Patents by Inventor Yasuaki IDE

Yasuaki IDE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RADIO WAVE REFLECTOR
    Publication number: 20250105525
    Abstract: Provided is a radio wave reflector that can reflect radio waves while the intensity thereof is maintained and that can maintain the scenery. The radio wave reflector of the present invention is a radio wave reflector for reflecting radio waves, wherein the intensity of a reflective wave as specular reflection of an incident wave is ?30 dB or more relative to the intensity of the incident wave at a frequency, and the radio wave reflector has a total light transmittance of 65% or more as measured using a standard illuminant D65.
    Type: Application
    Filed: December 23, 2022
    Publication date: March 27, 2025
    Applicant: SEKISUI CHEMICAL CO., LTD
    Inventors: Hiroyuki NOMOTO, Yasuaki IDE, Munehiro HATAI
  • Composition for forming resist underlayer
    Patent number: 9328198
    Abstract: The present invention provides a dendrimer compound capable of improving critical dimension uniformity and DOF (depth of focus) margin, and also provides a composition capable of forming an underlayer film. The dendrimer compound comprises a branched chain having a central aromatic skeleton and amide or ester bond, and is contained in the composition for forming an underlayer film.
    Type: Grant
    Filed: October 15, 2014
    Date of Patent: May 3, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Shigemasa Nakasugi, Masato Suzuki, Jin Li, Motoki Misumi, Yasuaki Ide
  • COMPOSITION FOR FORMING RESIST UNDERLAYER
    Publication number: 20150118624
    Abstract: The present invention provides a dendrimer compound capable of improving critical dimension uniformity and DOF (depth of focus) margin, and also provides a composition capable of forming an underlayer film. The dendrimer compound comprises a branched chain having a central aromatic skeleton and amide or ester bond, and is contained in the composition for forming an underlayer film.
    Type: Application
    Filed: October 15, 2014
    Publication date: April 30, 2015
    Inventors: Shigemasa NAKASUGI, Masato SUZUKI, Jin LI, Motoki MISUMI, Yasuaki IDE