Patents by Inventor Yaofeng SUN

Yaofeng SUN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11656291
    Abstract: Used batteries are screened based on a measured Constant-Current Impulse Ratio. A used battery is charged using a Constant Current (CC) until a voltage target is reached, and the current integrated to obtain the CC charge applied, QCC. Then the battery continues to be charged using a Constant Voltage (CV) of the voltage target until the charging current falls to a minimum current target. The current is integrated over the CV period to obtain the CV charge applied, QCV. The measured CCIR is the ratio of QCC to (QCC+QCV). The measured CCIR is input to a calibration curve function to obtain a modeled State of Health (SOH) value. The used battery is sorted for reuse or disposal based on the modeled SOH value. The calibration curve function is obtained by aging new batteries to obtain CCIR and SOH data that are modeled using a neural network.
    Type: Grant
    Filed: February 8, 2021
    Date of Patent: May 23, 2023
    Inventors: Minjie Xu, Liya Zheng, Yaofeng Sun
  • Patent number: 11644513
    Abstract: A Battery Management System (BMS) inspects a battery pack using AC impedance. A controller on the BMS drives a Pulse-Width Modulation (PWM) output signal to an on-board excitation regulator such as a synchronous buck converter that modulates a limited energy unit such as a capacitor with a swept frequency of a PWM input signal. The capacitor modulations are applied to a terminal of the battery pack as an AC excitation signal. Synchronous sampling of the battery pack provides responses to the AC excitation signal. An AC excitation signal current and a battery response voltage are processed and Fourier-transformed to generate a Nyquist plot of the excitation-response data. Curve shifts can indicate worn battery cells. The capacitor generating the AC excitation signal draws little energy from the battery pack so AC impedance inspection can occur during all modes: charging, discharging, and idle modes without an external power supply.
    Type: Grant
    Filed: January 7, 2022
    Date of Patent: May 9, 2023
    Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
    Inventors: Wenlong Ding, Meng Chen, Yaofeng Sun, Manxin Chen
  • Patent number: 11422199
    Abstract: A used battery is discharged for a short time from a first Open Circuit Voltage (OCV1) to a second OCV2 and the discharge current ?Q measured. OCV1 is input to a calibration curve model to obtain a first modeled State of Charge (SOC1) value, and OCV2 is input to the calibration curve model to obtain a second modeled SOC2 value. The State of Health (SOH) is calculated as ?Q/[Qnew×(SOC1?SOC2)], where Qnew is the battery capacity when new. The used battery is sorted for reuse or disposal based on the SOH value. The calibration curve model is obtained by Artificial Intelligence (AI) modeling of OCV, SOC datapoints from fully charging and discharging used batteries. Only OCV values within a target region having a low first derivative of SOC as a function of OCV are modeled, and OCV1 and OCV2 are within this target region.
    Type: Grant
    Filed: June 17, 2021
    Date of Patent: August 23, 2022
    Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
    Inventors: Minjie Xu, Yaofeng Sun
  • Publication number: 20220252674
    Abstract: Used batteries are screened based on a measured Constant-Current Impulse Ratio. A used battery is charged using a Constant Current (CC) until a voltage target is reached, and the current integrated to obtain the CC charge applied, QCC. Then the battery continues to be charged using a Constant Voltage (CV) of the voltage target until the charging current falls to a minimum current target. The current is integrated over the CV period to obtain the CV charge applied, QCV. The measured CCIR is the ratio of QCC to (QCC+QCV). The measured CCIR is input to a calibration curve function to obtain a modeled State of Health (SOH) value. The used battery is sorted for reuse or disposal based on the modeled SOH value. The calibration curve function is obtained by aging new batteries to obtain CCIR and SOH data that are modeled using a neural network.
    Type: Application
    Filed: February 8, 2021
    Publication date: August 11, 2022
    Inventors: Minjie XU, Liya ZHENG, Yaofeng SUN
  • Publication number: 20220252670
    Abstract: Used batteries are screened based on a measured Sectional Constant-Current Impulse Ratio (SCCIR). A used battery is partially charged over a small voltage range using a Constant Current (CC) until a voltage target is reached, and the current integrated to obtain the CC charge applied, Qcc. Then the battery continues to be charged using a Constant Voltage (CV) of the voltage target until the charging current falls to a midrange current target before the battery is fully charged. The current is integrated over the CV period to obtain the CV charge applied, Qcv. The measured SCCIR is the ratio of Qcc to (Qcc+Qcv) and is input to a calibration curve function to obtain a modeled State of Health (SOH) value for sorting. The calibration curve function is obtained by aging new batteries to obtain SCCIR and SOH data that are modeled using a neural network.
    Type: Application
    Filed: January 4, 2022
    Publication date: August 11, 2022
    Inventors: Minjie XU, Meng CHEN, Yaofeng SUN
  • Patent number: 11124890
    Abstract: Provided herein is a method for measuring a concentration of a metal ion in an electrodeposition solution. The method of the present disclosure can substantially reduce the interference of organic additives and different electrode conditions on voltammetric metal ion concentration measurements.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: September 21, 2021
    Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
    Inventors: Yaofeng Sun, Shaoqin Xie, Liya Zheng
  • Publication number: 20200347510
    Abstract: Provided herein is a method for measuring a concentration of a metal ion in an electrodeposition solution. The method of the present disclosure can substantially reduce the interference of organic additives and different electrode conditions on voltammetric metal ion concentration measurements.
    Type: Application
    Filed: April 30, 2019
    Publication date: November 5, 2020
    Inventors: Yaofeng SUN, Shaoqin XIE, Liya ZHENG
  • Patent number: 10234419
    Abstract: The presently claimed invention provides an electrochemical analytical apparatus for electrochemical bath analysis. The apparatus comprise a static electrode and a rotatable unit. As steady liquid flow can be generated on the electrolytic surface of the static electrode by the rotatable unit through rotation, the static disk electrode does not involve any movement during the bath analysis such that the design of the electrical contact in the electrode can be substantially simplified.
    Type: Grant
    Filed: May 23, 2016
    Date of Patent: March 19, 2019
    Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
    Inventors: Yaofeng Sun, Sha Xu
  • Patent number: 10100420
    Abstract: The presently claimed invention provides a plating additive for electrodeposition, and the corresponding fabrication method thereof. The plating additive of the present invention enables to electroplate holes on a substrate with good height uniformity within a feature and among features at different diameters.
    Type: Grant
    Filed: December 29, 2015
    Date of Patent: October 16, 2018
    Assignee: Hong Kong Applied Science and Technology Research Institute Company Limtied
    Inventors: Yaofeng Sun, Minjie Xu, Shun Yee Lao, Shu Kin Yau
  • Publication number: 20180258243
    Abstract: The invention provides a composition for adhering one or more polymers to a substrate. The composition comprises at least one first compound adapted to be coated on a surface of the substrate. The first compound comprises one or more first units each having at least one functional group adapted to chemically react with at least one monomer to form the one or more polymers. Said composition also comprises at least one second compound adapted to be coated on the surface of the substrate. The second compound comprising one or more second units interspersed among the one or more first units of the first compound. Each of the one or more second units is not chemically reactive to the at least one monomer. The invention also provides a method of preparing a polymer coated surface on a substrate using the composition described.
    Type: Application
    Filed: March 10, 2017
    Publication date: September 13, 2018
    Inventors: Wenwei Zheng, Hailong Wu, Yaofeng Sun
  • Patent number: 9991161
    Abstract: A method for filling a through hole (TH) located on a substrate is provided. The TH is a continuous channel having an upper rim, a lower rim and an interior surface. In one embodiment, the method comprises steps (a)-(d). In the step (a), a conductive material (CM) is deposited over the substrate to thereby deposit a layer of the CM around the rims and on the interior surface. In the step (b), the deposited CM is etched. In particular, the etching step selectively removes more CM deposited at the rims relative to CM deposited at a mid-section of the interior surface of the channel. In the step (c), the steps (a) and (b) are optionally repeated until the channel is sealed at the mid-section by a bridge formed of CM. In the step (d), the CM is further deposited over the substrate to thereby completely fill the TH.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: June 5, 2018
    Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
    Inventors: Yaofeng Sun, Sha Xu, Shu Kin Yau
  • Publication number: 20170336350
    Abstract: The presently claimed invention provides an electrochemical analytical apparatus for electrochemical bath analysis. The apparatus comprise a static electrode and a rotatable unit. As steady liquid flow can be generated on the electrolytic surface of the static electrode by the rotatable unit through rotation, the static disk electrode does not involve any movement during the bath analysis such that the design of the electrical contact in the electrode can be substantially simplified.
    Type: Application
    Filed: May 23, 2016
    Publication date: November 23, 2017
    Inventors: Yaofeng SUN, Sha XU
  • Publication number: 20170183791
    Abstract: The presently claimed invention provides a plating additive for electrodeposition, and the corresponding fabrication method thereof. The plating additive of the present invention enables to electroplate holes on a substrate with good height uniformity within a feature and among features at different diameters.
    Type: Application
    Filed: December 29, 2015
    Publication date: June 29, 2017
    Inventors: Yaofeng SUN, Minjie XU, Shun Yee LAO, Shu Kin YAU
  • Patent number: 9617653
    Abstract: The presently claimed invention provides an electrochemical analytical apparatus and a method for evaluating performance of electroplating formulations of electrolyte solutions used for via filling. The electrochemical analytical apparatus comprises an electric power generating device, an electrical output signal measurement device, an electrochemical measurement device, and a motion generator. The electrochemical measurement device of the present invention comprises a supporting structure, a cavity, a cavity electrode, and a surface electrode. The electrical output signals of the cavity electrode and the surface electrode are measured during electroplating for calculating a filling performance value. The presently claimed invention provides an accurate, fast and cost effective method for evaluating performance of electroplating formulations, following with choosing the electroplating formulation of the highest FP value for actual microvia filling process.
    Type: Grant
    Filed: December 12, 2013
    Date of Patent: April 11, 2017
    Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
    Inventors: Yaofeng Sun, Minghui Gao, Shu Kin Yau, Min Gao
  • Patent number: 9575032
    Abstract: The presently claimed invention provides an accurate, fast, and cost effective method for determining the additive concentrations of at least two inhibitors simultaneously in an electroplating bath by using different electrical load conditions. The method of the present invention is able to determine additive concentrations of different inhibitors effectively during on-line feedback control for adjusting the amount of additives in the electroplating bath to maintain the additive concentrations within pre-defined limits during device production.
    Type: Grant
    Filed: August 7, 2014
    Date of Patent: February 21, 2017
    Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
    Inventors: Yaofeng Sun, Minghui Gao, Hai Xia
  • Patent number: 9273407
    Abstract: This invention relates to a new compound represented by formula (I). Particularly, the new compound is used as an additive in copper electroplating. A chemical structure for the leveler, an electroplating bath containing the same, a method of preparing the additive and a method of electroplating a substrate with the electroplating bath containing the additive are disclosed. The additive compound/molecule of the present invention provides a branched structure at each ends, wherein each of the branches comprises a positively charged nitrogen moiety. The additive compound/molecule is formed by linking the branches having the positive charged nitrogen moieties to the backbone of the additive compound/molecule. This leads to a high charge density novel additive compound/molecule.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: March 1, 2016
    Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
    Inventors: Jiye Luo, Yaofeng Sun, Shu Kin Yau
  • Publication number: 20160041125
    Abstract: The presently claimed invention provides an accurate, fast, and cost effective method for determining the additive concentrations of at least two inhibitors simultaneously in an electroplating bath by using different electrical load conditions. The method of the present invention is able to determine additive concentrations of different inhibitors effectively during on-line feedback control for adjusting the amount of additives in the electroplating bath to maintain the additive concentrations within pre-defined limits during device production.
    Type: Application
    Filed: August 7, 2014
    Publication date: February 11, 2016
    Inventors: Yaofeng SUN, Minghui GAO, Hai XIA
  • Publication number: 20150259814
    Abstract: This invention relates to a new compound represented by formula (I). Particularly, the new compound is used as an additive in copper electroplating. A chemical structure for the leveler, an electroplating bath containing the same, a method of preparing the additive and a method of electroplating a substrate with the electroplating bath containing the additive are disclosed. The additive compound/molecule of the present invention provides a branched structure at each ends, wherein each of the branches comprises a positively charged nitrogen moiety. The additive compound/molecule is formed by linking the branches having the positive charged nitrogen moieties to the backbone of the additive compound/molecule. This leads to a high charge density novel additive compound/molecule.
    Type: Application
    Filed: March 17, 2014
    Publication date: September 17, 2015
    Applicant: Hong Kong Applied Science and Technology Research Institute Co., Ltd.
    Inventors: JIYE LUO, YAOFENG SUN, SHU KIN YAU
  • Patent number: 9075941
    Abstract: The presently claimed invention provides a method for optimizing an electrodeposition process of a plurality of vias in a wafer. Instead of simulating a large number of via on the wafer for via filling, a representative via is selected with the maximum value of critical factor, which is a function of process parameters. The filling of the representative via is simulated with different sampling points to find out the filling goodness in order to find out the optimized process windows of process parameters. An optimizer is also disclosed, which either provides sampling points or reduces sampling points under artificial neural network method. Calculation of filling goodness is used for evaluating via filling quality and further comparing among via fillings simulated at different sampling points. Consequently, the method of present invention is able to shorten the simulation time for via filling as well as provide a process window with high accuracy.
    Type: Grant
    Filed: May 14, 2013
    Date of Patent: July 7, 2015
    Assignee: Hong Kong Applied Science and Technology Research Institute Company Limited
    Inventors: Yaofeng Sun, Bin Xie, Xunqing Shi, Ou Dong
  • Patent number: D1018759
    Type: Grant
    Filed: September 18, 2020
    Date of Patent: March 19, 2024
    Assignee: Huanic Corporation
    Inventors: Jianhua Sun, Yaofeng Zhao