Abstract: In a mask for beam exposure, a membrane structure for endless patterns and a stencil structure for terminated patterns are provided in combination.

Abstract: Vehicle steering column ride down apparatus to guide the direction of steering column collapse in the event of vehicle crash includes a first part for fixedly mounting to a support such as a cross car beam and a second part for coupling to a steering column assembly. At least one of the parts has one or more tracks to act as guides and the other part has structure that runs in the one or more tracks. The apparatus also includes a tightener to tighten the two parts, one upon the other, to provide a predetermined frictional resistance at least to initial relative break-away movement of the two parts in the event of vehicle crash. Each track may be constituted by at least one slot. Coated plates can be clamped between flanges of the parts, which are each in the form of brackets to provide further initial frictional resistance to the initial relative break-away movement of the two parts.

Abstract: A method for manufacturing a pair of complementary masks for use in an electron projection lithographic (EPL) technique uses an algorithm for distributing the design data to a pair of EPL masks. The algorithm allocates a positive sign or negative sign to each of the pattern data, summation of the areas of the pattern data having positive signs while subtracting the areas of the pattern data having negative signs, for obtaining a minimum of the sum. One or more of initial combination of the signs is prepared and the vicinity of the initial combination is calculated therefrom for obtaining an optimum combination.

Abstract: An electron beam emitted by an electron beam source, is deflected by a first pattern selection deflector and irradiated onto a predetermined aperture on a first mask. The electron beam penetrating through the first mask is deflected by a second pattern selection deflector, irradiates onto a second mask, and further irradiates on a semiconductor wafer provided on a wafer stage, as a result, a partial blank shot is executed. On the second mask, a cell projection exposure aperture to be drawn a center portion pattern of a cell array pattern, is provided and a cell projection exposure aperture for an excess pattern is not provided. On the first mask, a main aperture and an aperture to be irradiated an excess pattern portion having an area of 1/N of the main aperture to the semiconductor wafer, are provided, wherein N is an integer.

Abstract: A sealed battery has an outer can having an opening and functioning also as an electrode terminal, a sealing member fitted in the opening of the outer can and functioning also as an electrode terminal which is different in polarity from the outer can, and a spiral-wound electrode assembly contained in the outer can. The spiral-wound electrode assembly includes a positive electrode, a negative electrode and a separator wound together spirally, in which the positive electrode and the negative electrode are separated by the separator and the outermost coil of the separator forms the outer circumferential face of the spiral-wound electrode assembly. A substrate included in the positive or negative electrode which is adjacent to the outermost coil of the separator has an exposed portion. The exposed portion projects in the axial direction of the spiral-wound electrode assembly beyond the outermost coil of the separator and is in direct contact with the inner face of the outer can.

Abstract: An electron beam drawing mask comprises a substrate for damping an electron beam to a predetermined quantity of electrons while the electron beam passes through the substrate, a metallic film formed on at least one surface of the substrate for interrupting the electron beam, a main pattern constituted by openings bored through the substrate and the metallic film, and an auxiliary pattern formed near the main pattern and constituted by window portions where the metallic film has been removed to expose the substrate.

Abstract: A method for manufacturing a pair of complementary masks for use in an electron projection lithographic (EPL) technique uses an algorithm for distributing the design data to a pair of EPL masks. The algorithm allocates a positive sign or negative sign to each of the pattern data, summation of the areas of the pattern data having positive signs while subtracting the areas of the pattern data having negative signs, for obtaining a minimum of the sum. One or more of initial combination of the signs is prepared and the vicinity of the initial combination is calculated therefrom for obtaining an optimum combination.

Abstract: A collapsible steering column assembly has an arrangement to absorb energy upon steering column collapse. In a preferred form, the arrangement includes a skid member acting to deform a length of wire having arms to embrace at least one retaining pin. The or each pin is selectively extendable and retractable in order to vary the energy absorption capability.

Abstract: Plural patterns of cell projections made in an aperture are stored in a register. Cells in designed data are compared with the cell projections stored in the register by an interlayer operation, to judge whether or not a cell which coincides with any one of the cells in the designed data is present among the patterns of the cell projections stored in the register. In the case that the judgement that the coinciding cell is present is given, the coinciding cell projection is e acted and outputted as data for direct-writing. In the case that the judgement that no coinciding cell is present is given, if a cell whose reference frequency is over a given value is present, this cell is extracted and registered as a new cell projection.

Abstract: In a mask for beam exposure, a membrane structure for endless patterns and a stencil structure for terminated patterns are provided in combination.

Abstract: Vehicle steering column ride down apparatus to guide the direction of steering column collapse in the event of vehicle crash includes a first part for fixedly mounting to a support such as a cross car beam and a second part for coupling to a steering column assembly. At least one of the parts is tracked to act as a guidance and the other part has first means to run in the or each track and there being second means to tighten the two parts, one upon the other, to provide a predetermined frictional resistance at least to initial relative break-away movement of the two parts in the event of vehicle crash. The or each track may be constituted by at least one slot. Coated plates can be clamped between flanges of the parts, which are each in the form of brackets to provide further initial frictional resistance to the initial relative break-away movement of the two parts.

Abstract: An electron beam drawing mask comprises a substrate for damping an electron beam to a predetermined quantity of electrons while the electron beam passes through the substrate, a metallic film formed on at least one surface of the substrate for interrupting the electron beam, a main pattern constituted by openings bored through the substrate and the metallic film, and an auxiliary pattern formed near the main pattern and constituted by window portions where the metallic film has been removed to expose the substrate.

Abstract: Disclosed is a method for making a partial full-wafer pattern for charged particle beam lithography based on circuit design data. This method has the steps of: conducting the interlayer operation between the circuit design data of a pattern of lithographed layer and the circuit design data of a pattern of base layer underlying the lithographed layer to extract a product-set pattern; and making data of partial full-wafer pattern by setting the product-set pattern to be a target region of partial full-wafer pattern.

Abstract: A partial collective mask for charged particle beam exposure of the present invention is capable of being easily reshaped in order to obviate snapping, defective contact draw and other critical faults. The mask is formed not only with openings constituting main patterns or device patterns, but also with openings constituting auxiliary patterns. When any one of the main patterns has a size short of a designed size and is apt to bring about snapping or similar critical fault, such a defective pattern and the auxiliary patterns adjoining it are jointed together so as to correct the size.

Abstract: A method of extracting data of at least one aperture mask pattern from design data which includes write-required patterns and repeating units, so that boundary lines of the at least one aperture mask pattern are different from boundary lines of the repeating unit on the design data and so that the at least one aperture mask pattern completely includes at least one of the write-required patterns without partially or incompletely including the write-required pattern.

Abstract: A pattern drawing method by directly writing a pattern with a charged particle electron beam, in which a resist containing metal powders is applied on a substrate having a substrate pattern formed thereon, so to form a resist film, and a desired pattern is written by exposing the resist film with a charged particle electron beam.

Abstract: An electron-beam exposure mask that is able to realize the required pattern transfer accuracy independent of the deflection distortion and aberration of an electron beam. This mask includes a substrate with a first area and a second area, a first plurality of cell apertures formed in the first area of the substrate, and a second plurality of cell apertures formed in the second area of the substrate. The first area of the substrate is designed so that a charged-beam irradiated to the first area has a deflection angle less than a reference angle. The second area of the substrate is designed so that a charged-beam irradiated to the second area has a deflection angle equal to or greater than the reference angle. Each of the first plurality of cell apertures corresponds to fine patterns necessitating high pattern transfer accuracy. Each of the second plurality of cell apertures corresponds to rough patterns unnecessitating the high pattern transfer accuracy.

Abstract: There is provided a composition having therein a base oil with a specified kinematic viscosity and with a specified total amount of aromatics, comprising, in specified amounts based on the total weight of the composition:(b) an alkaline earth metal salicylate detergent;(c) a zinc dialkyldithiophosphate;(d) a succinimide ashless dispersant containing a polybutenyl group having a specified number-average molecular weight;(e) a phenol ashless antioxidant;(f) a molybdenum dithiocarbamate friction modifier; and(g) a viscosity index improver in such an amount that the kinematic viscosity of said composition ranges from 5.6 to 12.5 mm.sup.2 /s at 100.degree. C. The present invention provides an engine oil which has excellent fuel consumption and maintains the fuel consumption for a long period of time.

Abstract: In a beam exposure system, a beam is irradiated onto a mask unit, and the beam passed through the mask unit is deflected and is irradiated onto a target. The mask unit includes a polygonal hollowed holder and a plurality of masks. The holder is formed by mask mounting plates each having apertures for mounting the masks, and frames each having an aperture for passing the beam therethough.