Abstract: A headphone and a headphone status detection method are provided. A signal processor of the headphone transmits a plurality of code messages to a first audio playback unit, so that the first audio playback unit plays a plurality of first audio signals with different frequencies corresponding to the code messages according to a playback sequence. The signal processor obtains a plurality of first time points at which a first audio receiving unit receives the first audio signals that are reflected for the first time. The signal processor determines a wear status of the headphone according to the plurality of first time points.

Abstract: A method for cleaning the surface of an electrostatic chuck of a semiconductor apparatus is disclosed. The semiconductor apparatus includes a sputtering chamber having an electrostatic chuck for holding a wafer. This method includes the steps of: adjusting the semiconductor apparatus to a cleaning state and a type of plasma is being generated at this time by which oxidative contaminant is removed, and adjusting the semiconductor apparatus to a discharging state to stop the plasma. The cleaning state includes at least three steps: inserting a protective gas, adjusting the RF power to an appropriate range, and maintaining the radio frequency power within the appropriate range for a period of time. The discharging state includes at least two steps: resetting the RF power of said electrostatic chuck to zero, and discharging the protective gas from the sputtering chamber.