Abstract: To provide a process for producing an article having a fine pattern on its surface, by which peeling of a cured resin layer having a fine pattern is suppressed, and a defect of the cured resin layer by repelling when a photocurable resin composition is applied is suppressed.

Abstract: To provide a photocurable composition whereby it is possible to obtain a cured product having both a release property and flexibility, and a process whereby it is possible to produce a flexible molded product having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. A photocurable composition comprising a compound (A) having at least two urethane bonds and at least two (meth)acryloyloxy groups and having a mass average molecular weight of less than 2,000, a compound (B) having a fluorine atom and at least one carbon-carbon unsaturated double bond, a compound (C) having one (meth)acryloyloxy group, a photopolymerization initiator (D), and a fluorinated surfactant (E), wherein in the total (100 mass %) of (A) to (E), (A) is from 10 to 50 mass %, (B) is from 5 to 35 mass %, (C) is from 15 to 75 mass %, (D) is from 1 to 12 mass %, and (E) is from 0.1 to 5 mass %, is used.

Abstract: A photocurable composition capable of producing a micropattern-formed product efficiently, which is excellent in physical properties such as heat resistance, chemical resistance, releasability and optical characteristics (transmittance and low refractive index), and a process for producing a micropattern-formed product, capable of highly precisely transferring a micropattern of a mold to its surface are provided. A photocurable composition which comprises from 50 to 98 mass % of a monomer containing no fluorine atom and having a viscosity at 25° C. of from 0.1 to 100 mPa·s, from 0.1 to 45 mass % of a fluoromonomer, from more than 0.1 to 20 mass % of a fluorinated surfactant and/or a fluoropolymer and from 1 to 10 mass % of a photopolymerization initiator, and contains substantially no solvent.

Abstract: To provide a photocurable composition whereby it is possible to obtain a cured product provided with both release property and high refractive index, and a process whereby it is possible to produce a molded product having a high refractive index and having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. The photocurable composition comprising from 61 to 90 mass % of a compound (A) having a refractive index of at least 1.55 at a wavelength of 589 nm before curing and having at least two (meth)acryloyloxy groups, from 2 to 15 mass % of a compound (B) having fluorine atoms and at least one carbon-carbon unsaturated double bond (provided that compound (A) is excluded), from 5 to 35 mass % of a compound (C) having one (meth)acryloyloxy group (provided that compound (B) is excluded), and from 1 to 12 mass % of a photopolymerization initiator (D) (provided (A)+(B)+(C)+(D)=100 mass %).

Abstract: To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface. A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.

Abstract: To provide a photocurable material which can form a cured product having a high transparency and a high refractive index, a process for producing the material easily, and an article having a high transparency and a high refractive index.

Abstract: To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface. A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.

Abstract: To provide a photocurable material which can form a cured product having a high transparency and a high refractive index, a process for producing the material easily, and an article having a high transparency and a high refractive index.

Abstract: To provide a photocurable composition whereby it is possible to obtain a cured product having both a release property and flexibility, and a process whereby it is possible to produce a flexible molded product having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. A photocurable composition 20 comprising a compound (A) having at least two urethane bonds and at least two (meth)acryloyloxy groups and having a mass average molecular weight of less than 2,000, a compound (B) having a fluorine atom and at least one carbon-carbon unsaturated double bond, a compound (C) having one (meth)acryloyloxy group, a photopolymerization initiator (D), and a fluorinated surfactant (E), wherein in the total (100 mass %) of (A) to (E), (A) is from 10 to 50 mass %, (B) is from 5 to 35 mass %, (C) is from 15 to 75 mass %, (D) is from 1 to 12 mass %, and (E) is from 0.1 to 5 mass %, is used.

Abstract: To provide a photocurable composition whereby it is possible to obtain a cured product provided with both release property and high refractive index, and a process whereby it is possible to produce a molded product having a high refractive index and having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. A photocurable composition comprising from 61 to 90 mass % of a compound (A) having a refractive index of at least 1.55 at a wavelength of 589 nm before curing and having at least two (meth)acryloyloxy groups, from 2 to 15 mass % of a compound (B) having fluorine atoms and at least one carbon-carbon unsaturated double bond (provided that the compound (A) is excluded), from 5 to 35 mass % of a compound (C) having one (meth)acryloyloxy group (provided that the compound (B) is excluded), and from 1 to 12 mass % of a photopolymerization initiator (D) (provided (A)+(B)+(C)+(D)=100 mass %).

Abstract: To provide an imprinting mold, of which a coating layer formed on its surface is hardly susceptible to peeling, and a process for its production. An imprinting mold comprising a mold body and a coating layer made of a release agent, formed on the surface of the mold body, wherein the release agent contains a compound of the following formula (1), and a process for its production: wherein R is Rf—X—, both R are the same group, Rf is a perfluoroalkyl group, X is at least one member selected from —(OC3F6)—, —(OC2F4)— and —(OCF2)—, provided that the sum of such units is at least 1, Y is an organic group, is an average of n is from 2 to 10, Z is —Si(R1)m(R2)3-m, R1 is a hydroxyl group or a hydrolysable group, R2 is a hydrogen atom or a hydrocarbon group, and m is from 1 to 3.

Abstract: To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface. A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.

Abstract: To provide a mold having optical transparency, release properties, mechanical strength, dimension stability and a highly precise micropattern, and having less deformation of the micropattern; and a process for producing a base material with a transferred micropattern having less deformation of the transferred micropattern, capable of transferring highly precise micropattern of the mold. A mold 10 comprising a transparent substrate (A) 12 having chemical bonds based on the functional groups (x) on the surface having an interlayer (C) 14 formed, having a difference in linear expansion coefficient (absolute value) of less than 30 ppm/° C. from the linear expansion coefficient of the following fluoropolymer (I), and further having a heat distortion temperature of from 100 to 300° C.

Abstract: To provide an imprinting mold, of which a coating layer formed on its surface is hardly susceptible to peeling, and a process for its production. An imprinting mold comprising a mold body and a coating layer made of a release agent, formed on the surface of the mold body, wherein the release agent contains a compound of the following formula (1), and a process for its production: wherein R is Rf-X-, both R are the same group, Rf is a perfluoroalkyl group, X is at least one member selected from —(OC3F6)—, —(OC2F4)— and —(OCF2)—, provided that the sum of such units is at least 1, Y is an organic group, is an average of n is from 2 to 10, Z is —Si(R1)m(R2)3-m, R1 is a hydroxyl group or a hydrolysable group, R2 is a hydrogen atom or a hydrocarbon group, and m is from 1 to 3.

Abstract: To provide a process for producing a hollow cylindrical or solid cylindrical mold having a seamless patterned layer comprising a fluoropolymer. A process for producing a mold comprising a hollow cylindrical or solid cylindrical substrate 12 and a patterned layer comprising a fluoropolymer and having a pattern formed on its surface, which comprises a step of forming a film 32 comprising a fluoropolymer so as to cover the circumferential surface of the substrate 12 thereby to obtain a mold precursor 30; and a step of rolling the mold precursor 30 in such a state that the circumferential surface of the mold precursor 30 is pushed against a surface of a heated original mold 40 having a pattern reverse to the pattern of the patterned layer, to transfer the reversal pattern of the original mold 40 to the film 32 comprising a fluoropolymer to form the patterned layer.

Abstract: The present invention provides a wire-grid polarizer showing high polarization separation ability in the visible light region and is excellent in heat resistance and durability; and a process for producing such a wire-grid polarizer with high productivity, which enables to produce a polarizer of large area. A process for producing a wire-grid polarizer, comprising a step of coating a supporting substrate with a photocurable composition, a step of pressing a mold having a plurality of parallel grooves at a constant pitch against the photocurable composition so that the grooves contact with the photocurable composition, a step of curing the photocurable composition in a state that the mold is pressed against the photocurable composition, to form a light-transmitting substrate having a plurality of ridges corresponding to the grooves of the mold, a step of separating the mold from the light-transmitting substrate, and a step of forming fine metalic wires on the ridges of the light-transmitting substrate.

Abstract: A mold and a process for producing a base material having a transferred micropattem, wherein the mold comprises a transparent substrate having chemical bonds resulting from functional groups (x) on a surface on which an interlayer (A) is formed, the interlayer (A) present between the surface of the transparent substrate and a surface layer (B) which has a micropattem for molding a photocurable resin, wherein interlayer (A) is a layer made of a fluoropolymer (1) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has reactive groups (y) reactive with functional groups (x), and surface layer (B) is a layer made of a fluoropolymer (2) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has substantially no reactive groups (y).

Abstract: A photocurable composition capable of producing a micropattern-formed product efficiently, which is excellent in physical properties such as heat resistance, chemical resistance, releasability and optical characteristics (transmittance and low refractive index), and a process for producing a micropattern-formed product, capable of highly precisely transferring a micropattern of a mold to its surface are provided. A photocurable composition which comprises from 50 to 98 mass % of a monomer containing no fluorine atom and having a viscosity at 25° C. of from 0.1 to 100 mPa·s, from 0.1 to 45 mass % of a fluoromonomer, from more than 0.1 to 20 mass % of a fluorinated surfactant and/or a fluoropolymer and from 1 to 10 mass % of a photopolymerization initiator, and contains substantially no solvent.

Abstract: A mold and a process for producing a base material having a transferred micropattern are provided. A mold having a micropattern for molding a photocurable resin, which comprises a transparent substrate having chemical bonds resulting from functional groups (x) on a surface on which the following interlayer (A) is formed; the interlayer (A) present between said surface of the transparent substrate and the following surface layer (B); and the following surface layer (B) having a micropattern: Interlayer (A): a layer made of a fluoropolymer (1) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has reactive groups (y) reactive with said functional groups (x) Surface layer (B): a layer made of a fluoropolymer (2) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has substantially no reactive groups (y).

Abstract: To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF2?CFCF2—C(CF3)(R5)—CH2CH?CH2??(3) wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.