Patents by Inventor Yasuhiro Akune

Yasuhiro Akune has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180296292
    Abstract: A camera drape that allows easy connection between a camera and an endoscope is provided. The camera drape for covering a camera to which an endoscope is connected includes a cylindrical camera drape film having, in the following order from one end to the other end thereof, a main body portion; and a distal end portion for holding and accommodating the camera, the distal end portion having a smaller inside diameter than the main body portion.
    Type: Application
    Filed: October 14, 2016
    Publication date: October 18, 2018
    Applicant: OKURA INDUSTRIAL CO., LTD.
    Inventors: Junji YAMASAKI, Yoshiki TAKAISHI, Masanao ORIHARA, Yasuhiro AKUNE
  • Publication number: 20010033936
    Abstract: According to the present invention, SiC complex (M1) wherein a polycrystalline &bgr;-SiC layer (2) is grown on a surface of an a &agr;-Sic sintered base material (1) by thermal chemical vapor deposition performed at a temperature in a range of 1,300 to 1,650° C., is subjected to heat treatment at a temperature in a range of 1,850 to 2,000° C., thereby converting an atomic arrangement of Si and C constituting a polycrystal of the polycrystalline &bgr;-SiC layer (2) into an atomic arrangement of the &agr;-Sic sintered base material (1), so that a crystal structure in a boundary layer between the both (1) and (2) has continuity by a single crystal grain, thereby making it easy to work a reflecting mirror having a super smooth mirror surface, and ensuring the smoothness for a long time.
    Type: Application
    Filed: February 15, 1999
    Publication date: October 25, 2001
    Inventors: KICHIYA TANINO, YASUHIRO AKUNE
  • Patent number: 5363238
    Abstract: The present invention discloses diffraction gratings which do not generate any thermal strain and can perform extremely high-precision and high-efficiency diffraction nearly free from scattered beams. The diffraction gratings are built by allowing the chemically deposited film of silicon carbide whose crystal planes are strongly oriented to the (220) planes in terms of Miller indices to form on the substrate comprising sintered silicon carbide, polishing the surface of the deposited film to 5 .ANG. RMS or less, and directly etched laminar-type grating grooves on that surface by using ion-beam etching.
    Type: Grant
    Filed: May 24, 1993
    Date of Patent: November 8, 1994
    Assignees: Nippon Packing Co., Ltd., Shimadzu Corporation
    Inventors: Yasuhiro Akune, Kichiya Tanino, Masaru Koeda, Tetsuya Nagano, Kazuo Sano, Eiji Ishiguro
  • Patent number: 5106687
    Abstract: A composite material for use as a construction material for high energy density beam reflectors and for other purposes, comprising a substrate and a chemically vapor deposited layer of silicon carbide formed thereon, wherein the crystal faces in said chemically vapor deposited layer of silicon carbide are oriented to the (220) plane as indicated by Miller indices.
    Type: Grant
    Filed: March 21, 1991
    Date of Patent: April 21, 1992
    Assignee: Nippon Pillar Packing Co., Ltd.
    Inventors: Kichiya Tanino, Yasuhiro Akune