Patents by Inventor Yasuhiko Matsuda

Yasuhiko Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10048586
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1. -A-R1??(x).
    Type: Grant
    Filed: February 29, 2016
    Date of Patent: August 14, 2018
    Assignee: JSR CORPORATION
    Inventors: Yuusuke Asano, Mitsuo Sato, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
  • Patent number: 9513548
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.
    Type: Grant
    Filed: April 2, 2014
    Date of Patent: December 6, 2016
    Assignee: JSR CORPORATION
    Inventors: Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
  • Publication number: 20160179003
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.
    Type: Application
    Filed: February 29, 2016
    Publication date: June 23, 2016
    Applicant: JSR Corporation
    Inventors: Yuusuke ASANO, Mitsuo Sato, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
  • Patent number: 9340181
    Abstract: A belt member includes: a strip member having an elongate shape; a fastener disposed along the longitudinal direction of the strip member; and an opening-closing device that opens or closes the fastener. For reducing a contact pressure of the belt member per unit area, the fastener is opened by the opening-closing device to unfold the belt member into a form of a wide strip so that the width of the belt member is increased. On the other hand, when the fastener is closed by the opening-closing device, the belt member takes a form of a narrow tube so that the width of the belt member is reduced.
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: May 17, 2016
    Assignees: TOYOTA BOSHOKU KABUSHIKI KAISHA, YKK CORPORATION
    Inventors: Masahiro Fukamoto, Atsuki Ito, Nobuhiro Yamada, Makoto Yamazaki, Yasuhiko Matsuda, Seiji Koga
  • Patent number: 9265308
    Abstract: Provided is a slide fastener that has a flexible fastener tape, exhibits liquid-tightness, and can prevent a gap from being formed in a coupling portion, and a method of producing the slide fastener. An overlay material is formed on a front surface of a fastener tape so that the overlay material formed on a surface of a core member extends beyond a centerline in a front-rear thickness direction of a tape member. When a pair of fastener element rows engages with each other, a tip of an intermeshing head of a fastener element presses the overlay material formed on the opposite core members.
    Type: Grant
    Filed: September 17, 2010
    Date of Patent: February 23, 2016
    Assignee: YKK Corporation
    Inventors: Yasuhiko Matsuda, Yuichi Yamashita
  • Publication number: 20150239427
    Abstract: A belt member includes: a strip member having an elongate shape; a fastener disposed along the longitudinal direction of the strip member; and an opening-closing device that opens or closes the fastener. For reducing a contact pressure of the belt member per unit area, the fastener is opened by the opening-closing device to unfold the belt member into a form of a wide strip so that the width of the belt member is increased. On the other hand, when the fastener is closed by the opening-closing device, the belt member takes a form of a narrow tube so that the width of the belt member is reduced.
    Type: Application
    Filed: February 18, 2015
    Publication date: August 27, 2015
    Applicants: TOYOTA BOSHOKU KABUSHIKI KAISHA, YKK Corporation
    Inventors: Masahiro FUKAMOTO, Atsuki ITO, Nobuhiro YAMADA, Makoto YAMAZAKI, Yasuhiko MATSUDA, Seiji KOGA
  • Patent number: 9104102
    Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7).
    Type: Grant
    Filed: July 27, 2012
    Date of Patent: August 11, 2015
    Assignee: JSR CORPORATION
    Inventors: Yasuhiko Matsuda, Takanori Kawakami, Kazuki Kasahara, Ken Maruyama
  • Patent number: 8980529
    Abstract: A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R1 represents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R2. R2 represents a carbon atom. R3 represents a methyl group or an ethyl group. R4 represents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R5. R5 represents a carbon atom. R6 represents a branched alkyl group having 3 or 4 carbon atoms.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: March 17, 2015
    Assignee: JSR Corporation
    Inventors: Yasuhiko Matsuda, Norihiko Sugie, Tomohiro Kakizawa, Takakazu Kimoto
  • Patent number: 8815490
    Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: August 26, 2014
    Assignee: JSR Corporation
    Inventors: Yasuhiko Matsuda, Tomohisa Fujisawa, Yukari Hama, Takanori Kawakami
  • Publication number: 20140212813
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.
    Type: Application
    Filed: April 2, 2014
    Publication date: July 31, 2014
    Applicant: JSR CORPORATION
    Inventors: Yuusuke ASANO, Mitsuo SATOU, Hiromitsu NAKASHIMA, Kazuki KASAHARA, Yoshifumi OIZUMI, Masafumi HORI, Takanori KAWAKAMI, Yasuhiko MATSUDA, Kazuo NAKAHARA
  • Patent number: 8728706
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1.
    Type: Grant
    Filed: March 15, 2012
    Date of Patent: May 20, 2014
    Assignee: JSR Corporation
    Inventors: Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
  • Publication number: 20130244185
    Abstract: A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R1 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3.
    Type: Application
    Filed: September 14, 2012
    Publication date: September 19, 2013
    Applicant: JSR Corporation
    Inventors: Yasuhiko MATSUDA, Takanori Kawakami
  • Publication number: 20130180087
    Abstract: Provided is a slide fastener that has a flexible fastener tape, exhibits liquid-tightness, and can prevent a gap from being formed in a coupling portion, and a method of producing the slide fastener. An overlay material is formed on a front surface of a fastener tape so that the overlay material formed on a surface of a core member extends beyond a centerline in a front-rear thickness direction of a tape member. When a pair of fastener element rows engages with each other, a tip of an intermeshing head of a fastener element presses the overlay material formed on the opposite core members.
    Type: Application
    Filed: September 17, 2010
    Publication date: July 18, 2013
    Inventors: Yasuhiko Matsuda, Yuichi Yamashita
  • Publication number: 20130065186
    Abstract: A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3.
    Type: Application
    Filed: September 14, 2012
    Publication date: March 14, 2013
    Applicant: JSR Corporation
    Inventors: Yasuhiko MATSUDA, Takanori Kawakami
  • Publication number: 20130061435
    Abstract: Provided is a slider for a concealed slide fastener that can be made compact and smoothly slide even if large transverse pulling force is applied when a slide fastener is closed. A fastener element standing-up is inclined in a horizontal state, by bringing an element rear end section of the fastener element in sliding contact with a pair of second element guide sections extending toward a rear opening from a front end edge of a lower blade. The fastener element is also in sliding contact with a first element guide section disposed on the outer periphery of a guide column, such that the fastener element becomes in a more horizontal state.
    Type: Application
    Filed: May 26, 2010
    Publication date: March 14, 2013
    Applicant: YKK Corporation
    Inventors: Yuichi Yamashita, Yasuhiko Matsuda
  • Publication number: 20120295198
    Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7).
    Type: Application
    Filed: July 27, 2012
    Publication date: November 22, 2012
    Applicant: JSR Corporation
    Inventors: Yasuhiko MATSUDA, Takanori Kawakami, Kazuki Kasahara, Ken Maruyama
  • Publication number: 20120237875
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” indicates a bonding hand bonded to R1.
    Type: Application
    Filed: March 15, 2012
    Publication date: September 20, 2012
    Applicant: JSR Corporation
    Inventors: Yuusuke ASANO, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
  • Publication number: 20120094234
    Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.
    Type: Application
    Filed: December 2, 2011
    Publication date: April 19, 2012
    Applicant: JSR Corporation
    Inventors: Yasuhiko MATSUDA, Tomohisa FUJISAWA, Yukari HAMA, Takanori KAWAKAMI
  • Publication number: 20110262865
    Abstract: A radiation-sensitive resin composition includes a resin and a photoacid generator. The resin includes a polymer including a first repeating unit shown by a following formula (1) and an acid-dissociable group-containing repeating unit, wherein R1 represents a hydrogen atom or a methyl group, R2 represents an alkylene group having 1 to 12 carbon atoms or an alicyclic alkylene group, and m is an integer from 1 to 3.
    Type: Application
    Filed: May 26, 2011
    Publication date: October 27, 2011
    Applicant: JSR Corporation
    Inventors: Yukio NISHIMURA, Yasuhiko MATSUDA, Kaori SAKAI, Makoto SUGIURA
  • Publication number: 20110223537
    Abstract: A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, wherein each R1 represents a hydrogen atom or the like, R represents a monovalent group shown by an above formula (a?), each R19 represents a chain hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain hydrocarbon group having 1 to 30 carbon atoms or the like, and m and n are integers from 0 to 3 (m+n=1 to 3), wherein each of R2 and R3 represents a monovalent chain hydrocarbon group having 1 to 20 carbon atoms or the like.
    Type: Application
    Filed: March 10, 2011
    Publication date: September 15, 2011
    Applicant: JSR Corporation
    Inventors: Takuma Ebata, Hiroki Nakagawa, Yasuhiko Matsuda, Kazuki Kasahara, Kenji Hoshiko, Hiromitsu Nakashima, Norihiko Ikeda, Kaori Sakai, Saki Harada