Abstract: An epitaxial apparatus, including a supporting member to support a substrate; an external wall provided to surround the supporting member from the sides; an inner lid member provided in a removable manner on the external wall and covering at least a part of a gap between the supporting member and the external wall; an upper lid member that covers the substrate in a region surrounded by the external wall; a holding member that is held by the external wall, holds the upper lid member so that the upper lid member is sandwiched between the holding member and the external wall, and has a cooling unit to cool down a portion that holds the upper lid member; a heating unit; and a covering member provided so as to cover the surface of at least one of the upper lid member and the holding member.

Abstract: This exhaust gas scrubber for an epitaxial wafer manufacturing device includes: a scrubber inlet tube for introducing an exhaust gas discharged from an epitaxial wafer manufacturing device; and a wash tube unit formed inside the scrubber inlet tube for spraying wash water toward an interior of the scrubber inlet tube from one end thereof so as to wash adhesions inside the scrubber inlet tube, wherein the wash tube unit includes an outer tube through which inert gas constantly flows, a middle tube which is formed inside the outer tube and through which inert gas intermittently flows, and an inner tube which is formed inside the middle tube and through which the wash water and inert gas alternately flow.

Abstract: This epitaxial apparatus includes: a supporting member to support a substrate; an external wall that is provided to surround the supporting member from the sides and that has a gas supply port for supplying gas on the substrate; an inner lid member provided in a removable manner on the external wall and covering at least a part of a gap between the supporting member and the external wall; an upper lid member that covers the substrate in a region surrounded by the external wall; a holding member that is held by the external wall, holds the upper lid member so that the upper lid member is sandwiched between the holding member and the external wall, and has a cooling unit to cool down a portion that holds the upper lid member; a heating unit; and a covering member provided so as to cover the surface of at least one of the upper lid member and the holding member.

Abstract: This exhaust gas scrubber for an epitaxial wafer manufacturing device includes: a scrubber inlet tube for introducing an exhaust gas discharged from an epitaxial wafer manufacturing device; and a wash tube unit formed inside the scrubber inlet tube for spraying wash water toward an interior of the scrubber inlet tube from one end thereof so as to wash adhesions inside the scrubber inlet tube, wherein the wash tube unit includes an outer tube through which inert gas constantly flows, a middle tube which is formed inside the outer tube and through which inert gas intermittently flows, and an inner tube which is formed inside the middle tube and through which the wash water and inert gas alternately flow.