type: Application
    Filed: October 26, 2020
    Publication date: February 11, 2021
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Hsiung Lin, Cheng-En Lee, Chia-Lin Ou, Hsuan-Pang Liu, Yao-Jen Yeh
  • Patent number: 10818473
    Abstract: The present disclosure relates to a method includes generating ions with an ion source of an ion implantation apparatus based on an ion implantation recipe. The method includes accelerating the generated ions based on an ion energy setting in the ion implantation recipe and determining an energy spectrum of the accelerated ions. The method also includes analyzing a relationship between the determined energy spectrum and the ion energy setting. The method further includes adjusting at least one parameter of a final energy magnet (FEM) of the ion implantation apparatus based on the analyzed relationship.
    Type: Grant
    Filed: August 13, 2019
    Date of Patent: October 27, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Hsiung Lin, Cheng-En Lee, Chia-Lin Ou, Hsuan-Pang Liu, Yao-Jen Yeh
  • Publication number: 20200058465
    Abstract: The present disclosure relates to a method includes generating ions with an ion source of an ion implantation apparatus based on an ion implantation recipe. The method includes accelerating the generated ions based on an ion energy setting in the ion implantation recipe and determining an energy spectrum of the accelerated ions. The method also includes analyzing a relationship between the determined energy spectrum and the ion energy setting. The method further includes adjusting at least one parameter of a final energy magnet (FEM) of the ion implantation apparatus based on the analyzed relationship.
    Type: Application
    Filed: August 13, 2019
    Publication date: February 20, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Hsiung LIN, Cheng-En LEE, Chia-Lin OU, Hsuan-Pang LIU, Yao-Jen YEH
  • Publication number: 20200043700
    Abstract: A method of tuning an ion implantation apparatus is disclosed. The method includes operations of applying any wafer acceptance test (WAT) recipe to a test sample, calculating a recipe for a direct current (DC) final energy magnet (FEM), calculating a real energy of the DC FEM, verifying the tool energy shift, and obtaining a peak spectrum of the DC FEM.
    Type: Application
    Filed: July 29, 2019
    Publication date: February 6, 2020
    Inventors: Yi-Hsiung LIN, Yao-Jen YEH, Chia-Lin OU, Cheng-En LEE, Hsuan-Pang LIU
  • Publication number: 20150211675
    Abstract: A device adjustable support comprises a bracket plate and a coupling mechanism including: a guiding track that is securely integrated with the bracket plate and that extends along a first curved and non-circumferential line; a course-keeping member that is integrated with the bracket plate; a first connector that is connected slidably to the guiding track so as to be slidable on the bracket plate along the first curved and non-circumferential line; and a second connector that is connected movably to the course-keeping member so as to keep sliding movement of the first connector along the guiding track.
    Type: Application
    Filed: January 27, 2014
    Publication date: July 30, 2015
    Applicant: Top Victory Investments Limited
    Inventors: Jenq-Huey SHYU, Yao-Jen Yeh, Tung-Jung Hsueh, Chia-Yu Liu, Yi-Sheng Lin