Abstract: Scrubbing apparatus is configured by methods so that discs are quickly cleaned and conveyed by selecting a total number of spiral brush segments, rates of brush rotation, and a pitch length of a helical junction that receives discs for cleaning and transport. A time period for cleaning and transporting discs depends on the pitch length, rotational speed and configurations of the segments. An increase of the cleaning time period may result from use of an increased number of brush segments. A group of discs is cleaned by the same spiral brush, by one-by-one insertion of the discs into the junctions, and transporting the discs through the same segments.

Abstract: Discs roll along an inclined track through a chamber to expose opposite disc sides for cleaning. Energized fluid directed against the opposite sides removes particles from the discs, the fluid and particles exiting the chamber. Stop pins control a time period for cleaning and transporting the discs by selectively blocking or releasing the discs. The discs are stopped at many sections of a transducer, the sections being tailored to provide various cleaning characteristics. Within the chamber, the chamber is configured to minimize particles that originate other than by being adhered to the disc at a time when the disc is introduced into the chamber. Internal chamber configuration also minimizes retention of particles so that particles removed from one disc do not linger in the chamber for possible transfer to a disc that is cleaned in the same chamber at a later time.

Abstract: In one embodiment, a method for cleaning a substrate in a cleaning module is disclosed. The method includes an operation that receives the substrate into a first level of the cleaning module. In another operation, the substrate is spun while contemporaneously applying a cleaning fluid to top and bottom surfaces of the substrate. In yet another operation, the substrate is spun at a second level of the cleaning module. The method also includes an operation to dry the substrate in an enclosed cavity at a third level of the cleaning module.

Abstract: Substrate preparation systems comprising multi-zone cascade brush scrubbers having sonic assemblies disposed between one or more of the scrubber zones for cleaning of disk-shaped substrates, including silicon wafers and disks for data storage devices, such as hard disk drives (HDD), compact discs (CD) and digital video discs (DVD). The system method combines a sonic particle dislodgement/removal assembly into a cascade brush scrubber line comprising a longi-tudinal array of brush pairs in which the substrates process through preparation zones defined by each pair of brushes, the substrates being transited longitudinally through the zones while rotating on an axis normal to their faces. Piezoelectric transducer arrays transmit sound energy to one or both face(s) of the substrate to dislodge and/or remove particles, and the scrubber simultaneously or thereafter sweeps away the particulates.

Abstract: Scrubbing apparatus is configured by methods so that discs are quickly cleaned and conveyed by selecting a total number of spiral brush segments, rates of brush rotation, and a pitch length of a helical junction that receives discs for cleaning and transport. A time period for cleaning and transporting discs depends on the pitch length, rotational speed and configurations of the segments. An increase of the cleaning time period may result from use of an increased number of brush segments. A group of discs is cleaned by the same spiral brush, by one-by-one insertion of the discs into the junctions, and transporting the discs through the same segments.

Abstract: A dryer for drying a substrate includes: a bath containing a fluid; a chamber; and a delivery system supplying a polar organic compound, such as isopropyl alcohol, and a hydrophobic organic compound, such as hydrofluoroether, to the interface between the substrate and the fluid as the substrate is removed from the fluid of the bath into the chamber. The dryer further includes a chamber environment control system that supplies a gas into the chamber to dry the substrate and controls temperature and humidity in the chamber and a chamber heater attached to the chamber to transfer thermal energy into the chamber. A drying method includes: immersing a substrate into a fluid contained in a bath; removing the substrate from the fluid into a chamber; and supplying isopropyl alcohol and hydrofluoroether to an interface between the substrate and the fluid.

Abstract: A dryer for drying a substrate includes: a bath containing a fluid; a chamber; and an isopropyl alcohol delivery system supplying isopropyl alcohol vapor to the interface between the substrate and the fluid when the substrate is removed from the fluid of the bath into the chamber. The isopropyl alcohol vapor is supplied perpendicularly to a vertical axis of the substrate. The dryer further includes a chamber environment control system that supplies a gas into the chamber to dry the substrate and controls temperature and humidity in the chamber and a chamber heater attached to the chamber to transfer thermal energy into the chamber. A drying method includes: immersing a substrate into a fluid contained in a bath; removing the substrate from the fluid into a chamber; and supplying isopropyl alcohol vapor into an interface between the substrate and the fluid perpendicularly to a vertical axis of the substrate.

Abstract: Liquid is removed from wafers for drying a wafer that has been wet in a liquid bath. The wafer and the bath are separated at a controlled rate as the wafer is positioned in a gas-filled volume. The controlled rate is generally not less than the maximum rate at which a meniscus will form between the liquid bath and the surface of the wafer when the liquid bath and the wafer are separated. The gas-filled volume is defined by a hot chamber that continuously transfers thermal energy to the wafer in the gas-filled volume. Hot gas directed into the volume and across the wafer and out of the volume continuously transfers thermal energy to the wafer.

Abstract: Liquid is removed from wafers for drying a wafer that has been wet in a liquid bath. The wafer and the bath are separated at a controlled rate as the wafer is positioned in a gas-filled volume. The controlled rate is generally not less than the maximum rate at which a meniscus will form between the liquid bath and the surface of the wafer when the liquid bath and the wafer are separated. The gas-filled volume is defined by a hot chamber that continuously transfers thermal energy to the wafer in the gas-filled volume. Hot gas directed into the volume and across the wafer and out of the volume continuously transfers thermal energy to the wafer.

Abstract: Liquid is removed from batches of substrates by apparatus and methods for drying substrates that have been wet in an elongated liquid bath. The substrates are moved relative to the bath and an elongated gas-filled volume at rates of movement selected according to the location of the batches of substrates in the bath or the volume. As an example, the substrates and the bath are separated at a controlled rate to form a thin layer of liquid on each substrate as each substrate enters the gas-filled volume. The gas-filled volume is defined by an elongated hot chamber and hot gas directed into the volume and across the substrates and out of the volume continuously transfers thermal energy to the substrates . The flow rate of the gas into the volume is related to introduction of the substrates into the bath to avoid disturbing the liquid in the bath.

Abstract: Liquid is removed from disks by apparatus and methods for drying a disk that has been wet in a liquid bath. The disk and the bath are separated at a controlled rate to form a monolayer of liquid on the disk as the disk is positioned in a gas-filled volume. The separation may be by moving the disk out of the liquid bath, and the controlled rate is generally not less than the maximum rate at which a meniscus will form between the liquid bath and the surface of the disk when the liquid bath and the disk are separated. The gas-filled volume is defined by a hot chamber that continuously transfers thermal energy to the disk in the gas-filled volume. Hot gas directed into the volume and across the disk and out of the volume continuously transfers thermal energy to the disk. The directing of the gas out of the volume is independent of the separation of the bath and the disk.

Abstract: Liquid is removed from batches of substrates by apparatus and methods for drying substrates that have been wet in an elongated liquid bath. The substrates are moved relative to the bath and an elongated gas-filled volume at rates of movement selected according to the location of the batches of substrates in the bath or the volume. As an example, the substrates and the bath are separated at a controlled rate to form a thin layer of liquid on each substrate as each substrate enters the gas-filled volume. The gas-filled volume is defined by an elongated hot chamber and hot gas directed into the volume and across the substrates and out of the volume continuously transfers thermal energy to the substrates. The flow rate of the gas into the volume is related to introduction of the substrates into the bath to avoid disturbing the liquid in the bath.

Abstract: A dryer for drying a substrate includes: a bath containing a fluid; a chamber; and a delivery system supplying a polar organic compound, such as isopropyl alcohol, and a hydrophobic organic compound, such as hydrofluoroether, to the interface between the substrate and the fluid as the substrate is removed from the fluid of the bath into the chamber. The dryer further includes a chamber environment control system that supplies a gas into the chamber to dry the substrate and controls temperature and humidity in the chamber and a chamber heater attached to the chamber to transfer thermal energy into the chamber. A drying method includes: immersing a substrate into a fluid contained in a bath; removing the substrate from the fluid into a chamber; and supplying isopropyl alcohol and hydrofluoroether to an interface between the substrate and the fluid.

Abstract: A method for controlling the application of lubricant to thin film, magnetic disk media entailing ultrasonic vibration of heated disk lubricant.

Abstract: A composite lubricant for thin-film magnetic discs comprising perfluoropolyether (PFPE) lubricant and an anti-oxidant, cyclophosphazene lubricant dispersed in a fluoropentane solvent.

Abstract: A thin film magnetic disc having a carbon overcoat which is characterized by (a) a thickness of less than about 500 .ANG. and (b) surface nitrogen atoms having a nitrogen (1s) electron principle binding energy, as determined by electron spectroscopy for chemical analysis (ESCA), of about 399.4 eV. The nitrogen atoms enhance lubricant adhesion to the overcoat. In a preferred embodiment, the overcoat is formed by sputtering under an argon/hydrocarbon/nitrogen gas atmosphere to produce long resistance-to-erosion times, and high lubricity properties.

Abstract: A method for texturing a disc substrate, and a particle slurry for use in the method. The slurry includes two populations of different-size particles, preferably one population containing particles in a 3 micron size range, and a second population containing particles in a 1 micron size range. The particles, when used to abrade the surface of a disc, create a surface texture characterized by a low peak/peak-to-valley ratio.

Abstract: Method and apparatus for texturing a substrate for use in a magnetic recording disc. A texturing pad used in the invention has inner and outer coaxial regions, with the outer region being more compressible. When the pad and a substrate are rotated about parallel, offset axes, and pressed against one another in the presence of a particle slurry, the inner, less compressible region of the pad produces a deeper-groove texturing on an inner annular surface region of the disc.

Abstract: A method of evaluating the start/stop lifetime of a thin-film magnetic medium having an overcoat formed by sputtering a carbon-containing overcoat on a magnetic-film substrate. Resistance to erosion of the medium is evaluated by the time required to wear away the overcoat during a high-speed abrasion treatment. Lubricity is measured either in terms of the coefficient of friction of the disc, or in terms or surface hydrophobicity, as gauged by one of a number of measurable surface properties. The method allows for rapid assessment of disc wear properties, and can be used to optimize sputtering conditions required to achieve selected hardness and lubricity properties in a disc overcoat.

Abstract: Method and apparatus for treating the surface of a magnetic disc to remove surface asperities and loosely bound material. The disc is alternatively treated by contact with a pair of moving belt-like tapes, a pair of flying heads, and second contact with the belt-like tape, with the disc carried at a fixed position for rotation in a vertical plane throughout, but rotated at a higher speed during the intermediate flying waffling step. The first and/or second tape-treatment steps can be used to apply a lubricant film to the disc surface.