Patents by Inventor Yao-Jheng HUANG

Yao-Jheng HUANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11753568
    Abstract: An adhesive composition includes 0.1 to 1 part by weight of nano panicles, 50 to 95 parts by weight of acrylate resin, and 5 to 50 parts by weight of a monomer or oligomer of acrylate or acrylic acid containing multi-functional groups, and the acrylate resin and the monomer or oligomer of acrylate or acrylic acid containing multi-functional groups have a total weight of 100 parts by weight, in which the acrylate resin has a weight average molecular weight of 100,000 to 1,500,000. The nano particle has a shell covering parts of the surface of the core, and acrylate groups grafted to the surface of the core.
    Type: Grant
    Filed: February 28, 2022
    Date of Patent: September 12, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tzung Wu, Te-Yi Chang, Yao-Jheng Huang, Yu-Chin Lin, Chen-Cheng Yu, Yu-Ying Hsu, Shuang-Huei Chen
  • Publication number: 20230183533
    Abstract: An adhesive composition includes 0.1 to 1 part by weight of nano panicles, 50 to 95 parts by weight of acrylate resin, and 5 to 50 parts by weight of a monomer or oligomer of acrylate or acrylic acid containing multi-functional groups, and the acrylate resin and the monomer or oligomer of acrylate or acrylic acid containing multi-functional groups have a total weight of 100 parts by weight, in which the acrylate resin has a weight average molecular weight of 100,000 to 1,500,000. The nano particle has a shell covering parts of the surface of the core, and acrylate groups grafted to the surface of the core.
    Type: Application
    Filed: February 28, 2022
    Publication date: June 15, 2023
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tzung WU, Te-Yi CHANG, Yao-Jheng HUANG, Yu-Chin LIN, Chen-Cheng YU, Yu-Ying HSU, Shuang-Huei CHEN
  • Patent number: 11675266
    Abstract: A patterning method includes providing a photosensitive composition on a material layer. The photosensitive composition includes one part by weight of a photo sensitive compound, 1.5 to 8 parts by weight of a resin, and 10 to 40 parts by weight of a diluent. The photosensitive compound has a chemical structure of The patterning method further includes removing the diluent in the photosensitive composition to form a photoresist layer, exposing the photoresist layer, and removing an exposed part of the photoresist layer to expose a part of the material layer.
    Type: Grant
    Filed: September 22, 2021
    Date of Patent: June 13, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yao-Jheng Huang, Te-Yi Chang, Chin-Hua Chang, Ming-Tzung Wu, Yu-Ying Hsu
  • Publication number: 20230039398
    Abstract: An impregnation liquid is provided, which includes (A) phenolic resin, (B) diazonaphthoquinone-based compound or a derivative thereof, (C) ionic compound, and (D) organic solvent. The weight of (A) phenolic resin and the weight of (B) diazonaphthoquinone-based compound or a derivative thereof have a ratio of 0.2:0.8 to 0.9:0.1, and the weight of (C) ionic compound and the total weight of (A) phenolic resin and (B) diazonaphthoquinone-based compound or a derivative thereof have a ratio of 0.2:1 to 1.4:1. The impregnation liquid can be used to form an activated carbon layer to wrap and to be directly in contact with the surface of a mesh.
    Type: Application
    Filed: December 10, 2021
    Publication date: February 9, 2023
    Applicant: Industrial Technology Research Institute
    Inventors: Ching-Mao WU, Te-Yi CHANG, Szu-Yin LIN, Yao-Jheng HUANG
  • Publication number: 20220334480
    Abstract: A patterning method includes providing a photosensitive composition on a material layer. The photosensitive composition includes one part by weight of a photo sensitive compound, 1.5 to 8 parts by weight of a resin, and 10 to 40 parts by weight of a diluent. The photosensitive compound has a chemical structure of The patterning method further includes removing the diluent in the photosensitive composition to form a photoresist layer, exposing the photoresist layer, and removing an exposed part of the photoresist layer to expose a part of the material layer.
    Type: Application
    Filed: September 22, 2021
    Publication date: October 20, 2022
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yao-Jheng HUANG, Te-Yi CHANG, Chin-Hua CHANG, Ming-Tzung WU, Yu-Ying HSU
  • Patent number: 10533088
    Abstract: A copolymer is provided, which includes 1 part by mole of a repeating unit represented by Formula 1, 3 to 10 parts by mole of a repeating unit represented by Formula 2, and 5 to 15 parts by mole of a repeating unit represented by Formula 3. R1 is hydrogen or methyl; R2 is a single bond or C1-3 alkylene group; R3 is a polysiloxy group with vinyl and aromatic group; and each of R4 and R5 is independently hydrogen, C1-3 alkyl or a polysiloxy group with vinyl and aromatic group.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: January 14, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yao-Jheng Huang, Yun-Yu Lai, Ming-Tzung Wu, Te-Yi Chang
  • Publication number: 20190241730
    Abstract: A copolymer is provided, which includes 1 part by mole of a repeating unit represented by Formula 1, 3 to 10 parts by mole of a repeating unit represented by Formula 2, and 5 to 15 parts by mole of a repeating unit represented by Formula 3. R1 is hydrogen or methyl; R2 is a single bond or C1-3 alkylene group; R3 is a polysiloxy group with vinyl and aromatic group; and each of R4 and R5 is independently hydrogen, C1-3 alkyl or a polysiloxy group with vinyl and aromatic group.
    Type: Application
    Filed: August 14, 2018
    Publication date: August 8, 2019
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yao-Jheng HUANG, Yun-Yu LAI, Ming-Tzung WU, Te-Yi CHANG
  • Patent number: 9698377
    Abstract: A copolymer according to the present disclosure is provided, which includes 30 to 80 mol % of a repeating unit represented by formula (I), 5 to 25 mol % of a repeating unit represented by formula (II), and 5 to 30 mol % of a repeating unit represented by formula (III): wherein R1 is C6-C13 aryl group, C7-C13 aralkyl group, C6-C8 halogenated aryl group or C7-C8 aryloxyalkyl group; R3 is C3-C16 alkyl group or C3-C6 alkoxy substituted alkyl group; R5 is a single bond or C1-C3 alkylene group, R6 and R7 are independently C1-C3 alkoxy group, R8 is polysiloxane with methyl and phenyl groups; and R2, R4 and R9 are independently hydrogen or methyl. In addition, a resin composition, a packaging film and a package structure including the same are provided.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: July 4, 2017
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tzung Wu, Te-Yi Chang, Yao-Jheng Huang, Yun-Yu Lai
  • Patent number: 9556282
    Abstract: A modified cellulose is provided. The modified cellulose is represented by the chemical formula (1): wherein n is between 60 and 2500, at least one R is selected from one of the group consisting of R1 is C11 to C32 alkyl group or C11 to C32 alkenyl group, R2 is hydrogen, C3 to C29 alkyl group or C3 to C29 alkenyl group, R3 is C3 to C29 alkyl group or C3 to C29 alkenyl group, R4 is C4 to C8 cycloalkyl group or C4 to C8 cycloalkenyl group, n2 is between 15 and 33, n4 is between 20 and 40.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: January 31, 2017
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Ying Hsu, Te-Yi Chang, Ju-Feng Liao, Sheng-Ju Liao, Yao-Jheng Huang
  • Publication number: 20160185878
    Abstract: A modified cellulose is provided. The modified cellulose is represented by the chemical formula (1): wherein n is between 60 and 2500, at least one R is selected from one of the group consisting of R1 is C11 to C32 alkyl group or C11 to C32 alkenyl group, R2 is hydrogen, C3 to C29 alkyl group or C3 to C29 alkenyl group, R3 is C3 to C29 alkyl group or C3 to C29 alkenyl group, R4 is C4 to C8 cycloalkyl group or C4 to C8 cycloalkenyl group, n2 is between 15 and 33, n4 is between 20 and 40.
    Type: Application
    Filed: December 10, 2015
    Publication date: June 30, 2016
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Ying HSU, Te-Yi CHANG, Ju-Feng LIAO, Sheng-Ju LIAO, Yao-Jheng HUANG