Abstract: The present invention provides a protein having pentosidine oxidase activity, a method for measuring pentosidine comprising: contacting the protein with a specimen; and detecting a change caused by the contact, and the like.

Abstract: A drawing data inputting/interpreting section of a data processing device reads in hierarchical structured drawing data from a first memory device and stores interpreted drawing data information extracted as graphic information in a second memory device. A data analysis section reads in the interpreted drawing data information, analyzes information necessary for a drawing step, and stores the same as drawing analysis results in the second memory device. In addition, a data conversion section reads in the interpreted drawing data information, and after a format conversion to inspection data, stores the converted inspection data in the second memory device. Thereby, a drawing data analysis step and an inspecting data conversion step can be carried out in parallel.

Abstract: The reticle fabrication system of the present invention includes a first preparatory processor, a second preparatory processor, a comparison/determination unit, a first converter, and a second converter. The first preparatory processor performs preparatory processing for converting CAD data to plotting data, and the second preparatory processor carries out preparatory processing for converting the CAD data to inspection data. The comparison/determination unit compares the content of the preparatory processing of the first preparatory processor and the content of the preparatory processing of the second preparatory processor, and upon determining, based on the results of comparison, that the preparatory processing has been carried out correctly, permits the actual conversion of the CAD data. When the conversion of CAD data has been permitted, the first converter converts the CAD data to plotting data, and the second converter converts the CAD data to inspection data.

Abstract: A program defect condition is input to a defect-data programming apparatus which programs defect data for evaluation of a reticle inspection apparatus, thereby generating program defect information, program-defect-information-free source CAD data is converted to CAD data of a format with which the CAD data is input to the reticle inspection apparatus, and the program defect information is embedded into the converted CAD data, thereby generating program-defect-information-present CAD data for inspection apparatus. The program-defect-information-present CAD data for inspection apparatus is input to the reticle inspection apparatus together with a program-defect-information-free reticle produced based on the program-defect-information-free source CAD data, for execution of sensitivity evaluation. Program defect information needed to execute sensitivity evaluation of the reticle inspection apparatus is generated on that CAD data which is input to the reticle inspection apparatus, not on a real reticle.

Abstract: An assistance device of workpiece inspection apparatus embodying this invention includes a regional image data conversion unit which inputs region data indicative of a specified region of a workpiece being tested with a pattern formed thereon, and then converts the data to regional image data. The device also includes a data distribution processing unit which distributes the regional image data for output to the workpiece inspection apparatus in conformity with an inspection processing speed of the external workpiece inspection apparatus, which performs pattern defect inspection while comparing optical image data of the workpiece to prespecified reference image data.

Abstract: A pattern inspection apparatus capable of finding temporary emphatic portions in the process of transfer-and-development simulation of the image of a workpiece being tested is disclosed. This apparatus includes a first storage unit for retaining therein the pattern of an image captured from a workpiece under testing, a simulator for applying transfer/development simulation to the captured image pattern, and a second storage unit for storing the pattern of an image which is being presently simulated during the transfer/development simulation of the originally captured image pattern. A comparison processor handles as a pattern to be tested a pattern of the presently simulated or “midstream” image of the captured image while using a pattern to be compared as a fiducial pattern and compares the to-be-tested image to the fiducial pattern. A pattern inspection method is also disclosed.

Abstract: An assistance device of workpiece inspection apparatus embodying this invention includes a regional image data conversion unit which inputs region data indicative of a specified region of a workpiece being tested with a pattern formed thereon, and then converts the data to regional image data. The device also includes a data distribution processing unit which distributes the regional image data for output to the workpiece inspection apparatus in conformity with an inspection processing speed of the external workpiece inspection apparatus, which performs pattern defect inspection while comparing optical image data of the workpiece to prespecified reference image data.

Abstract: The non-destructive inspection method, wherein the non-destructive inspection method supplies currents to a conductive inspection subject and evaluates the rear surface flaw and the embedded flaw of these the inspection subject, or the material characteristic using a DC electric potential method, and an inspection sensitivity to the rear surface flaw, the embedded flaw, or the material characteristic is increased by changing the electric resistivity distribution inside the inspection subject by locally heating a front surface of the inspection subject, thereby increasing an electric resistivity of the front surface of the inspection subject compared with an electric resistivity of the rear surface thereof, resulting in increasing currents supplied on a rear surface side compared with a case without the front surface being heated.

Abstract: The reticle fabrication system of the present invention includes a first preparatory processor, a second preparatory processor, a comparison/determination unit, a first converter, and a second converter. The first preparatory processor performs preparatory processing for converting CAD data to plotting data, and the second preparatory processor carries out preparatory processing for converting the CAD data to inspection data. The comparison/determination unit compares the content of the preparatory processing of the first preparatory processor and the content of the preparatory processing of the second preparatory processor, and upon determining, based on the results of comparison, that the preparatory processing has been carried out correctly, permits the actual conversion of the CAD data. When the conversion of CAD data has been permitted, the first converter converts the CAD data to plotting data, and the second converter converts the CAD data to inspection data.

Abstract: A drawing data inputting/interpreting section of a data processing device reads in hierarchical structured drawing data from a first memory device and stores interpreted drawing data information extracted as graphic information in a second memory device. A data analysis section reads in the interpreted drawing data information, analyzes information necessary for a drawing step, and stores the same as drawing analysis results in the second memory device. In addition, a data conversion section reads in the interpreted drawing data information, and after a format conversion to inspection data, stores the converted inspection data in the second memory device. Thereby, a drawing data analysis step and an inspecting data conversion step can be carried out in parallel.

Abstract: The non-destructive inspection method, wherein the non-destructive inspection method supplies currents to a conductive inspection subject and evaluates the rear surface flaw and the embedded flaw of these the inspection subject, or the material characteristic using a DC electric potential method, and an inspection sensitivity to the rear surface flaw, the embedded flaw, or the material characteristic is increased by changing the electric resistivity distribution inside the inspection subject by locally heating a front surface of the inspection subject, thereby increasing an electric resistivity of the front surface of the inspection subject compared with an electric resistivity of the rear surface thereof, resulting in increasing currents supplied on a rear surface side compared with a case without the front surface being heated.

Abstract: A program defect condition is input to a defect-data programming apparatus which programs defect data for evaluation of a reticle inspection apparatus, thereby generating program defect information, program-defect-information-free source CAD data is converted to CAD data of a format with which the CAD data is input to the reticle inspection apparatus, and the program defect information is embedded into the converted CAD data, thereby generating program-defect-information-present CAD data for inspection apparatus. The program-defect-information-present CAD data for inspection apparatus is input to the reticle inspection apparatus together with a program-defect-information-free reticle produced based on the program-defect-information-free source CAD data, for execution of sensitivity evaluation. Program defect information needed to execute sensitivity evaluation of the reticle inspection apparatus is generated on that CAD data which is input to the reticle inspection apparatus, not on a real reticle.

Abstract: Semiconductor nanoparticles, having a poly(alkylene glycol) residue attached to the surface of semiconductor crystals, exhibit hydrophilicity, a non-specific adsorbing property to biosubstances, and absorption and luminescence characteristics controlled by aquantum effect of the semiconductor crystals.