Abstract: A projection exposure apparatus has a substrate table on which a substrate is mounted that can be moved holding the substrate, a position measuring system that measures positional information of the substrate table, and a correction unit that corrects positional deviation occurring in at least either the substrate or the substrate table due to supply of a liquid. In this case, the correction unit corrects the positional deviation occurring in at least either the substrate or the substrate table due to the supply of the liquid. Accordingly, exposure with high precision using a liquid immersion method is performed on the substrate.

Abstract: A projection exposure apparatus (100) has a substrate table (30) on which a substrate (W) is mounted that can be moved holding the substrate, a position measuring system (18 and others) that measures positional information of the substrate table, and a correction unit (19) that corrects positional deviation occurring in at least either the substrate or the substrate table due to supply of a liquid. In this case, the correction unit corrects the positional deviation occurring in at least either the substrate or the substrate table due to the supply of the liquid. Accordingly, exposure with high precision using a liquid immersion method is performed on the substrate.

Abstract: A projection exposure apparatus (100) has a substrate table (30) on which a substrate (W) is mounted that can be moved holding the substrate, a position measuring system (18 and others) that measures positional information of the substrate table, and a correction unit (19) that corrects positional deviation occurring in at least either the substrate or the substrate table due to supply of a liquid. In this case, the correction unit corrects the positional deviation occurring in at least either the substrate or the substrate table due to the supply of the liquid. Accordingly, exposure with high precision using a liquid immersion method is performed on the substrate.

Abstract: An exposure apparatus that exposes a pattern of a mask onto a substrate is provided with a projection system that projects the pattern onto a substrate, a holder that holds the projection system, a detector that detects information concerning displacement (e.g., oscillation) of the projection system, an actuator that is arranged in the holder, and a driver that drives the actuator corresponding to the detection results of the detector. Therefore, when, for example, displacement caused by vibration is generated in the holder of the projection system, the detector detects information concerning this displacement and outputs this information to the driver. By driving the actuator with the driver, the actuator controls displacement generated in the holder by canceling the detected displacement. This improves positioning accuracy and pattern projection accuracy of the exposure apparatus by controlling displacement caused by oscillation generated in the projection system.