Abstract: A microwave plasma source that generates a microwave plasma in a processing space in which a target substrate is processed, includes: a microwave generation part for generating microwave; a waveguide through which the microwave generated by the microwave generation part propagates; an antenna part including a slot antenna having a predetermined pattern of slots formed therein and being configured to radiate the microwave propagating through the waveguide into the processing space and a microwave-transmitting plate being made of a dielectric material and being configured to transmit the microwave radiated from the slots therethrough and supply the microwave into the processing space; a temperature detector for detecting a temperature at a predetermined position in a microwave propagation path leading to the slot antenna; and an abnormality detection part for receiving the temperature detected by the temperature detector and detect an abnormality in the microwave propagation path based on the detected temperatu

Abstract: A plasma processing apparatus is provided. The plasma processing apparatus is provided with an upper electrode, a lower electrode, and an electromagnetic wave emission port. The upper electrode is provided so as to allow discharging a processing gas into a processing container. The lower electrode is provided so as to holding a workpiece in the processing container. The electromagnetic wave emission port is provided at a height position between a height position of the upper electrode and a height position of the lower electrode, and is open toward a center of the processing container.

Abstract: This plasma processing device is provided with an electrode structure. The electrode structure comprises a stage, a support portion, a first dielectric, a second dielectric, a third dielectric, a first shield, a second shield, and a third shield. The support portion is connected to a lower portion of the stage. The first dielectric is disposed in a peripheral region of an upper surface of the stage. The second dielectric is disposed on a side surface and a lower surface of the stage. The third dielectric is disposed around the support portion. The first shield is disposed on the upper surface of the first dielectric around a body to be processed mounted on the stage. The second shield is connected to the first shield and disposed on the side surface of the stage, with the second dielectric therebetween. The third shield is connected to the second shield and disposed on the lower surface of the stage and around the support portion, with the second dielectric and the third dielectric therebetween.

Abstract: A microwave plasma source that generates a microwave plasma in a processing space in which a target substrate is processed, includes: a microwave generation part for generating microwave; a waveguide through which the microwave generated by the microwave generation part propagates; an antenna part including a slot antenna having a predetermined pattern of slots formed therein and being configured to radiate the microwave propagating through the waveguide into the processing space and a microwave-transmitting plate being made of a dielectric material and being configured to transmit the microwave radiated from the slots therethrough and supply the microwave into the processing space; a temperature detector for detecting a temperature at a predetermined position in a microwave propagation path leading to the slot antenna; and an abnormality detection part for receiving the temperature detected by the temperature detector and detect an abnormality in the microwave propagation path based on the detected temperatu

Abstract: A microwave plasma source that generates a microwave plasma in a processing space in which a target substrate is processed, includes: a microwave generation part for generating microwave; a waveguide through which the microwave generated by the microwave generation part propagates; an antenna part including a slot antenna having a predetermined pattern of slots formed therein and being configured to radiate the microwave propagating through the waveguide into the processing space and a microwave-transmitting plate being made of a dielectric material and being configured to transmit the microwave radiated from the slots therethrough and supply the microwave into the processing space; a temperature detector for detecting a temperature at a predetermined position in a microwave propagation path leading to the slot antenna; and an abnormality detection part for receiving the temperature detected by the temperature detector and detect an abnormality in the microwave propagation path based on the detected temperatu

Abstract: A microwave plasma source that generates a microwave plasma in a processing space in which a target substrate is processed, includes: a microwave generation part for generating microwave; a waveguide through which the microwave generated by the microwave generation part propagates; an antenna part including a slot antenna having a predetermined pattern of slots formed therein and being configured to radiate the microwave propagating through the waveguide into the processing space and a microwave-transmitting plate being made of a dielectric material and being configured to transmit the microwave radiated from the slots therethrough and supply the microwave into the processing space; a temperature detector for detecting a temperature at a predetermined position in a microwave propagation path leading to the slot antenna; and an abnormality detection part for receiving the temperature detected by the temperature detector and detect an abnormality in the microwave propagation path based on the detected temperatu