Abstract: A sheetfed resist removing apparatus having a substrate (111) being a cleaning object placed therein, includes a treatment chamber (101) forming a closed space, and a spray nozzle (102) to spray a cleaning liquid in a form so-called liquid drops over a surface of the substrate (111), in which the treatment chamber (101) forms the closed space containing the substrate (111) such that the placed substrate (111) faces the spray nozzle (102). This structure allows a cleaning liquid to be in the form of liquid drops in consideration of energy reduction, and permits desirable regulation of the temperature of the liquid drops when the liquid drops contact with the resist film in spraying the cleaning liquid over the resist film on the surface of the substrate (111) to thereby remove the resist film, so that secure removal of the resist film can be accomplished.

Abstract: In a resist removing apparatus of the present invention, a distance between a surface of a substrate (10) and an ultraviolet rays transmission plate (3) is adjusted to a predetermined distance by an upward and downward moving mechanism (2b) of a substrate stage (2), and O3 water is supplied from an O3 water supply section (12) to a treatment space formed between the surface of the substrate (10) and the ultraviolet ray transmission plate (3) to form a liquid film (41). Various kinds of active oxygen are generated by emitting ultraviolet rays of wavelengths of 172 nm to 310 nm to the liquid film (41) by an ultraviolet lamp, and dissolving O3, and thereby the resist is dissolved and removed.