Patents by Inventor Yasuhiko Matsuda
Yasuhiko Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10048586Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1. -A-R1??(x).Type: GrantFiled: February 29, 2016Date of Patent: August 14, 2018Assignee: JSR CORPORATIONInventors: Yuusuke Asano, Mitsuo Sato, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
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Patent number: 9513548Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.Type: GrantFiled: April 2, 2014Date of Patent: December 6, 2016Assignee: JSR CORPORATIONInventors: Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
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Publication number: 20160179003Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.Type: ApplicationFiled: February 29, 2016Publication date: June 23, 2016Applicant: JSR CorporationInventors: Yuusuke ASANO, Mitsuo Sato, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
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Patent number: 9340181Abstract: A belt member includes: a strip member having an elongate shape; a fastener disposed along the longitudinal direction of the strip member; and an opening-closing device that opens or closes the fastener. For reducing a contact pressure of the belt member per unit area, the fastener is opened by the opening-closing device to unfold the belt member into a form of a wide strip so that the width of the belt member is increased. On the other hand, when the fastener is closed by the opening-closing device, the belt member takes a form of a narrow tube so that the width of the belt member is reduced.Type: GrantFiled: February 18, 2015Date of Patent: May 17, 2016Assignees: TOYOTA BOSHOKU KABUSHIKI KAISHA, YKK CORPORATIONInventors: Masahiro Fukamoto, Atsuki Ito, Nobuhiro Yamada, Makoto Yamazaki, Yasuhiko Matsuda, Seiji Koga
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Patent number: 9265308Abstract: Provided is a slide fastener that has a flexible fastener tape, exhibits liquid-tightness, and can prevent a gap from being formed in a coupling portion, and a method of producing the slide fastener. An overlay material is formed on a front surface of a fastener tape so that the overlay material formed on a surface of a core member extends beyond a centerline in a front-rear thickness direction of a tape member. When a pair of fastener element rows engages with each other, a tip of an intermeshing head of a fastener element presses the overlay material formed on the opposite core members.Type: GrantFiled: September 17, 2010Date of Patent: February 23, 2016Assignee: YKK CorporationInventors: Yasuhiko Matsuda, Yuichi Yamashita
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Publication number: 20150239427Abstract: A belt member includes: a strip member having an elongate shape; a fastener disposed along the longitudinal direction of the strip member; and an opening-closing device that opens or closes the fastener. For reducing a contact pressure of the belt member per unit area, the fastener is opened by the opening-closing device to unfold the belt member into a form of a wide strip so that the width of the belt member is increased. On the other hand, when the fastener is closed by the opening-closing device, the belt member takes a form of a narrow tube so that the width of the belt member is reduced.Type: ApplicationFiled: February 18, 2015Publication date: August 27, 2015Applicants: TOYOTA BOSHOKU KABUSHIKI KAISHA, YKK CorporationInventors: Masahiro FUKAMOTO, Atsuki ITO, Nobuhiro YAMADA, Makoto YAMAZAKI, Yasuhiko MATSUDA, Seiji KOGA
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Patent number: 9104102Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7).Type: GrantFiled: July 27, 2012Date of Patent: August 11, 2015Assignee: JSR CORPORATIONInventors: Yasuhiko Matsuda, Takanori Kawakami, Kazuki Kasahara, Ken Maruyama
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Patent number: 8980529Abstract: A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R1 represents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R2. R2 represents a carbon atom. R3 represents a methyl group or an ethyl group. R4 represents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R5. R5 represents a carbon atom. R6 represents a branched alkyl group having 3 or 4 carbon atoms.Type: GrantFiled: March 14, 2013Date of Patent: March 17, 2015Assignee: JSR CorporationInventors: Yasuhiko Matsuda, Norihiko Sugie, Tomohiro Kakizawa, Takakazu Kimoto
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Patent number: 8815490Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.Type: GrantFiled: December 2, 2011Date of Patent: August 26, 2014Assignee: JSR CorporationInventors: Yasuhiko Matsuda, Tomohisa Fujisawa, Yukari Hama, Takanori Kawakami
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Publication number: 20140212813Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.Type: ApplicationFiled: April 2, 2014Publication date: July 31, 2014Applicant: JSR CORPORATIONInventors: Yuusuke ASANO, Mitsuo SATOU, Hiromitsu NAKASHIMA, Kazuki KASAHARA, Yoshifumi OIZUMI, Masafumi HORI, Takanori KAWAKAMI, Yasuhiko MATSUDA, Kazuo NAKAHARA
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Patent number: 8728706Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1.Type: GrantFiled: March 15, 2012Date of Patent: May 20, 2014Assignee: JSR CorporationInventors: Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
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Publication number: 20130244185Abstract: A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R1 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3.Type: ApplicationFiled: September 14, 2012Publication date: September 19, 2013Applicant: JSR CorporationInventors: Yasuhiko MATSUDA, Takanori Kawakami
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Publication number: 20130180087Abstract: Provided is a slide fastener that has a flexible fastener tape, exhibits liquid-tightness, and can prevent a gap from being formed in a coupling portion, and a method of producing the slide fastener. An overlay material is formed on a front surface of a fastener tape so that the overlay material formed on a surface of a core member extends beyond a centerline in a front-rear thickness direction of a tape member. When a pair of fastener element rows engages with each other, a tip of an intermeshing head of a fastener element presses the overlay material formed on the opposite core members.Type: ApplicationFiled: September 17, 2010Publication date: July 18, 2013Inventors: Yasuhiko Matsuda, Yuichi Yamashita
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Publication number: 20130061435Abstract: Provided is a slider for a concealed slide fastener that can be made compact and smoothly slide even if large transverse pulling force is applied when a slide fastener is closed. A fastener element standing-up is inclined in a horizontal state, by bringing an element rear end section of the fastener element in sliding contact with a pair of second element guide sections extending toward a rear opening from a front end edge of a lower blade. The fastener element is also in sliding contact with a first element guide section disposed on the outer periphery of a guide column, such that the fastener element becomes in a more horizontal state.Type: ApplicationFiled: May 26, 2010Publication date: March 14, 2013Applicant: YKK CorporationInventors: Yuichi Yamashita, Yasuhiko Matsuda
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Publication number: 20130065186Abstract: A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3.Type: ApplicationFiled: September 14, 2012Publication date: March 14, 2013Applicant: JSR CorporationInventors: Yasuhiko MATSUDA, Takanori Kawakami
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Publication number: 20120295198Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7).Type: ApplicationFiled: July 27, 2012Publication date: November 22, 2012Applicant: JSR CorporationInventors: Yasuhiko MATSUDA, Takanori Kawakami, Kazuki Kasahara, Ken Maruyama
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Publication number: 20120237875Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1.Type: ApplicationFiled: March 15, 2012Publication date: September 20, 2012Applicant: JSR CorporationInventors: Yuusuke ASANO, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
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Publication number: 20120094234Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.Type: ApplicationFiled: December 2, 2011Publication date: April 19, 2012Applicant: JSR CorporationInventors: Yasuhiko MATSUDA, Tomohisa FUJISAWA, Yukari HAMA, Takanori KAWAKAMI
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Publication number: 20110262865Abstract: A radiation-sensitive resin composition includes a resin and a photoacid generator. The resin includes a polymer including a first repeating unit shown by a following formula (1) and an acid-dissociable group-containing repeating unit, wherein R1 represents a hydrogen atom or a methyl group, R2 represents an alkylene group having 1 to 12 carbon atoms or an alicyclic alkylene group, and m is an integer from 1 to 3.Type: ApplicationFiled: May 26, 2011Publication date: October 27, 2011Applicant: JSR CorporationInventors: Yukio NISHIMURA, Yasuhiko MATSUDA, Kaori SAKAI, Makoto SUGIURA
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Publication number: 20110223537Abstract: A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, wherein each R1 represents a hydrogen atom or the like, R represents a monovalent group shown by an above formula (a?), each R19 represents a chain hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain hydrocarbon group having 1 to 30 carbon atoms or the like, and m and n are integers from 0 to 3 (m+n=1 to 3), wherein each of R2 and R3 represents a monovalent chain hydrocarbon group having 1 to 20 carbon atoms or the like.Type: ApplicationFiled: March 10, 2011Publication date: September 15, 2011Applicant: JSR CorporationInventors: Takuma Ebata, Hiroki Nakagawa, Yasuhiko Matsuda, Kazuki Kasahara, Kenji Hoshiko, Hiromitsu Nakashima, Norihiko Ikeda, Kaori Sakai, Saki Harada