Patents by Inventor Yasubumi Murota

Yasubumi Murota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7078155
    Abstract: A presensitized plate useful for making a lithographic printing plates comprises an aluminum substrate provided thereon with a photopolymerizable light-sensitive layer, wherein the light-sensitive layer comprises an ethylenically unsaturated bond-containing compound having at least three methacryloyl or acryloyl groups alone or in any combination in the molecule and the substrate is Substrate A, which has, on the surface, grained structures comprising medium waved structure whose average pore size ranges from 0.5. to 5 ?m and small waved structure whose average pore size ranges from 0.01 to 0.2 ?m, which are superimposed; or Substrate B, which has, on the surface, grained structures comprising large waved structure whose average wavelength ranges from 5 to 100 ?m, medium waved structure whose average pore size ranges from 0.5 to 5 ?m and small waved structure whose average pore size ranges from 0.01 to 0.2 ?m, which are superimposed.
    Type: Grant
    Filed: April 2, 2003
    Date of Patent: July 18, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasubumi Murota, Yoshinori Hotta, Tadashi Endo
  • Patent number: 6811952
    Abstract: A photopolymerization process is disclosed, which comprises exposing a photosensitive lithographic printing plate containing at least one of sensitizing dyes represented by the following general formula (I) to laser beam having a wavelength of not greater than 450 nm: wherein T represents OR, SR, N(R)2 or SO2R and at least one T is present in the ortho or para position of the vinyl group, with the proviso that when the site at which Y is connected to the phenyl ring is an oxygen atom, sulfur atom or nitrogen atom, T may not be present; X represents an oxygen atom, sulfur atom or NR; Y represents a nonmetallic atom group which forms a ring with the adjacent carbon atoms; and R's each represent a hydrogen atom or nonmetallic atom group and may be connected to each other.
    Type: Grant
    Filed: July 5, 2002
    Date of Patent: November 2, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yasubumi Murota
  • Publication number: 20040202957
    Abstract: A photosensitive composition containing an infrared absorber, a borate compound, a polymerizable compound, a binder polymer, and a compound having a weight average molecular weight of not more than 3,000 and containing at least one carboxylic acid group.
    Type: Application
    Filed: April 7, 2004
    Publication date: October 14, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Yasubumi Murota
  • Patent number: 6706462
    Abstract: A photosensitive image-recording material comprising a support having provided thereon a photosensitive layer and an oxygen-cutoff layer (protective layer).
    Type: Grant
    Filed: April 18, 2001
    Date of Patent: March 16, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasubumi Murota, Kazuto Kunita, Shigeo Koizumi
  • Publication number: 20030194648
    Abstract: A presensitized plate useful for making a lithographic printing plates comprises an aluminum substrate provided thereon with a photopolymerizable light-sensitive layer, wherein the light-sensitive layer comprises an ethylenically unsaturated bond-containing compound having at least three methacryloyl or acryloyl groups alone or in any combination in the molecule and the substrate is Substrate A, which has, on the surface, grained structures comprising medium waved structure whose average pore size ranges from 0.5. to 5 &mgr;m and small waved structure whose average pore size ranges from 0.01 to 0.2 &mgr;m, which are superimposed; or Substrate B, which has, on the surface, grained structures comprising large waved structure whose average wavelength ranges from 5 to 100 &mgr;m, medium waved structure whose average pore size ranges from 0.5 to 5 &mgr;m and small waved structure whose average pore size ranges from 0.01 to 0.2 &mgr;m, which are superimposed.
    Type: Application
    Filed: April 2, 2003
    Publication date: October 16, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Yasubumi Murota, Yoshinori Hotta, Tadashi Endo
  • Publication number: 20030162130
    Abstract: A photopolymerization process is disclosed, which comprises exposing a photosensitive lithographic printing plate containing at least one of sensitizing dyes represented by the following general formula (I) to laser beam having a wavelength of not greater than 450 nm: 1
    Type: Application
    Filed: July 5, 2002
    Publication date: August 28, 2003
    Inventor: Yasubumi Murota
  • Publication number: 20020072011
    Abstract: A photosensitive image-recording material comprising a support having provided thereon a photosensitive layer and an oxygen-cutoff layer (protective layer).
    Type: Application
    Filed: April 18, 2001
    Publication date: June 13, 2002
    Inventors: Yasubumi Murota, Kazuto Kunita, Shigeo Koizumi
  • Patent number: 6322950
    Abstract: A photosensitive composition for short wave exposure use, which comprises (i) a sensitizing dye as a 1,3-dihydro-1-oxo-2H-indene derivative having a specified structure, (ii) an activator compound that generates chemical changes by its interaction with an electronic excitation condition induced by light absorption of the sensitizing dye represented by formula (I) and thereby produces at least any one of radicals, acids and bases and (iii) a compound whose physical or chemical characteristics are changed and maintained by undergoing reaction with at least one of radicals, acids and bases.
    Type: Grant
    Filed: March 8, 2000
    Date of Patent: November 27, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadahiro Sorori, Yasubumi Murota, Koichi Kawamura, Kazuto Kunita