Abstract: A system for treating food, the system including: a direct barrier discharge system including a pair of electrodes separated by a gap of at least 0.5 cm, wherein the direct barrier discharge system is configured to provide a feed gas between the electrodes, wherein the feed gas includes nitrogen and water, wherein a content of nitrogen in the feed gas is at least 75 vol % based on a total volume of the feed gas, and a relative humidity of the feed gas is at least 50% RH, wherein a content of oxygen in the feed gas is less than 1.5 vol % based on a total volume of the feed gas, and wherein the direct barrier discharge system is configured to provide an electric potential between the electrodes to generate a working gas having an ozone content of less than 20 ppm, based on a total volume of the working gas.

Abstract: A plasma treatment device is provided and includes a first electrode, a dielectric body supportive of the first electrode and a second mesh electrode having an opposite polarity as the first electrode and comprising a seating portion. The second mesh electrode is disposed proximate to the dielectric body to define a gap receptive of particles for collection in the seating portion. The gap is sized such that, with the second mesh electrode activated, a plasma field is generated to treat the particles in the seating portion. The seating portion is configured to retain the particles during treatment in opposition to ionic winds resulting from the plasma field.

Abstract: A plasma treatment device includes dielectric plates arranged in parallel, sets of active electrodes disposed on outwardly facing sides of the dielectric plates, respectively, and ground electrodes interposed between inwardly facing sides of the dielectric plates. The sets of active electrodes and the ground electrodes are arranged to define a plasma treatment zone, which exhibits multi-axis symmetry and which is receptive of particles, and are operable to generate plasma for plasma treating the particles therein.

Abstract: A plasma treatment device is provided and includes a first electrode, a dielectric body supportive of the first electrode and a second mesh electrode having an opposite polarity as the first electrode and comprising a seating portion. The second mesh electrode is disposed proximate to the dielectric body to define a gap receptive of particles for collection in the seating portion. The gap is sized such that, with the second mesh electrode activated, a plasma field is generated to treat the particles in the seating portion. The seating portion is configured to retain the particles during treatment in opposition to ionic winds resulting from the plasma field.

Abstract: A system for treating food, the system including: a direct barrier discharge system including a pair of electrodes separated by a gap of at least 0.5 cm, wherein the direct barrier discharge system is configured to provide a feed gas between the electrodes, wherein the feed gas includes nitrogen and water, wherein a content of nitrogen in the feed gas is at least 75 vol % based on a total volume of the feed gas, and a relative humidity of the feed gas is at least 50% RH, wherein a content of oxygen in the feed gas is less than 1.5 vol % based on a total volume of the feed gas, and wherein the direct barrier discharge system is configured to provide an electric potential between the electrodes to generate a working gas having an ozone content of less than 20 ppm, based on a total volume of the working gas.

Abstract: Systems and methods disclosed herein provide an improved high voltage plasma-based product treatment by integrating the plasma reactor into the processing container. This unique device can deliver a high throughput rate of raw food, without adverse effects on quality. The system is operationally efficient, and is capable of being scaled up or down to provide lower or higher throughput rates, depending on the product manufacturer or processor's needs. In particular, the system obviates the need for further containerization or packaging of product during pasteurization processing.

Abstract: Systems and methods disclosed herein provide an improved high voltage plasma-based product treatment by integrating the plasma reactor into the processing container. This unique device can deliver a high throughput rate of raw food, without adverse effects on quality. The system is operationally efficient, and is capable of being scaled up or down to provide lower or higher throughput rates, depending on the product manufacturer or processor's needs. In particular, the system obviates the need for further containerization or packaging of product during pasteurization processing.

Abstract: Systems and methods disclosed herein provide an improved high voltage plasma-based product treatment by integrating the plasma reactor into the processing container. This unique device can deliver a high throughput rate of raw food, without adverse effects on quality. The system is operationally efficient, and is capable of being scaled up or down to provide lower or higher throughput rates, depending on the product manufacturer or processor's needs. In particular, the system obviates the need for further containerization or packaging of product during pasteurization processing.