Patents by Inventor Yasuko Hari

Yasuko Hari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering cathode, sputtering apparatus provided with sputtering cathode, film-forming method, and method for manufacturing electronic device
    Patent number: 8137519
    Abstract: The present invention provides a sputtering cathode whereby it is possible to increase the degree of freedom to adjust a distance between a target and a magnet unit. A sputtering cathode in accordance with one embodiment of the present invention includes a plurality of magnet units arranged at positions opposite to the rear surface of the target and a distance adjusting mechanism for separately adjusting a distance between the target and a magnet unit for each magnet unit. In addition, the sputtering cathode includes a reciprocating movement mechanism for reciprocating a plurality of magnet units in parallel to the rear surface of the target. The plurality of magnet units, the distance adjusting mechanism and the reciprocating movement mechanism may be housed in a magnet chamber that can be evacuated.
    Type: Grant
    Filed: March 4, 2009
    Date of Patent: March 20, 2012
    Assignee: Canon Anelva Corporation
    Inventors: Katsunori Itagaki, Tomoo Uchiyama, Yasuko Hari, Hiroaki Saito, Toshinobu Chiba
  • SPUTTERING CATHODE, SPUTTERING APPARATUS PROVIDED WITH SPUTTERING CATHODE, FILM-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
    Publication number: 20090229970
    Abstract: The present invention provides a sputtering cathode whereby it is possible to increase the degree of freedom to adjust a distance between a target and a magnet unit. A sputtering cathode in accordance with one embodiment of the present invention includes a plurality of magnet units arranged at positions opposite to the rear surface of the target and a distance adjusting mechanism for separately adjusting a distance between the target and a magnet unit for each magnet unit. In addition, the sputtering cathode includes a reciprocating movement mechanism for reciprocating a plurality of magnet units in parallel to the rear surface of the target. The plurality of magnet units, the distance adjusting mechanism and the reciprocating movement mechanism may be housed in a magnet chamber that can be evacuated.
    Type: Application
    Filed: March 4, 2009
    Publication date: September 17, 2009
    Applicant: CANON ANELVA CORPORATION
    Inventors: Katsunori Itagaki, Tomoo Uchiyama, Yasuko Hari, Hiroaki Saito, Toshinobu Chiba