Abstract: A method of forming a layer of a hard, abrasion, and corrosion-resistant hydrogenated carbon (C:H) material on a substrate surface comprises steps of: (a) providing a vacuum chamber including a carbon sputtering target in the interior space thereof; (b) providing a substrate in the chamber interior space, a surface of the substrate the sputtering target; (c) supplying the vacuum chamber with at least one hydrocarbon gas and at least one inert gas at separately controllable flow rates and applying a sufficient negative potential to the carbon target to generate a plasma in said interior space to deposit a layer of the C:H material on the substrate surface by a process comprising simultaneous sputtering of the carbon sputtering target and plasma enhanced chemical vapor deposition (PECVD) of carbon and hydrogen from the hydrocarbon gas, wherein: step (c) includes separately controlling the flow rates of each of the hydrocarbon and inert gases such that the amount of C atoms in the C:H which are contributed b

Abstract: A non-arcing bias rail assembly for supplying an electrical bias potential to a moving workpiece/substrate holder, comprising an elongated metal strip adapted for mounting along a wall of a workpiece/substrate treatment apparatus and having a surface bounded by first and second opposed, laterally extending side edges; a bracket comprised of an electrically insulating material and including a first portion mounted on the surface adjacent to and extending along a portion of the first side edge, and a second portion forming an upstanding wall extending perpendicularly from the first portion and including a surface facing the second side edge of the metal strip; an electrically conductive bias contact spring assembly mounted on the upstanding wall of the bracket facing the second side edge; and electrically insulated wire means electrically connected to the bias contact spring assembly for supplying an electrical bias potential.