Abstract: The battery system is provided with battery blocks 2 having a plurality of stacked battery cells 1, a pair of endplates 4 stacked at opposite ends of a battery block 2, connecting rails 5 that join the pair of endplates 4, and output lines 20 that connect to battery cell 1 electrode terminals 13. Output lines 20 are connected to battery cell 1 electrode terminals 13 via transfer bus bars 22, and an output line 20 connecting terminal 21 is connected to a transfer bus bar 22 by a bolt 7, and a nut 8. In this battery system, the nut 8 is attached to an endplate 4 in a manner that does not allow it to rotate, and the bolt 7 is screwed into the nut 8 to attach it to the endplate 4. The output line 20 connecting terminal 21 and transfer bus bar 22 are connected via the bolt 7 and nut 8 and are fixed to the endplate 4.

Abstract: A plasma generation device for generating plasma uniformly over a large surface area by very high frequency (VHF), which is installed in a plasma chemical vapor deposition apparatus. A first and a second power supply section are installed on both ends of the discharge electrode installed in a plasma chemical vapor deposition apparatus, and are supplied with alternate cycles: the first cycle wherein the first and second power supply sections receive high frequency waves at the same frequency, and a second cycle wherein different high frequency waves are received. In this manner, the state of plasma generation may be varied in each cycle, and when averaged over time, it makes possible uniform plasma generation over a large surface area.

Abstract: This invention relates a plasma generation device for generating plasma uniformly over a large surface area by very high frequency (VHF), which is installed in a plasma chemical vapor deposition apparatus. The present invention installs a first and a second power supply section on both ends of the discharge electrode installed in plasma chemical vapor deposition apparatus, which are supplied with alternate cycles: the first cycle wherein the first and second power supply sections receive high frequency waves at the same frequency, and a second cycle wherein different high frequency waves are received. In this manner, the state of plasma generation may be varied in each cycle, and when averaged over time, it makes possible uniform plasma generation over a large surface area.