Patents by Inventor Yasuhiro Umetsu

Yasuhiro Umetsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230312406
    Abstract: A method for manufacturing a quartz glass substrate with a coating formed includes: surface roughening for a base surface of the quartz glass substrate, on which the sprayed coating is formed; and a heating treatment of heating the substrate after the surface roughening. The base surface is 0.9 ?m or more and 5.0 ?m or less in arithmetic mean roughness (Ra) in the surface roughening. The heating treatment is performed at a temperature that is equal to or higher than a strain point (temperature at which the viscosity reaches 1013.5 Pa·sec) of the quartz glass.
    Type: Application
    Filed: March 17, 2023
    Publication date: October 5, 2023
    Inventors: Masahide KATO, Yasuhiro UMETSU, Yo MATSUURA
  • Publication number: 20230257863
    Abstract: Provided are a glass substrate with a metal or ceramic coating formed, where a base film for enhancing the adhesion between the base surface of the glass substrate and the coating is provided in the region with the coating formed, and a glass part obtained by further forming a coating of a metal or a ceramic on the glass substrate.
    Type: Application
    Filed: February 1, 2023
    Publication date: August 17, 2023
    Inventors: Masahide KATO, Yasuhiro Umetsu, Yo Mastuura
  • Patent number: 10572860
    Abstract: A transparent product can reliably transmit management information, and even under a harsh environment, the indicated management information will not be peeled off. The transparent product includes management information for managing the product. The management information is provided inside the product so that the management information can be visually recognized through at least one surface of the product in the thickness direction.
    Type: Grant
    Filed: November 26, 2015
    Date of Patent: February 25, 2020
    Assignee: TECHNO QUARTZ INC.
    Inventors: Masahide Kato, Yasuhiro Umetsu
  • Publication number: 20170330156
    Abstract: The invention provides a transparent product to which management information is provided such that said management information can be reliably transmitted, which is devised such that even though the product is used under a harsh environment, the indicated management information will be not peeled off, and a production method for the transparent product. The invention provides a transparent product provided with management information and indicating the management information for managing the product, characterized in that said management information is provided at a site where the product has a thickness, and inside thereof in the thickness direction, in which said management information can be visually recognized through at least one of the surfaces of said product in the thickness direction.
    Type: Application
    Filed: November 26, 2015
    Publication date: November 16, 2017
    Applicant: TECHNO QUARTZ INC.
    Inventors: Masahide KATO, Yasuhiro UMETSU
  • Publication number: 20160244358
    Abstract: A quartz glass part silicon powder is plasma-sprayed onto a surface of a quartz glass substrate and thereby a coating film is formed, the quartz glass substrate is composed of opaque quartz glass a fraction of grains having a diameter of 100 ?m or larger in the silicon powder is 3% or smaller.
    Type: Application
    Filed: September 26, 2014
    Publication date: August 25, 2016
    Inventors: Hiromichi Isogai, Masahide Kato, Yasuhiro Umetsu, Ryo Yamazaki, Yoichiro Habu
  • Patent number: 8991214
    Abstract: A method is provided of refurbishing a quartz glass component which has been contaminated and eroded due to continuous use in a plasma process apparatus for semiconductor manufacturing. In the method, a surface deposit on the quartz glass component is removed by an appropriate cleaning method which is determined depending on the contamination status, and presence or absence of residual deposit on the cleaned component is carefully inspected through irradiating with light of a predetermined wavelength to cause fluorescence effect. Then the eroded portion of the quartz glass component is restored to the original state by flame treatment and precision machining. As a result, the refurbishment method can increase the mechanical strength of the quartz glass component, enhance the productivity and yield ratio through efficient use of the remaining materials of the quartz glass.
    Type: Grant
    Filed: July 29, 2010
    Date of Patent: March 31, 2015
    Assignees: Techno Quartz Inc., Tokyo Electron Limited
    Inventors: Katsutoshi Hoshino, Masahide Kato, Yasuhiro Umetsu, Kosuke Imafuku
  • Publication number: 20110023543
    Abstract: A method is provided of refurbishing a quartz glass component which has been contaminated and eroded due to continuous use in a plasma process apparatus for semiconductor manufacturing. In the method, a surface deposit on the quartz glass component is removed by an appropriate cleaning method which is determined depending on the contamination status, and presence or absence of residual deposit on the cleaned component is carefully inspected through irradiating with light of a predetermined wavelength to cause fluorescence effect. Then the eroded portion of the quartz glass component is restored to the original state by flame treatment and precision machining. As a result, the refurbishment method can increase the mechanical strength of the quartz glass component, enhance the productivity and yield ratio through efficient use of the remaining materials of the quartz glass.
    Type: Application
    Filed: July 29, 2010
    Publication date: February 3, 2011
    Applicants: Techno Quartz Inc., Tokyo Electron Limited
    Inventors: Yasuhiro Umetsu, Kosuke Imafuku, Katsutoshi Hoshino, Masahide Kato