Patents by Inventor Yasuhisa Tanaka

Yasuhisa Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5425988
    Abstract: A recording and reproducing device is provided. The device comprises a recording medium, a head giving and receiving recording signals to or from the recording medium, and a mechanism section and a circuit section giving and receiving the recording signals, wherein at least one protective film, and at least one fluorine-containing monomolecular film are formed in this order on the recording layer of the recording medium or on the surface of the head which comes into contact with said recording layer, wherein said protective film is a metal film, oxidized metal film, semi-conductor film, oxidized semi-conductor film, or organic monomolecular film, and wherein said fluorine-containing monomolecular film is formed by the chemical adsorption of a specific-type of silane compound that contains a perfluoroalkyl group at the molecular end on the surface of the protective film.
    Type: Grant
    Filed: September 27, 1993
    Date of Patent: June 20, 1995
    Assignees: Matsushita Electrical Industrial Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Yasuhisa Tanaka
  • Patent number: 5254439
    Abstract: There is disclosed a polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds that are greater than trisilane bonds, sensitive to far ultraviolet rays. The polymer is prepared by polymerizing a dichlorosiloxane alone or with at least one dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet, and is suitable for preparing a single layered resist or an upper resist of a two-layered system.
    Type: Grant
    Filed: March 20, 1992
    Date of Patent: October 19, 1993
    Assignees: Matsushita Electric Industrial Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshiyuki Tani, Masayuki Endou, Kazufumi Ogawa, Yasuhisa Tanaka, Toshinobu Ishihara, Tohru Kubota
  • Patent number: 5202452
    Abstract: A silane compound represented by the following general Formula (I) is described: ##STR1## wherein R.sup.1 is an alkyl group with 1 to 4 carbon atoms;A is oxygen atom (--O--), carboxyl group ##STR2## or an alkylsilylene group ##STR3## wherein each R.sup.2 and R.sup.3 is an alkyl group with 1 to 4 carbon atoms;x is a halogen atom, or an alkoxyl group;m is an integer from 1 to 8;n is an integer from 0 to 2;p is an integer from 5 to 25; andq is an integer from 0 to 2.The silane compound is useful as a coating agent for various base materials, to provide lubricity, in addition to stain-proofing property.
    Type: Grant
    Filed: September 3, 1991
    Date of Patent: April 13, 1993
    Assignees: Matsushita Electric Industrial Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Yasuhisa Tanaka
  • Patent number: 5126419
    Abstract: A polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds more than trisilane bonds, sensitive to far ultraviolet rays. The light-sensitive polymer can be prepared by copolymerizing a dichlorodisiloxane and a dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet and is suitable for preparing a single layered resist or an upper resist of a two layered resist system.
    Type: Grant
    Filed: December 3, 1990
    Date of Patent: June 30, 1992
    Assignees: Matsushita Electric Industrial Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshiyuki Tani, Masayuki Endou, Kazufumi Ogawa, Yasuhisa Tanaka, Toshinobu Ishihara, Tohru Kubota
  • Patent number: 5011963
    Abstract: A terminal perfluoroalkylsilane compound F(CF.sub.2).sub.m (CH.sub.2).sub.n Si(CH.sub.3).sub.p X.sub.3-p (m+n=10 to 32 carbon atoms in fluoroalkyl group) is prepared by a hydrosilylation reaction of a terminal perfluoroalkene compounds F(CF.sub.2).sub.m (CH.sub.2).sub.1+q CH.dbd.CH.sub.2 (1+q+2=n) with the hydrodiensilane HSi(CH.sub.3).sub.p X.sup.3.sub.3-p. The F(CF.sub.2).sub.m (CH.sub.2).sub.1+q CH.dbd.CH.sub.2 are synthesized by a Grignard's reaction of a Grignard's reagent X.sup.2 Mg(CH.sub.2).sub.q CH.dbd.CH.sub.2 obtained from a terminal alkenyl halogen compound X.sup.2 (CH.sub.2).sub.q CH.dbd.CH.sub.2 with a terminal fluoroalkyl halogen compound F(CF.sub.2).sub.m (CH.sub.2).sub.1 X.sup.1.The terminal perfluoroalkylsilane compound has a sufficient lubricating effect and is useful for a coating agent with long and continuous lubricity.
    Type: Grant
    Filed: February 9, 1989
    Date of Patent: April 30, 1991
    Assignees: Matsushita Electric Ind., Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazufumi Ogawa, Hideharu Tamura, Toshinobu Ishihara, Yasuhisa Tanaka, Mikio Endou
  • Patent number: 4921989
    Abstract: The novel organosilicon compound of the invention is an .omega.-silylalkynyl silane compound represented by the general formula R.sub.3 SiC.tbd.C(CH.sub.2).sub.n Si(CH.sub.3).sub.m X.sub.3-m, in which each R is, independently from the others, a hydrogen atom, lower alkyl group or aryl group, X is a halogen atom or a lower alkoxy group, the subscript m is 0,1 or 2 and the subscript n is an integer in the range from 10 to 30 which forms a uniform monomolecular layer on a substrate surface with silyl ethynyl groups arranged in alignment. The compound can be prepared by a Grignard reaction starting form an .omega.-silylalkynyl halide represented by the general formula R.sub.3 SiC.tbd.C(CH.sub.2).sub.n Y, in which R and n each have the same meaning as defined above and Y is a halogen atom, and a methyl alkoxy or halosilane of the formula (CH.sub.3).sub.m SiX.sub.4-m, in which X and m each have the same meaning as defined before.
    Type: Grant
    Filed: June 1, 1989
    Date of Patent: May 1, 1990
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshinobu Ishihara, Mikio Endo, Tohru Kubota, Yasuhisa Tanaka
  • Patent number: 4734659
    Abstract: In an ultrasonic oscillator which comprises an ultrasonic vibrator for driving an ultrasonic vibrator horn of an ultrasonic atomizer, a balanced circuit in which the ultrasonic vibrator is connected so that a balanced condition is established with respect to the damping capacity of the ultrasonic vibrator, and amplifier means for sending a signal to the balanced circuit and which includes a feedback circuit for positively feeding back the signal output from the balanced circuit, the feedback circuit is connected to means for adjusting the feedback quantity so that, when the ultrasonic oscillator starts the oscillation, the signal feedback quantity output from the balanced circuit is adjusted to make the gain of the amplifier means much greater than 1, and when the oscillator is in the steadily oscillating condition, the signal feedback quantity output from the balanced circuit is adjusted to broaden the allowable frequency band width of the ultrasonic vibrator.
    Type: Grant
    Filed: April 2, 1987
    Date of Patent: March 29, 1988
    Assignees: Ultrasonic Engineering Co., Ltd., Toa Nenryo Kegyo Kabushiki Kaisha
    Inventors: Yasuhisa Tanaka, Hiroyuki Takezi, Masami Endoh, Makoto Yoneda
  • Patent number: 4069969
    Abstract: A centrifugal separator for fuel oil contaminated by water and sludge particles includes an inlet 41, nested separator plates 15, a clean oil outlet 1, a separated water outlet 2, and sludge outlets 48 controlled by a valve cylinder 50 closed by a water pressure chamber 32 and opened by a water pressure chamber 31. When the sludge layer 28 builds up and closes off the water discharge passage 27, the trapped water similarly builds up and overflows into chamber 33 to force piston 36 downwardly. This opens a valve 38, 39 to allow water from chamber 24 to enter chamber 31 and force the cylinder 50 downwardly to open the sludge outlets. The water in chambers 31 and 33 is slowly bled off through vent nozzles, whereby water in chamber 23 enters chamber 32 to raise the cylinder 50 and close the sludge outlets, and enters chamber 34 to raise the piston 36 and close the valve 38, 39.
    Type: Grant
    Filed: September 28, 1976
    Date of Patent: January 24, 1978
    Assignee: Mitsubishi Kakoki Kaisha, Ltd.
    Inventor: Yasuhisa Tanaka
  • Patent number: 4000108
    Abstract: Silicone resin-based molding compositions filled with spherical glass bodies, i.e., void-free glass beads or hollow glass spheres, have the possibility to give molded articles colored in white or light-tone colors different from conventional molding compositions filled with other inorganic fillers which are rather highly abrasive against metal surfaces of the apparatus employed for processing the molding compositions and which causes dark stains to the molding compositions leading to the necessity to color them in black or dark-tone colors in order to mask the stains. The molded articles fabricated with the molding compositions of the present invention colored in white or light-tone colors are very attractive where sanitary cleanliness or fashionableness is important.
    Type: Grant
    Filed: September 30, 1974
    Date of Patent: December 28, 1976
    Assignee: Shinetsu Chemical Company
    Inventors: Kiyoshi Yokokawa, Yasuhisa Tanaka, Jun Koizumi, Noboru Shimamoto, Tokio Sekiya