Patents by Inventor Yasuhiro Nagatani

Yasuhiro Nagatani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7824644
    Abstract: There is provided particulate silica which can be suitably used as a viscoelasticity modifier such as a thickener which is added to liquid such as water, a liquid resin or paint to adjust its viscoelastic properties such as viscosity and thixotropic nature, a reinforcer or filler for silicone rubber or sealants, a polishing agent for CMP (Chemical Mechanical Polishing) or a surface coating agent for ink-jet printing paper. The particulate silica has a BET specific surface area S of 130 to 380 m2/g, and its fractal shape parameter ?1 in an ?-value analysis target range of 20 to 30 nm satisfies the following equation (1) and its fractal shape parameter ?2 in an ?-value analysis target range of 30 to 50 nm satisfies the following equation (2). ?1+0.00175S<2.518??(1) ?2+0.00174S<2.
    Type: Grant
    Filed: May 19, 2005
    Date of Patent: November 2, 2010
    Assignee: Tokuyama Corporation
    Inventors: Yasuhiro Nagatani, Ryuji Ishimoto, Masao Ariyuki
  • Publication number: 20090230351
    Abstract: There is provided particulate silica which can be suitably used as a viscoelasticity modifier such as a thickener which is added to liquid such as water, a liquid resin or paint to adjust its viscoelastic properties such as viscosity and thixotropic nature, a reinforcer or filler for silicone rubber or sealants, a polishing agent for CMP (Chemical Mechanical Polishing) or a surface coating agent for ink-jet printing paper. The particulate silica has a BET specific surface area S of 130 to 380 m2/g, and its fractal shape parameter ?1 in an ?-value analysis target range of 20 to 30 nm satisfies the following equation (1) and its fractal shape parameter ?2 in an ?-value analysis target range of 30 to 50 nm satisfies the following equation (2). ?1+0.00175S<2.518??(1) ?2+0.00174S<2.
    Type: Application
    Filed: May 19, 2005
    Publication date: September 17, 2009
    Inventors: Yasuhiro Nagatani, Ryuji Ishimoto, Masao Ariyuki