Patents by Inventor Yasuhira Nagakubo
Yasuhira Nagakubo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11177109Abstract: The present invention addresses a problem of providing a specimen holder capable of observing phenomena on the surface and in the inner part of a specimen, the phenomena being generated in different gas spaces, and a charged particle beam device provided with the specimen holder. In order to solve this problem, a specimen holder for a charged particle beam device which observes a specimen using a charged particle beam is configured such that the specimen holder includes a first gas injection nozzle capable of injecting a first gas to a first portion of a specimen, a second gas injection nozzle capable of injecting a second gas to a second portion of the specimen, the second portion being different from the first portion, and a partition part provided between the first gas injection nozzle and the second gas injection nozzle.Type: GrantFiled: May 23, 2016Date of Patent: November 16, 2021Assignee: Hitachi High-Tech CorporationInventors: Toshie Yaguchi, Yasuhira Nagakubo
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Patent number: 11133150Abstract: The present invention addresses a problem of providing a specimen holder capable of observing phenomena on the surface and in the inner part of a specimen, the phenomena being generated in different gas spaces, and a charged particle beam device provided with the specimen holder. In order to solve this problem, a specimen holder for a charged particle beam device which observes a specimen using a charged particle beam is configured such that the specimen holder includes a first gas injection nozzle capable of injecting a first gas to a first portion of a specimen, a second gas injection nozzle capable of injecting a second gas to a second portion of the specimen, the second portion being different from the first portion, and a partition part provided between the first gas injection nozzle and the second gas injection nozzle.Type: GrantFiled: May 23, 2016Date of Patent: September 28, 2021Assignee: Hitachi High-Tech CorporationInventors: Toshie Yaguchi, Yasuhira Nagakubo
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Patent number: 10658150Abstract: The present invention stores a cooled sample subjected to freezing treatment, or the like, while preventing the formation of condensation and frost-like substances and loads the sample into a sample holder for observation using a charged particle beam device. The present invention is provided with a main body for storing a sample and a lid unit mounted above the main body and is characterized in that the main body is divided into a first space and a second space by a partition member; the first space accommodates a cooling medium for cooling the sample; the second space has, disposed therein, a heating unit for heating the cooling medium accommodated in the first space; and the lid unit has, formed therein, a discharge port for discharging the gas generated by the heating of the cooling medium to the outside.Type: GrantFiled: April 2, 2015Date of Patent: May 19, 2020Assignee: Hitachi High-Technologies CorporationInventors: Yasuhira Nagakubo, Toshiyuki Iwahori
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Publication number: 20190180978Abstract: The present invention addresses a problem of providing a specimen holder capable of observing phenomena on the surface and in the inner part of a specimen, the phenomena being generated in different gas spaces, and a charged particle beam device provided with the specimen holder. In order to solve this problem, a specimen holder for a charged particle beam device which observes a specimen using a charged particle beam is configured such that the specimen holder includes a first gas injection nozzle capable of injecting a first gas to a first portion of a specimen, a second gas injection nozzle capable of injecting a second gas to a second portion of the specimen, the second portion being different from the first portion, and a partition part provided between the first gas injection nozzle and the second gas injection nozzle.Type: ApplicationFiled: May 23, 2016Publication date: June 13, 2019Inventors: Toshie YAGUCHI, Yasuhira NAGAKUBO
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Patent number: 10204761Abstract: Provided is an electron microscope with which a sample can be observed stably and with high accuracy. The electron microscope comprises: a sample stage; an electron optical system that scans an electron beam over a sample; a vacuum system that maintains the sample stage and the electron optical system in a vacuum; a secondary electron detector that detects secondary electrons emitted from the sample; transmitted electron detectors that detect transmitted electrons that have transmitted through the sample; and a control device that obtains a secondary electron image and a transmitted electron image on the basis of the secondary electrons and the transmitted electrons detected by the secondary electron detector and the transmitted electron detectors and stores the secondary electron image and the transmitted electron image. The sample stage is provided with cooling means for cooling the sample.Type: GrantFiled: October 9, 2014Date of Patent: February 12, 2019Assignee: Hitachi High-Technologies CorporationInventors: Takeshi Sunaoshi, Yasuhira Nagakubo, Kazutaka Nimura
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Patent number: 10083814Abstract: An electron microscope includes a secondary electron detector (51) which detects an electron generated when a sample (70) is illuminated with an electron beam from an electron gun (1), a monitor (39) which displays a secondary electron image of the sample based on an output of the detector, a gas inlet device (60) which emits gas to the sample, and a gas control device (81) which controls a gas emitting amount of the gas inlet device so that a degree of vacuum in an intermediate chamber (74) in which the secondary electron detector is installed may be kept at less than a set value P1 during gas emission performed by the gas inlet device. Accordingly, a microscopic image of the sample in a gas atmosphere with use of the detector requiring application of voltage is obtained.Type: GrantFiled: March 20, 2014Date of Patent: September 25, 2018Assignee: Hitachi High-Technologies CorporationInventors: Isao Nagaoki, Toshiyuki Oyagi, Hiroaki Matsumoto, Kiyotaka Nakano, Takeshi Sato, Yasuhira Nagakubo
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Patent number: 10068745Abstract: The purpose of the present invention is to provide a charged particle beam device and a sample holder for the charged particle beam device by which it is possible to form various environments, and perform in-situ observation and analysis without removing a sample from the charged particle beam device. In the present invention, inserting a detachable reverse side entry portion from a side facing a sample holding means, said portion being provided with a function for changing the state of a sample attached to the sample holding means, makes it possible to observe/analyze changes in the sample by a different process without removing the sample from the charged particle beam device by combining a reverse side entry portion having a different function with the sample holding means. The reverse side entry portion comprises two parts, and a tip thereof, which is one of the parts, is removable.Type: GrantFiled: September 5, 2014Date of Patent: September 4, 2018Assignee: Hitachi High-Technologies CorporationInventors: Toshie Yaguchi, Yasuhira Nagakubo, Toshiyuki Iwahori
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Publication number: 20170221676Abstract: Provided is an electron microscope with which a sample can be observed stably and with high accuracy. The electron microscope comprises: a sample stage; an electron optical system that scans an electron beam over a sample; a vacuum system that maintains the sample stage and the electron optical system in a vacuum; a secondary electron detector that detects secondary electrons emitted from the sample; transmitted electron detectors that detect transmitted electrons that have transmitted through the sample; and a control device that obtains a secondary electron image and a transmitted electron image on the basis of the secondary electrons and the transmitted electrons detected by the secondary electron detector and the transmitted electron detectors and stores the secondary electron image and the transmitted electron image. The sample stage is provided with cooling means for cooling the sample.Type: ApplicationFiled: October 9, 2014Publication date: August 3, 2017Applicant: Hitachi High-Technologies CorporationInventors: Takeshi SUNAOSHI, Yasuhira NAGAKUBO, Kazutaka NIMURA
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Patent number: 9721752Abstract: The objective of the present invention is to maintain the surrounding of a sample at atmospheric pressure and efficiently detect secondary electrons. In a sample chamber of a charged particle device, a sample holder (4) has: a gas introduction pipe and a gas evacuation pipe for controlling the vicinity of a sample (20) to be an atmospheric pressure environment; a charged particle passage hole (18) and a micro-orifice (18) enabling detection of secondary electrons (15) emitted from the sample (20), co-located above the sample (20); and a charged particle passage hole (19) with a hole diameter larger than the micro-orifice (18) above the sample (20) so as to be capable of actively evacuating gas during gas introduction.Type: GrantFiled: May 19, 2014Date of Patent: August 1, 2017Assignee: Hitachi High-Technologies CorporationInventors: Yasuhira Nagakubo, Isao Nagaoki, Hiroaki Matsumoto, Takeshi Sato
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Publication number: 20170213693Abstract: The present invention stores a cooled sample subjected to freezing treatment, or the like, while preventing the formation of condensation and frost-like substances and loads the sample into a sample holder for observation using a charged particle beam device. The present invention is provided with a main body for storing a sample and a lid unit mounted above the main body and is characterized in that the main body is divided into a first space and a second space by a partition member; the first space accommodates a cooling medium for cooling the sample; the second space has, disposed therein, a heating unit for heating the cooling medium accommodated in the first space; and the lid unit has, formed therein, a discharge port for discharging the gas generated by the heating of the cooling medium to the outside.Type: ApplicationFiled: April 2, 2015Publication date: July 27, 2017Inventors: Yasuhira NAGAKUBO, Toshiyuki IWAHORI
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Patent number: 9558910Abstract: A sample holder for an electron microscope has multiple sample stands, can allow at least one sample stand to move, and enables multiple samples for a transmission electron microscope to be prepared by a focused ion beam apparatus. A holder tip opening is provided in a tip of the sample holder. A back end of the sample holder has a knob, a rolling mechanism, a coarse adjustment mechanism, and a connector. By pressing the knob, fixation of the rolling mechanism is canceled, and the back end from the rolling mechanism and the tip of the sample holder will rotate. This rolling mechanism enables arrangement of the samples to be rotated in both the observing of a sample and the preparing of a sample for a transmission electron microscope with the focused ion beam apparatus. Moreover, the sample stand is movable by the coarse adjustment mechanism and the fine adjustment mechanism.Type: GrantFiled: December 3, 2012Date of Patent: January 31, 2017Assignee: Hitachi High-Technologies CorporationInventors: Shohei Terada, Yoshifumi Taniguchi, Yasuhira Nagakubo
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Patent number: 9543112Abstract: In an existing specimen cryo holder, a change in the orientation of a specimen would lead to tilting of a dewar together with the specimen and hence to bubbling of a cooling source contained in the dewar. In view of this, a specimen cryo holder, including a mechanism capable of cooling a specimen while keeping the posture of a dewar in a fixed direction even when the specimen is tilted into a direction suitable for processing or observation thereof, is provided. Also provided is a dewar in which a vacuum maintenance mechanism is mounted to an outer vessel so that an inner vessel holding a cooling source therein is vacuum-insulated from the outside air.Type: GrantFiled: June 4, 2013Date of Patent: January 10, 2017Assignee: Hitachi High-Technologies CorporationInventors: Yasuhira Nagakubo, Takashi Mizuo
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Patent number: 9449786Abstract: The present invention enables a sample to be observed in a clean state directly after preparation of a final observation surface when preparing a sample for observing a material that is sensitive to heat.Type: GrantFiled: April 11, 2014Date of Patent: September 20, 2016Assignee: Hitachi High-Technologies CorporationInventors: Miki Tsuchiya, Yasuhira Nagakubo, Satoshi Tomimatsu
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Publication number: 20160217971Abstract: The purpose of the present invention is to provide a charged particle beam device and a sample holder for the charged particle beam device by which it is possible to form various environments, and perform in-situ observation and analysis without removing a sample from the charged particle beam device. In the present invention, inserting a detachable reverse side entry portion from a side facing a sample holding means, said portion being provided with a function for changing the state of a sample attached to the sample holding means, makes it possible to observe/analyze changes in the sample by a different process without removing the sample from the charged particle beam device by combining a reverse side entry portion having a different function with the sample holding means. The reverse side entry portion comprises two parts, and a tip thereof, which is one of the parts, is removable.Type: ApplicationFiled: September 5, 2014Publication date: July 28, 2016Inventors: Toshie YAGUCHI, Yasuhira NAGAKUBO, Toshiyuki IWAHORI
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Publication number: 20160211109Abstract: The objective of the present invention is to maintain the surrounding of a sample at atmospheric pressure and efficiently detect secondary electrons. In a sample chamber of a charged particle device, a sample holder (4) has: a gas introduction pipe and a gas evacuation pipe for controlling the vicinity of a sample (20) to be an atmospheric pressure environment; a charged particle passage hole (18) and a micro-orifice (18) enabling detection of secondary electrons (15) emitted from the sample (20), co-located above the sample (20); and a charged particle passage hole (19) with a hole diameter larger than the micro-orifice (18) above the sample (20) so as to be capable of actively evacuating gas during gas introduction.Type: ApplicationFiled: May 19, 2014Publication date: July 21, 2016Inventors: Yasuhira NAGAKUBO, Isao NAGAOKI, Hiroaki MATSUMOTO, Takeshi SATO
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Patent number: 9378922Abstract: An object of the invention is to provide an electron microscope which can easily and safely prepare a gas or liquid environment in the electron microscope and can observe a specimen in the environment and a reaction of the specimen at a high resolution and to provide a specimen holder for the electron microscope. In the electron microscope including specimen holding means (6) for holding a specimen (23), the specimen (23) is placed in a capillary (17) through which electron beams are transmittable, the electron microscope includes a supply device for supplying gas or liquid into the capillary (17) and a collection device for collecting the gas or the liquid, and the electron microscope obtains a specimen image of the specimen while flowing the gas or the liquid.Type: GrantFiled: June 19, 2013Date of Patent: June 28, 2016Assignee: Hitachi High-Technologies CorporationInventors: Toshie Yaguchi, Yasuhira Nagakubo
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Publication number: 20160071687Abstract: The present invention enables a sample to be observed in a clean state directly after preparation of a final observation surface when preparing a sample for observing a material that is sensitive to heat.Type: ApplicationFiled: April 11, 2014Publication date: March 10, 2016Inventors: Miki TSUCHIYA, Yasuhira NAGAKUBO, Satoshi TOMIMATSU
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Publication number: 20160064183Abstract: An electron microscope includes a secondary electron detector (51) which detects an electron generated when a sample (70) is illuminated with an electron beam from an electron gun (1), a monitor (39) which displays a secondary electron image of the sample based on an output of the detector, a gas inlet device (60) which emits gas to the sample, and a gas control device (81) which controls a gas emitting amount of the gas inlet device so that a degree of vacuum in an intermediate chamber (74) in which the secondary electron detector is installed may be kept at less than a set value P1 during gas emission performed by the gas inlet device. Accordingly, a microscopic image of the sample in a gas atmosphere with use of the detector requiring application of voltage is obtained.Type: ApplicationFiled: March 20, 2014Publication date: March 3, 2016Inventors: Isao NAGAOKI, Toshiyuki OYAGI, Hiroaki MATSUMOTO, Kiyotaka NAKANO, Takeshi SATO, Yasuhira NAGAKUBO
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Publication number: 20150340199Abstract: In view of that in an existing specimen cryo holder a change in the orientation of a specimen would lead to tilting of a dewar together with the specimen and hence to bubbling of a cooling source contained in the dewar, provided is a specimen cryo holder (13) including a mechanism (14, 15, 17, 18) capable of cooling a specimen (1) while keeping the posture of a dewar in a fixed direction even when the specimen (1) is tilted into a direction suitable for processing or observation thereof. Also provided is a dewar wherein a vacuum maintenance mechanism (24, 25) is mounted to an outer vessel (21) by which an inner vessel (23) holding a cooling source therein is vacuum-insulated from the outside air.Type: ApplicationFiled: June 4, 2013Publication date: November 26, 2015Inventors: Yasuhira NAGAKUBO, Takashi MIZUO
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Patent number: 9099281Abstract: Disclosed is a charged particle radiation apparatus capable of capturing a change in a sample due to gaseous atmosphere, light irradiation, heating or the like without exposing the sample to atmosphere. The present invention relates to a sample holder provided with a sample stage that is rotatable around a rotation axis perpendicular to an electron beam irradiation direction, the sample holder being capable of forming an airtight chamber around the sample stage. A sample is allowed to chemically react in any atmosphere, and three-dimensional analysis on the reaction is enabled. A sample liable to change in atmosphere can be three-dimensionally analyzed without exposing the sample to the atmosphere.Type: GrantFiled: October 22, 2010Date of Patent: August 4, 2015Assignee: Hitachi High-Technologies CorporationInventors: Toshie Yaguchi, Yasuhira Nagakubo, Junzo Azuma, Akira Watabe