Patents by Inventor Yasuhiro Kitada

Yasuhiro Kitada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • INFORMATION PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPUTER-READABLE RECORDING MEDIUM
    Publication number: 20260036978
    Abstract: An information processing method includes: when a terminal device is connected to a first interface of a plurality of interfaces dispersedly arranged in a substrate processing apparatus including a plurality of modules, displaying, on the terminal device, modules which are capable of being instructed to operate by the terminal device, among the plurality of modules, according to the first interface to which the terminal device is connected; selecting a module to be subjected to a maintenance among the modules displayed on the terminal device, and receiving the selection of the module to be subjected to the maintenance among the modules displayed on the terminal device; and outputting a maintenance instruction relating to the maintenance on the selected module.
    Type: Application
    Filed: August 1, 2025
    Publication date: February 5, 2026
    Inventors: Wataru FUNAKOSHI, Takafumi KUROKI, Takayuki MASAKI, Kiminari SAKAGUCHI, Hirofumi ETOU, Yasuhiro KITADA, Kouji OKAMURA
  • Substrate defect inspection apparatus, method of adjusting sensitivity parameter value for substrate defect inspection, and non-transitory storage medium
    Patent number: 10249034
    Abstract: A method of adjusting a sensitivity parameter value for substrate defect inspection used in a substrate defect inspection apparatus compares, for each pixel value of a selected virtual inspection substrate, using reference pixel data to be used after adjustment, the deviation amount from an allowable range corresponding to the position thereof and the sensitivity parameter value before the adjustment when each pixel value is deviated from the allowable range, and updates the deviation amount as a new sensitivity parameter value when the deviation amount exceeds the sensitivity parameter value and a difference between the deviation amount and the sensitivity parameter value is equal to or less than a threshold value.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: April 2, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Yasuhiro Kitada, Izumi Hasegawa, Hiroshi Tomita, Kousuke Nakayama, Tadashi Nishiyama
  • SUBSTRATE DEFECT INSPECTION APPARATUS, METHOD OF ADJUSTING SENSITIVITY PARAMETER VALUE FOR SUBSTRATE DEFECT INSPECTION, AND NON-TRANSITORY STORAGE MEDIUM
    Publication number: 20180005370
    Abstract: A method of adjusting a sensitivity parameter value for substrate defect inspection used in a substrate defect inspection apparatus compares, for each pixel value of a selected virtual inspection substrate, using reference pixel data to be used after adjustment, the deviation amount from an allowable range corresponding to the position thereof and the sensitivity parameter value before the adjustment when each pixel value is deviated from the allowable range, and updates the deviation amount as a new sensitivity parameter value when the deviation amount exceeds the sensitivity parameter value and a difference between the deviation amount and the sensitivity parameter value is equal to or less than a threshold value.
    Type: Application
    Filed: June 27, 2017
    Publication date: January 4, 2018
    Inventors: Yasuhiro Kitada, Izumi Hasegawa, Hiroshi Tomita, Kousuke Nakayama, Tadashi Nishiyama