Patents by Inventor Yassin CHOWDHURY

Yassin CHOWDHURY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11960215
    Abstract: A radiation filter for reducing transmission of an unwanted wavelength of radiation. The radiation filter includes zirconium and SiN3. The radiation filter may form part of a radiation sensor including a passivation layer arranged to receive radiation transmitted by the radiation filter, a photodiode arranged to receive radiation transmitted by the passivation layer, and circuit elements connected to the photodiode. The radiation sensor may perform optical measurements as part of an extreme ultraviolet lithographic apparatus or a lithographic tool.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: April 16, 2024
    Assignee: ASML NETHERLANDS B. V.
    Inventors: Vahid Mohammadi, Yassin Chowdhury, Pieter Cristiaan De Groot, Wouter Joep Engelen, Marcel Johannes Petrus Theodorus Van Der Hoorn
  • Patent number: 11796921
    Abstract: A lithographic apparatus including a projection system having an optical axis and configured to project a radiation beam. The apparatus includes a measurement unit arranged to measure the radiation beam projected by the projection system, the measurement unit having an opening through which the radiation beam passes in use, and a sensing surface extending transverse to the optical axis and arranged to measure the radiation beam passing through the opening. The apparatus is configured to move the sensing surface in a plane transverse to the optical axis between a plurality of measurement positions. The radiation beam defines a view in the plane, and the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view.
    Type: Grant
    Filed: January 30, 2020
    Date of Patent: October 24, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Arend Johannes Donkerbroek, Yassin Chowdhury, Maurice Henricus Franciscus Janssen
  • Publication number: 20220100102
    Abstract: A lithographic apparatus including a projection system having an optical axis and configured to project a radiation beam. The apparatus includes a measurement unit arranged to measure the radiation beam projected by the projection system, the measurement unit having an opening through which the radiation beam passes in use, and a sensing surface extending transverse to the optical axis and arranged to measure the radiation beam passing through the opening. The apparatus is configured to move the sensing surface in a plane transverse to the optical axis between a plurality of measurement positions. The radiation beam defines a view in the plane, and the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view.
    Type: Application
    Filed: January 30, 2020
    Publication date: March 31, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arend Johannes DONKERBROEK, Yassin CHOWDHURY, Maurice Henricus Franciscus JANSSEN
  • Publication number: 20210349398
    Abstract: A radiation filter for reducing transmission of an unwanted wavelength of radiation. The radiation filter includes zirconium and SiN3. The radiation filter may form part of a radiation sensor including a passivation layer arranged to receive radiation transmitted by the radiation filter, a photodiode arranged to receive radiation transmitted by the passivation layer, and circuit elements connected to the photodiode. The radiation sensor may perform optical measurements as part of an extreme ultraviolet lithographic apparatus or a lithographic tool.
    Type: Application
    Filed: September 19, 2019
    Publication date: November 11, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vahid MOHAMMADI, Yassin CHOWDHURY, Pieter Cristiaan DE GROOT, Wouter Joep ENGELEN, Marcel Johannes Petrus Theodorus VAN DER HOORN
  • Publication number: 20200363573
    Abstract: A two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises a substrate provided with a square array of through-apertures, wherein the diffraction grating is self-supporting. It will be appreciated that for a substrate provided with a square array of through-apertures to be self-supporting at least some substrate material is provided between each through-aperture and the adjacent through apertures. A method of designing a two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises: selecting a general geometry for the two-dimensional diffraction grating, the general geometry having at least one parameter; and selecting values for the least one parameter that result in a grating efficiency map for the two-dimensional diffraction grating so as to control the contributions to a first harmonic of a phase stepping signal.
    Type: Application
    Filed: January 4, 2019
    Publication date: November 19, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan DE GROOT, Johannes Jacobus Matheus BASELMANS, Derick Yun Chek CHONG, Yassin CHOWDHURY