Abstract: A dry etching method by which a substrate can be dry-etched on both sides without a crack is provided. The dry etching method includes: introducing an etching gas having a fluorocarbon gas and a rare gas into a vacuum chamber; generating plasma in the vacuum chamber having a predetermined pressure; and etching a substrate to be processed adhered on an adhesive surface of a heat-conductive sheet disposed on a substrate table.

Abstract: A dry etching apparatus having excellent in-plane uniformity and a high etching rate and a dry etching method are provided. A dry etching apparatus includes a vacuum chamber having an upper plasma generation chamber and a lower substrate processing chamber; a magnetic field coil disposed outside a sidewall of the plasma generation chamber; an antenna coil disposed between the magnetic field coil and the outside of the sidewall and connected to a high-frequency power source; and means for introducing an etching gas disposed on top of the plasma generation chamber, wherein the sidewall is formed of a material having a relative dielectric constant of 4 or more.

Abstract: An etching method and an etching system are adapted to produce a high etch selectivity for a mask, an excellent anisotropic profile and a large etching depth. An etching system according to the invention comprises a floating electrode arranged vis-à-vis a substrate electrode in a vacuum chamber and held in a floating state in terms of electric potential, a material arranged at the side of the floating electrode facing the substrate electrode to form an anti-etching film and a control unit for intermittently applying high frequency power to the floating electrode.

Abstract: The object of the present invention is to provide a dry etching method by which generation of a notch in an insulating layer can be suppressed and highly-accurate microfabrication can be realized. In a dry etching method according to the present invention, a substrate in which a semiconductor layer is formed on an insulating layer formed of a silicon oxide is prepared, a through-hole is formed in the semiconductor layer, and a resin film is formed on side walls of the through-hole and a recessed portion while forming the recessed portion in the insulating layer by etching an area in which the insulating layer is exposed via the through-hole. By forming the resin film on the side wall of the recessed portion, the side wall of the recessed portion is protected from collision of ions in plasma and generation of a notch in the recessed-portion side wall is suppressed.

Abstract: The object of the present invention is to provide a dry etching method which permits the reduction of the amount of any etching product formed during the etching process to thus improve the in-plane etching uniformity with respect to an object to be etched. The dry etching method comprises the steps of providing an electrode equipped with an electrode-presser member which at least comprises a surface layer composed of an yttrium-containing oxide and which is disposed on the peripheral region of the upper surface of the electrode, placing a substrate on the electrode and then subjecting the substrate to dry etching, while preventing the formation of any etching product at the peripheral region of the electrode.

Abstract: The present invention herein provides an apparatus and a method for dry etching, which can solve such a problem that an object to be processed undergoes cracking during the etching procedures due to the heat deformation thereof and thermal shocks, possibly encountered when subjecting, to dry etching procedures, the object having a high thermal expansion coefficient. A dry etching apparatus is provided with an electrode structure having a convex-shaped surface, the convex-shape is one concentric with the cross section of the electrode structure and the height thereof falls within the range of from 0.2 to 1.0 mm. An object consisting of a material having a thermal expansion coefficient of not less than 30×10?7/° C. is subjected to dry etching while using the foregoing dry etching apparatus.

Abstract: A method for manufacturing a semiconductor device comprises dry-etching a thin film using a resist mask carrying patterns in which at least one of the width of each pattern and the space between neighboring two patterns ranges from 32 to 130 nm using a halogenated carbon-containing compound gas with the halogen being at least two members selected from the group consisting of F, I and Br. The ratio of at least one of I and Br is not more than 26% of the total amount of the halogen atoms as expressed in terms of the atomic compositional ratio to transfer the patterns onto the thin film. Such etching of a thin film avoids causing damage to the resist mask used. The resulting thin film carrying the transferred patterns is used as a mask for subjecting the underlying material to dry-etching.

Abstract: A shoe with belts according to the present invention comprising an upper, a sole S that has a first and second roll-up portions S11, S10 rolling upwards along side faces of a foot, and first and second belts 51, 52. The first belt 51 is fixed to the first roll-up portion S11 at a first joined portion 58 on the medial side of the foot. The second belt 52 is fixed to the second roll-up portion S10 at a second joined portion 59 on the lateral side of the foot. The pair of belts 51, 52 cross each other at a position approximately above the navicular bone 91. The first belt 51 can be arranged in a tensioned state along a path extending from the medial side of the foot to the vicinity of an ankle on the lateral side of the foot through the crossing position 57. The second belt 52 can be arranged in a tensioned state along a path extending from the lateral side to the vicinity of the ankle on the medial side of the foot through the crossing position 57.

Abstract: The wrestling shoe according to the present invention comprises outer soles 1F and 1B separated forward and rearward on the side of a grounding surface of the shoe. The fore and rear outer soles 1F and 1B essentially protrude downward further than an outer skin 3, thereby to support the foot in a fore foot part and a rear foot part, respectively, when landing on the ground. The fore and rear outer soles 1F and 1B are made of an outer sole material of rubber and/or resin. The outer skin 3 is formed of a laminated body where an outer surface layer 30 and a cushion layer 31 are laminated. The outer surface layer 30 is exposed in a mid foot part M and made of substantially flexible sheet-like material, and the cushion layer 31 is laminated on the inner side of the outer surface layer 30 and made of substantially flexible rubber foam or resin foam.

Abstract: An object of the present invention is to enhance durability of the non-slip member of the shoe where a lot of non-slip protuberances are fixed to the surface of a base fabric. The shoe of the present invention comprises an upper 20 that covers an instep of a foot, a sole 21 having a ground contact surface and a non-slip member 1 provided on an outer surface of the upper 20 and/or the sole 21. The non-slip member 1 comprises a base fabric 12composed of a knitted fabric of a multilayer structure, the base fabric including an external knitted fabric layer 123 having a first surface 121 exposed to the outside and an internal knitted fabric layer 124 having a second surface 122 on a opposite side of the first surface 121 and a plurality of resin or rubber non-slip protuberances 1 that are fixed to the base fabric 12 and protrude from the first surface 121 of the external knitted fabric layer 123.

Abstract: An etching method and an etching system are adapted to produce a high etch selectivity for a mask, an excellent anisotropic profile and a large etching depth. An etching system according to the invention comprises a floating electrode arranged vis-à-vis a substrate electrode in a vacuum chamber and held in a floating state in terms of electric potential, a material arranged at the side of the floating electrode facing the substrate electrode to form an anti-etching film and a control unit for intermittently applying high frequency power to the floating electrode.

Abstract: An object of the present invention is to enhance durability of the non-slip member of the shoe where a lot of non-slip protuberances are fixed to the surface of a base fabric. The shoe of the present invention comprises an upper 20 that covers an instep of a foot, a sole 21 having a ground contact surface and a non-slip member 1 provided on an outer surface of the upper 20 and/or the sole 21. The non-slip member 1 comprises a base fabric 12 composed of a knitted fabric of a multilayer structure, the base fabric including an external knitted fabric layer 123 having a first surface 121 exposed to the outside and an internal knitted fabric layer 124 having a second surface 122 on a opposite side of the first surface 121 and a plurality of resin or rubber non-slip protuberances 1 that are fixed to the base fabric 12 and protrude from the first surface 121 of the external knitted fabric layer 123.

Abstract: A shoe with belts according to the present invention comprising an upper, a sole S that has a first and second roll-up portions S11, S10 rolling upwards along side faces of a foot, and first and second belts 51, 52. The first belt 51 is fixed to the first roll-up portion S11 at a first joined portion 58 on the medial side of the foot. The second belt 52 is fixed to the second roll-up portion S10 at a second joined portion 59 on the lateral side of the foot. The pair of belts 51, 52 cross each other at a position approximately above the navicular bone 91. The first belt 51 can be arranged in a tensioned state along a path extending from the medial side of the foot to the vicinity of an ankle on the lateral side of the foot through the crossing position 57. The second belt 52 can be arranged in a tensioned state along a path extending from the lateral side to the vicinity of the ankle on the medial side of the foot through the crossing position 57.

Abstract: The wrestling shoe according to the present invention comprises outer soles 1F and 1B separated forward and rearward on the side of a grounding surface of the shoe. The fore and rear outer soles 1F and 1B essentially protrude downward further than an outer skin 3, thereby to support the foot in a fore foot part and a rear foot part, respectively, when landing on the ground. The fore and rear outer soles 1F and 1B are made of an outer sole material of rubber and/or resin. The outer skin 3 is formed of a laminated body where an outer surface layer 30 and a cushion layer 31 are laminated. The outer surface layer 30 is exposed in a mid foot part M and made of substantially flexible sheet-like material, and the cushion layer 31 is laminated on the inner side of the outer surface layer 30 and made of substantially flexible rubber foam or resin foam.

Abstract: An organic film is etched by using plasma generated from an etching gas including a first gas containing, as a principal constituent, a compound including carbon, hydrogen and nitrogen and a second gas including a nitrogen component.

Abstract: An organic film is etched by using plasma generated from an etching gas including a first gas containing, as a principal constituent, a compound including carbon, hydrogen and nitrogen and a second gas including a nitrogen component.

Abstract: An organic film is etched by using plasma generated from an etching gas including a first gas containing, as a principal constituent, a compound including carbon, hydrogen and nitrogen and a second gas including a nitrogen component.

Abstract: An organic film is etched by using plasma generated from an etching gas including a first gas containing, as a principal constituent, a compound including carbon, hydrogen and nitrogen and a second gas including a nitrogen component.

Abstract: A video signal processing apparatus, video signal recording/reproduction apparatus, and method therefor, perform arithmetic operations upon an input video signal and the input signal delayed by a predetermined amount of time. A memory stores the input signal for the predetermined amount of time in order to produce the delayed input video signal. A controller controls the memory to store the input video signal for the predetermined amount of time based on a main synchronization signal. A first synchronization signal is produced by separating a synchronizing signal from the input video signal. A second synchronization signal is generated based on the first synchronization signal. During operation, a switching unit supplies the first synchronization signal to the controller as the main synchronization signal until the second synchronization signal becomes synchronized with the first synchronization signal.