Abstract: Disclosed is a substrate treating apparatus that performs a heat treatment to a substrate. The apparatus includes the following elements: a heat treating plate that heats the substrate; lift pins that deliver the substrate, a lift pin drive mechanism that causes the lift pins to move upwardly/downwardly; a casing that produces a heat treatment atmosphere; and a cooling base plate that suppresses transmission of heat from the heat treating plate. The lift pin drive mechanism is disposed below the cooling base plate.

Abstract: Disclosed is a substrate treating apparatus with a baking unit for heating a substrate to which a treating liquid that generates sublimate through heating is applied to bake a surface of the substrate to form a coat film. The apparatus includes the following elements: a first bake group, a second bake group, a first exhaust pipe that forms a flow path of exhaust gases from the first bake group with its end being in fluid communication with an exhaust gas processor that processes the exhaust gases, a second exhaust pipe that forms a flow path of exhaust gases from the second bake group, and a junction provided at a midstream of the first exhaust pipe and in fluid communication with a downstream side of the second exhaust pipe.

Abstract: Disclosed is a substrate treating apparatus with a baking unit for heating a substrate to which a treating liquid that generates sublimate through heating is applied to bake a surface of the substrate to form a coat film. The apparatus includes the following elements: a first bake group, a second bake group, a first exhaust pipe that forms a flow path of exhaust gases from the first bake group with its end being in fluid communication with an exhaust gas processor that processes the exhaust gases, a second exhaust pipe that forms a flow path of exhaust gases from the second bake group, and a junction provided at a midstream of the first exhaust pipe and in fluid communication with a downstream side of the second exhaust pipe.

Abstract: Disclosed is a substrate treating apparatus that performs a heat treatment to a substrate. The apparatus includes the following elements: a heat treating plate that heats the substrate; lift pins that deliver the substrate, a lift pin drive mechanism that causes the lift pins to move upwardly/downwardly; a casing that produces a heat treatment atmosphere; and a cooling base plate that suppresses transmission of heat from the heat treating plate. The lift pin drive mechanism is disposed below the cooling base plate.

Abstract: A controller causes treatment of a substrate with a treating gas by operating an exhaust portion to discharge gas from a treatment space and supplying the treating gas from a treating gas generator to the treatment space. After supplying a dry gas at a treatment flow rate to the treatment space and replacing the gas with the dry gas, the controller carries out a slow leak operation to flow the dry gas from a dry gas supplier in a predetermined direction and to supply the dry gas to a filter in a lower flow rate than the treatment flow rate.

Abstract: The present invention relates to anti-CDH3 antibodies, which can be labeled with a radioisotope. Moreover, the present invention provides methods and pharmaceutical compositions that comprise an anti-CDH3 antibody as an active ingredient. Since CDH3 is strongly expressed in pancreatic, lung, colon, prostate, breast, gastric or liver cancer cells, the present invention is useful in pancreatic, lung, colon, prostate, breast, gastric or liver cancer therapies.

Abstract: The present invention relates to anti-CDH3 antibodies, which can be labeled with a radioisotope. Moreover, the present invention provides methods and pharmaceutical compositions that comprise an anti-CDH3 antibody as an active ingredient. Since CDH3 is strongly expressed in pancreatic, lung, colon, prostate, breast, gastric or liver cancer cells, the present invention is useful in pancreatic, lung, colon, prostate, breast, gastric or liver cancer therapies.

Abstract: The present invention relates to anti-CDH3 antibodies, which can be labeled with a radioisotope. Moreover, the present invention provides methods and pharmaceutical compositions that comprise an anti-CDH3 antibody as an active ingredient. Since CDH3 is strongly expressed in pancreatic, lung, colon, prostate, breast, gastric or liver cancer cells, the present invention is useful in pancreatic, lung, colon, prostate, breast, gastric or liver cancer therapies.

Abstract: The present invention relates to anti-CDH3 antibodies, which can be labeled with a radioisotope. Moreover, the present invention provides methods and pharmaceutical compositions that comprise an anti-CDH3 antibody as an active ingredient. Since CDH3 is strongly expressed in pancreatic, lung, colon, prostate, breast, gastric or liver cancer cells, the present invention is useful in pancreatic, lung, colon, prostate, breast, gastric or liver cancer therapies.

Abstract: A substrate coated with a coating solution for an anti-reflective film is placed on a heat treatment plate and is heated. Nitrogen gas flows near the periphery of the heat treatment plate into a heat treatment space. An exhaust outlet is formed in an upper central portion of an inner cover, and the inner cover has an inner wall surface configured in the form of a tapered surface. This produces a smooth flow of nitrogen gas along the tapered surface to smoothly discharge a sublimate produced from the coating solution together with the gas flow outwardly through the exhaust outlet. After the heating process for a predetermined period of time is completed, the cover moves upwardly, and support pins move upwardly to thrust up the substrate from the heat treatment plate, thereby spacing the substrate apart from the heat treatment plate. This gradually decreases the temperature of the substrate.

Abstract: A substrate coated with a coating solution for an anti-reflective film is placed on a heat treatment plate and is heated. Nitrogen gas flows near the periphery of the heat treatment plate into a heat treatment space. An exhaust outlet is formed in an upper central portion of an inner cover, and the inner cover has an inner wall surface configured in the form of a tapered surface. This produces a smooth flow of nitrogen gas along the tapered surface to smoothly discharge a sublimate produced from the coating solution together with the gas flow outwardly through the exhaust outlet. After the heating process for a predetermined period of time is completed, the cover moves upwardly, and support pins move upwardly to thrust up the substrate from the heat treatment plate, thereby spacing the substrate apart from the heat treatment plate. This gradually decreases the temperature of the substrate.

Abstract: A thermal processing unit is connected to a substrate position detector, which is in turn connected to a bake unit controller. The thermal processing unit includes a temperature control plate and a lifting device. The temperature control plate and lifting device are connected to the bake unit controller. The operations of the temperature control plate and lifting device are controlled by the bake unit controller. A pressure measuring pipe is provided at a lower part of at least one of a plurality of pin inserting holes in the temperature control plate. The pressure measuring pipe is connected to a low differential pressure sensor. The low differential pressure sensor detects the pressure in an airflow exhausted from a space surrounded by a substrate and an upper face of the temperature control plate via the pressure measuring pipe.

Abstract: A thermal processing unit is connected to a substrate position detector, which is in turn connected to a bake unit controller. The thermal processing unit includes a temperature control plate and a lifting device. The temperature control plate and lifting device are connected to the bake unit controller. The operations of the temperature control plate and lifting device are controlled by the bake unit controller. A pressure measuring pipe is provided at a lower part of at least one of a plurality of pin inserting holes in the temperature control plate. The pressure measuring pipe is connected to a low differential pressure sensor. The low differential pressure sensor detects the pressure in an airflow exhausted from a space surrounded by a substrate and an upper face of the temperature control plate via the pressure measuring pipe.