Abstract: The present invention provides an X-ray inspection device that detects a defect not on the basis of a change of an X-ray irradiation angle but on uniform determining criteria. As one embodiment for achieving the purpose, proposed below is an X-ray inspection device that is provided with: a detection element that detects a transmission X-ray, which has been emitted from an X-ray source and passed through a sample; and an arithmetic device, which forms a profile on the basis of output signals transmitted from the detection element, and which detects, using the profile, a defect included in the sample. The arithmetic device detects the defect on the basis of threshold setting corresponding to the visual field positions of the transmission X-ray.

Abstract: The X-ray inspection device includes: an X-ray source with a focal spot size greater than the diameter of a defect for irradiating a sample with X-rays; an X-ray TDI detector arranged near the sample and having long pixels in a direction parallel to the scanning direction of the sample for detecting the X-rays emitted by the X-ray source and passing through the sample as an X-ray transmission image; and a defect-detecting unit for detecting defects based on the X-ray transmission image detected by the X-ray TDI detector.

Abstract: The present invention provides a device for detecting foreign matter and a method for detecting foreign matter to detect a foreign matter on a surface of an object such as a film of an electrode mixture etc. or a foreign matter contained in the object, thereby to improve the reliability of the object. By irradiating an object with a terahertz illumination light 100 (wavelength of 4 ?m to 10 mm) and detecting a scattered light 660 from an electrode 10 as an example of the object by a scattered light detector 200, a foreign matter on a surface of the electrode 10 or contained in the electrode 10, for example, a metal foreign matter 720, is detected. The electrode 10 is one in which electrode mixture layers 700 each including an active material 701, conductive additive and a binder as components are coated on both surfaces of a collector 710. The scattered light 660 results from a part of a transmitted light 656 reflected by the metal foreign matter 720.

Abstract: The X-ray inspection device includes: an X-ray source with a focal spot size greater than the diameter of a defect for irradiating a sample with X-rays; an X-ray TDI detector arranged near the sample and having long pixels in a direction parallel to the scanning direction of the sample for detecting the X-rays emitted by the X-ray source and passing through the sample as an X-ray transmission image; and a defect-detecting unit for detecting defects based on the X-ray transmission image detected by the X-ray TDI detector.

Abstract: In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector.

Abstract: The present invention provides a device for detecting foreign matter and a method for detecting foreign matter to detect a foreign matter on a surface of an object such as a film of an electrode mixture etc. or a foreign matter contained in the object, thereby to improve the reliability of the object. By irradiating an object with a terahertz illumination light 100 (wavelength of 4 ?m to 10 mm) and detecting a scattered light 660 from an electrode 10 as an example of the object by a scattered light detector 200, a foreign matter on a surface of the electrode 10 or contained in the electrode 10, for example, a metal foreign matter 720, is detected. The electrode 10 is one in which electrode mixture layers 700 each including an active material 701, conductive additive and a binder as components are coated on both surfaces of a collector 710. The scattered light 660 results from a part of a transmitted light 656 reflected by the metal foreign matter 720.

Abstract: The present invention provides a charged particle beam device in which signal electrons (14) are generated from a sample when the sample (11) is irradiated with a primary charged particle beam (3), and then enter different positions of a position-sensitive signal detector (16) in accordance with energy of the signal electrons (14), whereby an energy distribution image of the signal electrons generated from the sample is acquired. Accordingly, it becomes possible to discriminate and select signal electrons having arbitrary energy to thereby obtain an image to which information specific to the arbitrary energy is reflected, and to acquire various characteristic information of the sample.

Abstract: In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector.

Abstract: The present invention provides a charged particle beam device in which signal electrons (14) are generated from a sample when the sample (11) is irradiated with a primary charged particle beam (3), and then enter different positions of a position-sensitive signal detector (16) in accordance with energy of the signal electrons (14), whereby an energy distribution image of the signal electrons generated from the sample is acquired. Accordingly, it becomes possible to discriminate and select signal electrons having arbitrary energy to thereby obtain an image to which information specific to the arbitrary energy is reflected, and to acquire various characteristic information of the sample.

Abstract: An object of the present invention is to provide a scanning electron microscope including decelerating-electric-field forming means for decreasing the energy of a beam of electrons reaching a sample, and being capable of selectively detecting BSEs with high efficiency. To this end, the scanning electron microscope including the decelerating-electric-field forming means has a detector for detecting electrons. The detector includes a part for receiving the electrons at a position which is positioned outside trajectories of SEs accelerated by the decelerating-electric-field forming means, and which is further away from the optical axis of the beam of electrons than the trajectories of the SEs.

Abstract: An object of the present invention is to provide a scanning electron microscope including decelerating-electric-field forming means for decreasing the energy of a beam of electrons reaching a sample, and being capable of selectively detecting BSEs with high efficiency. To this end, the scanning electron microscope including the decelerating-electric-field forming means has a detector for detecting electrons. The detector includes a part for receiving the electrons at a position which is positioned outside trajectories of SEs accelerated by the decelerating-electric-field forming means, and which is further away from the optical axis of the beam of electrons than the trajectories of the SEs.

Abstract: The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.

Abstract: The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.

Abstract: A non-destructive inspection apparatus has a radiation source, a radiation detector, a radiation source diver, a detector driver, a drive controller, a delay circuit, a radiation signal processing circuit, a memory, a computer, a display device, and an input device. The radiation detector consists of one-dimensional or two-dimensional array of detectors having a long collimator whose pores are in parallel with the radiation angle of the radiation emitted in an angular pattern from the radiation source, whereby a transmission image of a large size structure can be obtained at high speed and with a high resolution. Furthermore, the detect position in an inspection object can be specified by analyzing a plurality of specified transmission images using the inspection apparatus.

Abstract: A non-destructive inspection apparatus has a radiation source, a radiation detector, a radiation source diver, a detector driver, a drive controller, a delay circuit, a radiation signal processing circuit, a memory, a computer, a display device, and an input device. The radiation detector consists of one-dimensional or two-dimensional array of detectors having a long collimator whose pores are in parallel with the radiation angle of the radiation emitted in an angular pattern from the radiation source, whereby a transmission image of a large size structure can be obtained at high speed and with a high resolution. Furthermore, the detect position in an inspection object can be specified by analyzing a plurality of specified transmission images using the inspection apparatus.

Abstract: A non-destructive inspection apparatus has a radiation source, a radiation detector, a radiation source diver, a detector driver, a drive controller, a delay circuit, a radiation signal processing circuit, a memory, a computer, a display device, and an input device. The radiation detector consists of one-dimensional or two-dimensional array of detectors having a long collimator whose pores are in parallel with the radiation angle of the radiation emitted in an angular pattern from the radiation source, whereby a transmission image of a large size structure can be obtained at high speed and with a high resolution. Furthermore, the detect position in an inspection object can be specified by analyzing a plurality of specified transmission images using the inspection apparatus.

Abstract: A water chemistry factor which is specific to a specific portion of a primary cooling system and universal is decided to be a standard target. The concentration of an agent for mitigating corrosion damage of structural material of the primary cooling system is controlled so that the target will be in a desirable range. All sensor groups provided in the primary cooling system are separated into sensor groups in different lines, of which a specific sensor group are connected to an arithmetic unit and a data base and are for always monitoring a plant process. For example, concentration distribution agreed with measured value oxidation component in the reactor water at the measurement points is selected from the data base, and it is used to estimate the standard target.