Patents by Inventor Yasuharu Oota

Yasuharu Oota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist recycling apparatus and method for recycling the same
    Patent number: 6656280
    Abstract: A resist recycling apparatus includes a viscosity control tank supplied with wasted resist liquid; a solvent tank that supplies a solvent to the viscosity control tank; a viscometer that measures viscosity of the resist according to the viscosity measured by the viscometer and the temperature of the resist, and that determines an amount of solvent to supply to the viscosity control tank according to the difference between the calculated resin density and a predetermined resin density; and a filter that removes dust from the resist.
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: December 2, 2003
    Assignee: Oki Electric Industry Co., Ltd.
    Inventors: Yasuharu Oota, Yoshizumi Ito
  • System for separating and recovering waste fluid and spin coater
    Patent number: 6572701
    Abstract: A waste fluid separation and recovery system of the present invention includes a first cup in which the substrate is disposed when the substrate is being coated with the photoresist, a photoresist waste fluid groove connected by a path of fluid communication with the first cup and an exhaust airflow generator for generating an exhaust airflow, which guides photoresist waste fluid from the substrate toward the photoresist waste fluid groove.
    Type: Grant
    Filed: October 2, 2001
    Date of Patent: June 3, 2003
    Assignee: Oki Electric Industry Co., Ltd.
    Inventors: Toshikazu Yamauchi, Yasuharu Oota
  • Resist recycling apparatus and method for recycling the same
    Publication number: 20030042183
    Abstract: This invention provides a resist recycling apparatus and the method for resist recycling. A resist recycling apparatus includes a viscosity control tank being supplied with wasted resist liquid, a solvent tank supplying a solvent to the viscosity control tank, a viscometer measuring viscosity of the resist in the viscosity control tank, a control portion calculating the resin density of the resist according to the viscosity measured by the viscometer and the temperature of the resist, determining an amount of solvent to supply to the viscosity control tank according to the difference between the calculated resin density and a predetermined resin density, and a filter for removing dust from the resist.
    Type: Application
    Filed: October 29, 2002
    Publication date: March 6, 2003
    Inventors: Yasuharu Oota, Yoshizumi Ito
  • Resist coating and recycling method
    Patent number: 6503568
    Abstract: This invention provides a resist recycling apparatus and the method for resist recycling. A resist recycling apparatus includes a viscosity control tank being supplied with wasted resist liquid, a solvent tank supplying a solvent to the viscosity control tank, a viscometer measuring viscosity of the resist in the viscosity control tank, a control portion calculating the resin density of the resist according to the viscosity measured by the viscometer and the temperature of the resist, determining an amount of solvent to supply to the viscosity control tank according to the difference between the calculated resin density and a predetermined resin density, and a filter for removing dust from the resist.
    Type: Grant
    Filed: July 13, 2000
    Date of Patent: January 7, 2003
    Assignee: Oki Electric Industry Co., Ltd.
    Inventors: Yasuharu Oota, Yoshizumi Ito
  • System for separating and recovering waste fluid and spin coater
    Publication number: 20020112662
    Abstract: A waste fluid separation and recovery system of the present invention includes a first cup in which the substrate is disposed when the substrate is being coated with the photoresist, a photoresist waste fluid groove connected by a path of fluid communication with the first cup and an exhaust airflow generator for generating an exhaust airflow, which guides photoresist waste fluid from the substrate toward the photoresist waste fluid groove.
    Type: Application
    Filed: October 2, 2001
    Publication date: August 22, 2002
    Inventors: Toshikazu Yamauchi, Yasuharu Oota