Patents by Inventor Yassaman Hashemi

Yassaman Hashemi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning compositions
    Patent number: 6851432
    Abstract: An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water. Such cleaning compositions are effective to remove residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper and attack of dielectric substrates.
    Type: Grant
    Filed: April 16, 2003
    Date of Patent: February 8, 2005
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Shahriar Naghshineh, Yassaman Hashemi
  • Cleaning compositions
    Publication number: 20030207777
    Abstract: An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water. Such cleaning compositions are effective to remove residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper and attack of dielectric substrates.
    Type: Application
    Filed: April 16, 2003
    Publication date: November 6, 2003
    Inventors: Shahriar Naghshineh, Yassaman Hashemi
  • Cleaning compositions
    Patent number: 6627587
    Abstract: An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water. Such cleaning compositions are effective to remove residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper and attack of dielectric substrates.
    Type: Grant
    Filed: April 19, 2001
    Date of Patent: September 30, 2003
    Assignee: ESC Inc.
    Inventors: Shahriar Naghshineh, Yassaman Hashemi
  • Cleaning compositions
    Publication number: 20030017962
    Abstract: An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water. Such cleaning compositions are effective to remove residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper and attack of dielectric substrates.
    Type: Application
    Filed: April 19, 2001
    Publication date: January 23, 2003
    Applicant: ESC, Inc
    Inventors: Shahriar Naghshineh, Yassaman Hashemi
  • Post chemical-mechanical planarization (CMP) cleaning composition
    Patent number: 6194366
    Abstract: A cleaning solution is provided for cleaning copper-containing microelectronic substrates, particularly for post-CMP or Via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethanolamine, gallic acid, and water. The pH of the cleaning solution is greater than 10.
    Type: Grant
    Filed: November 16, 1999
    Date of Patent: February 27, 2001
    Assignee: ESC, Inc.
    Inventors: Shahriar Naghshineh, Jeff Barnes, Yassaman Hashemi, Ewa B. Oldak