Abstract: A pressure sensor comprises a thin disk-shaped diaphragm, a laser displacement meter for detecting an amount of deformation of the diaphragm, and an operation part connected to the laser displacement meter. In the pressure sensor, an amount of deformation of the diaphragm due to pressure of fluid flowing into the pressure sensor is detected by the laser displacement meter, and pressure of the fluid is obtained on the basis of the amount of deformation and conversion information stored in the operation part in advance. The base part of the diaphragm of the pressure sensor is made of graphite (or silicon substrate), and a thin film of silicon carbide which is in contact with fluid is formed on a surface of the base part. This improves chemical resistance to the pressure sensor and extends the lifetime of the pressure sensor while preventing metal elution.

Abstract: A pressure sensor comprises a thin disk-shaped diaphragm, a laser displacement meter for detecting an amount of deformation of the diaphragm, and an operation part connected to the laser displacement meter. In the pressure sensor, an amount of deformation of the diaphragm due to pressure of fluid flowing into the pressure sensor is detected by the laser displacement meter, and pressure of the fluid is obtained on the basis of the amount of deformation and conversion information stored in the operation part in advance. The base part of the diaphragm of the pressure sensor is made of graphite (or silicon substrate), and a thin film of silicon carbide which is in contact with fluid is formed on a surface of the base part. This improves chemical resistance to the pressure sensor and extends the lifetime of the pressure sensor while preventing metal elution.

Abstract: A substrate processing apparatus for processing a substrate while transferring the substrate among a plurality of units with which the substrate is to be processed or on which the substrate is to be placed. This apparatus is provided with: a first unit group disposed along a linear first line; a second unit group disposed along a linear second line crossing the first line at a predetermined angle; and a transfer robot capable of transferring and receiving a substrate to and from the first unit group and the second unit group.

Abstract: A differential pressure flowmeter comprises a tube having a circular section, a first pressure sensor for measuring a pressure of a liquid flowing into the tube, a second pressure sensor for measuring a pressure of a liquid flowing out of the tube, a storage part for storing information and an operation part for performing various computations. In the differential pressure flowmeter, a laminar flow where a Reynolds number is less than or equal to 2000 is formed within the tube. Outputs from the first pressure sensor and the second pressure sensor are transmitted to the operation part, a pressure difference between both ends of the tube is obtained, and then a flowrate of a liquid flowing through the tube is determined on the basis of the pressure difference and flowrate information stored in the storage part in advance.

Abstract: A plating apparatus provided with: three copper dissolution tanks connected to a plating liquid circulation path for supplying copper ions to a plating liquid; a buffer container for supplying a replacement liquid into some of the copper dissolution tanks not in use; and an undiluted replacement liquid supplying section for supplying an undiluted replacement liquid as a source of the replacement liquid into the buffer container. Copper mesh members each prepared by weaving a copper wire, straight copper pipes or copper plates are accommodated as a copper source in each of the copper dissolution tanks. The copper dissolution tanks each include a detachable cartridge, in which the copper mesh members or the like are disposed.

Abstract: A plating apparatus provided with: three copper dissolution tanks connected to a plating liquid circulation path for supplying copper ions to a plating liquid; a buffer container for supplying a replacement liquid into some of the copper dissolution tanks not in use; and an undiluted replacement liquid supplying section for supplying an undiluted replacement liquid as a source of the replacement liquid into the buffer container. Copper mesh members each prepared by weaving a copper wire, straight copper pipes or copper plates are accommodated as a copper source in each of the copper dissolution tanks. The copper dissolution tanks each include a detachable cartridge, in which the copper mesh members or the like are disposed.

Abstract: A plating apparatus for performing a plating process for plating a surface of a substrate. This plating apparatus is provided with a first electrode to be brought into contact with a peripheral edge portion of the substrate; a plating vessel for containing a plating liquid to be brought into contact with the surface of the substrate, the plating vessel having a vertical tubular interior surface; a second electrode disposed in the plating vessel, the second electrode being spaced from the substrate by a distance which is not smaller than a distance between a center portion and a peripheral edge portion of the substrate during the plating process; and an electric current limiting member for limiting horizontal flow of an electric current in the plating liquid between the second electrode and the substrate within the plating vessel during the plating process.

Abstract: A plating apparatus (10) provided with: a plating vessel (61a to 61d) having a cylindrical side wall (361) for containing a plating liquid; a substrate holding mechanism (74a to 74d) for generally horizontally holding a generally round substrate (W) to be treated; a cathode ring (80) provided in the substrate holding mechanism and having substantially the same inner diameter as the plating vessel for sealing a peripheral edge portion of a lower surface of the substrate, the cathode ring having a cathode (83) to be brought into contact with the substrate held by the substrate holding mechanism; and a rotative driving mechanism (45) for rotating the substrate held by the substrate holding mechanism together with the cathode ring; wherein the plating vessel has an upper edge portion complementary in configuration to a portion of the cathode ring opposed to the plating vessel so that the lower surface of the substrate held by the substrate holding mechanism can approach the plating vessel so as to be substantiall

Abstract: A plating apparatus (10) provided with: a plating vessel (61a to 61d) having a cylindrical side wall (361) for containing a plating liquid; a substrate holding mechanism (74a to 74d) for generally horizontally holding a generally round substrate (W) to be treated; a cathode ring (80) provided in the substrate holding mechanism and having substantially the same inner diameter as the plating vessel for sealing a peripheral edge portion of a lower surface of the substrate, the cathode ring having a cathode (83) to be brought into contact with the substrate held by the substrate holding mechanism; and a rotative driving mechanism (45) for rotating the substrate held by the substrate holding mechanism together with the cathode ring; wherein the plating vessel has an upper edge portion complementary in configuration to a portion of the cathode ring opposed to the plating vessel so that the lower surface of the substrate held by the substrate holding mechanism can approach the plating vessel so as to be substantiall

Abstract: A plating apparatus (10) provided with: a plating vessel (61a to 61d) having a cylindrical side wall (361) for containing a plating liquid; a substrate holding mechanism (74a to 74d) for generally horizontally holding a generally round substrate (W) to be treated; a cathode ring (80) provided in the substrate holding mechanism and having substantially the same inner diameter as the plating vessel for sealing a peripheral edge portion of a lower surface of the substrate, the cathode ring having a cathode (83) to be brought into contact with the substrate held by the substrate holding mechanism; and a rotative driving mechanism (45) for rotating the substrate held by the substrate holding mechanism together with the cathode ring; wherein the plating vessel has an upper edge portion complementary in configuration to a portion of the cathode ring opposed to the plating vessel so that the lower surface of the substrate held by the substrate holding mechanism can approach the plating vessel so as to be substantiall

Abstract: A pressure sensor comprises a thin disk-shaped diaphragm, a laser displacement meter for detecting an amount of deformation of the diaphragm, and an operation part connected to the laser displacement meter. In the pressure sensor, an amount of deformation of the diaphragm due to pressure of fluid flowing into the pressure sensor is detected by the laser displacement meter, and pressure of the fluid is obtained on the basis of the amount of deformation and conversion information stored in the operation part in advance. The base part of the diaphragm of the pressure sensor is made of graphite (or silicon substrate), and a thin film of silicon carbide which is in contact with fluid is formed on a surface of the base part. This improves chemical resistance to the pressure sensor and extends the lifetime of the pressure sensor while preventing metal elution.

Abstract: A liquid supply apparatus comprises a pump mechanism for pumping out a liquid to a conduit, a flowmeter for measuring a flowrate of the liquid flowing through the conduit, and a controller for controlling these mechanisms. The pump mechanism comprises a flexible chamber made of resin, a pressure chamber housing the flexible chamber, and an electro-pneumatic regulator for adjusting pressure in a space between the pressure chamber and the flexible chamber. The flexible chamber comprises a bellows. In the liquid supply apparatus, while pressure is applied to the flexible chamber of the pump mechanism and the liquid in the flexible chamber is pumped out to the conduit, the pressure applied to the flexible chamber is controlled by the controller on the basis of a flowrate of the liquid measured by the flowmeter. This makes it possible to supply the liquid of a small flowrate while controlling the flowrate accurately.

Abstract: A liquid supply apparatus comprises a pump mechanism for pumping out a liquid to a conduit, a flowmeter for measuring a flowrate of the liquid flowing through the conduit, and a controller for controlling these mechanisms. The pump mechanism comprises a flexible chamber made of resin, a pressure chamber housing the flexible chamber, and an electro-pneumatic regulator for adjusting pressure in a space between the pressure chamber and the flexible chamber. The flexible chamber comprises a bellows. In the liquid supply apparatus, while pressure is applied to the flexible chamber of the pump mechanism and the liquid in the flexible chamber is pumped out to the conduit, the pressure applied to the flexible chamber is controlled by the controller on the basis of a flowrate of the liquid measured by the flowmeter. This makes it possible to supply the liquid of a small flowrate while controlling the flowrate accurately.

Abstract: A differential pressure flowmeter comprises a tube having a circular section, a first pressure sensor for measuring a pressure of a liquid flowing into the tube, a second pressure sensor for measuring a pressure of a liquid flowing out of the tube, a storage part for storing information and an operation part for performing various computations. In the differential pressure flowmeter, a laminar flow where a Reynolds number is less than or equal to 2000 is formed within the tube. Outputs from the first pressure sensor and the second pressure sensor are transmitted to the operation part, a pressure difference between both ends of the tube is obtained, and then a flowrate of a liquid flowing through the tube is determined on the basis of the pressure difference and flowrate information stored in the storage part in advance.

Abstract: A plating apparatus for plating a substrate. The apparatus is provided with a plating unit, a substrate cleaning unit, a substrate transport mechanism, a post-treatment agent supplying section, a minor constituent managing section for managing minor constituents (an accelerator, a retarder and chlorine) of a plating liquid being used in the plating unit, an enclosure which houses therein a substrate treating section including the plating unit, the cleaning unit and the substrate transport mechanism, and a system controller for controlling the entire apparatus.

Abstract: A plating apparatus (10) provided with: a plating vessel (61a to 61d) having a cylindrical side wall (361) for containing a plating liquid; a substrate holding mechanism (74a to 74d) for generally horizontally holding a generally round substrate (W) to be treated; a cathode ring (80) provided in the substrate holding mechanism and having substantially the same inner diameter as the plating vessel for sealing a peripheral edge portion of a lower surface of the substrate, the cathode ring having a cathode (83) to be brought into contact with the substrate held by the substrate holding mechanism; and a rotative driving mechanism (45) for rotating the substrate held by the substrate holding mechanism together with the cathode ring; wherein the plating vessel has an upper edge portion complementary in configuration to a portion of the cathode ring opposed to the plating vessel so that the lower surface of the substrate held by the substrate holding mechanism can approach the plating vessel so as to be substantiall

Abstract: A plating apparatus for plating a substrate. The apparatus is provided with a plating unit, a substrate cleaning unit, a substrate transport mechanism, a post-treatment agent supplying section, a minor constituent managing section for managing minor constituents (an accelerator, a retarder and chlorine) of a plating liquid being used in the plating unit, an enclosure which houses therein a substrate treating section including the plating unit, the cleaning unit and the substrate transport mechanism, and a system controller for controlling the entire apparatus.

Abstract: A substrate treating apparatus provided with a plating unit, a bevel etching unit, a cassette stage on which a cassette for accommodating a wafer and a cassette for accommodating a dummy wafer are placed, and a transport robot for transporting the wafer or the dummy wafer among the cassettes, the plating unit and the bevel etching unit. The plating unit is capable of performing a copper plating process on the wafer and the dummy wafer, and the bevel etching unit is capable of etching a peripheral edge of the wafer and etching away a copper film formed on the dummy wafer.

Abstract: A plating apparatus provided with: three copper dissolution tanks connected to a plating liquid circulation path for supplying copper ions to a plating liquid; a buffer container for supplying a replacement liquid into some of the copper dissolution tanks not in use; and an undiluted replacement liquid supplying section for supplying an undiluted replacement liquid as a source of the replacement liquid into the buffer container. Copper mesh members each prepared by weaving a copper wire, straight copper pipes or copper plates are accommodated as a copper source in each of the copper dissolution tanks. The copper dissolution tanks each include a detachable cartridge, in which the copper mesh members or the like are disposed.

Abstract: A plating apparatus for performing a plating process for plating a surface of a substrate. This plating apparatus is provided with a first electrode to be brought into contact with a peripheral edge portion of the substrate; a plating vessel for containing a plating liquid to be brought into contact with the surface of the substrate, the plating vessel having a vertical tubular interior surface; a second electrode disposed in the plating vessel, the second electrode being spaced from the substrate by a distance which is not smaller than a distance between a center portion and a peripheral edge portion of the substrate during the plating process; and an electric current limiting member for limiting horizontal flow of an electric current in the plating liquid between the second electrode and the substrate within the plating vessel during the plating process.