Patents by Inventor Yasuko Inui

Yasuko Inui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for reducing monomer content in N-vinyl compound polymers
    Patent number: 7160957
    Abstract: A method for residual monomer diminution by which a residual monomer is speedily removed from an N-vinyl compound polymer or the like without posing a problem such as an increase in ash content; and a process for producing an N-vinyl compound polymer solution or powder which has a regulated pH and is free from a decrease in pH with time. The method comprises adding an organic acid having a boiling point of 140° C. or higher at ordinary pressure to anaqueous solution of an N-vinyl compound polymer. The process comprises adding an organic base to an aqueous N-vinyl compound polymer solution having a pH lower than 7.0 to thereby neutralize the solution and regulate the pH thereof. Those operations are conducted in a reaction vessel in which a gaseous phase is regulated so as to have an oxygen concentration of 5.0% by volume or lower.
    Type: Grant
    Filed: July 8, 2003
    Date of Patent: January 9, 2007
    Assignee: Dai-Ichi Kogyo Seiyaku Co., Ltd.
    Inventors: Toshiaki Kuriyama, Yasuko Inui
  • Process for reducing monomer content in N-vinyl compound polymers
    Publication number: 20040097665
    Abstract: A method for residual monomer diminution by which a residual monomer is speedily removed from an N-vinyl compound polymer or the like without posing a problem such as an increase in ash content; and a process for producing an N-vinyl compound polymer solution or powder which has a regulated pH and is free from a decrease in pH with time.
    Type: Application
    Filed: July 8, 2003
    Publication date: May 20, 2004
    Applicants: NIPPON SHOKUBAI CO., LTD., DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Toshiaki Kuriyama, Yasuko Inui
  • Process for reducing monomer content in N-vinyl compound polymers
    Patent number: 6617420
    Abstract: A method for residual monomer diminution by which a residual monomer is speedily removed from an N-vinyl compound polymer or the like without posing a problem such as an increase in ash content; and a process for producing an N-vinyl compound polymer solution or powder which has a regulated pH and is free from a decrease in pH with time. The method comprises adding an organic acid having a boiling point of 140° C. or higher at ordinary pressure to an aqueous solution of an N-vinyl compound polymer. The process comprises adding an organic base to an aqueous N-vinyl compound polymer solution having a pH lower than 7.0 to thereby neutralize the solution and regulate the pH thereof. Those operations are conducted in a reaction vessel in which a gaseous phase is regulated so as to have an oxygen concentration of 5.0% by volume or lower.
    Type: Grant
    Filed: August 3, 2001
    Date of Patent: September 9, 2003
    Assignees: Nippon Shokubai Co., Ltd., Dai-Ichi Kogyo Seiyaku Co., Ltd.
    Inventors: Toshiaki Kuriyama, Yasuko Inui
  • Process for producing N-vinyl compound polymer
    Publication number: 20020022699
    Abstract: A method for residual monomer diminution by which a residual monomer is speedily removed from an N-vinyl compound polymer or the like without posing a problem such as an increase in ash content; and a process for producing an N-vinyl compound polymer solution or powder which has a regulated pH and is free from a decrease in pH with time.
    Type: Application
    Filed: August 3, 2001
    Publication date: February 21, 2002
    Applicant: NIPPON SHOKUBAI CO., LTD.
    Inventors: Toshiaki Kuriyama, Yasuko Inui