Abstract: An acoustic wave device includes a piezoelectric substrate and an IDT electrode including an electrode material layer including a base metal element A and an additive B. A compound represented by AxBy is included in a region where a concentration of the additive B is about 50 at % or less in a binary phase diagram of the base element A and the additive B, where x and y are any positive numbers. In the binary phase diagram, Ta<Tc and Tb?Ta<300° C., where Ta is a melting point of the base element A, Tb is a melting point of the additive B, and Tc is a melting point of the compound AxBy. The compound AxBy segregates in the base element A and grain sizes of the base element A and of the compound AxBy are about 10 nm or more and about 100 nm or less.

Abstract: An acoustic wave device includes a piezoelectric substrate and an interdigital transducer electrode on the piezoelectric substrate. The interdigital transducer electrode includes a layer including an electrode material including a base element A and an additive B, where a metal element serving as the base element is denoted by A, and an element serving as the additive is denoted by B. The base element A and the additive B are two types of elements that do not form a compound in a binary phase diagram. The additive B is granularly dispersed in the base element A in the electrode material.

Abstract: A semiconductor device includes a planar gate structure including a gate insulating film and a gate electrode, and a sidewall structure disposed adjacent to a lateral side of the planar gate structure. The sidewall structure includes a first insulating film and a second insulating film, and a charge storage film disposed between the first insulating film and the second insulating film. The first insulating film is adjacent to the planar gate structure. A ratio between a gate length L of the planar gate structure and a width WS of the sidewall structure is less than or equal to 300/75. Thereby, a semiconductor device having an improved data read and write reliability in a memory structure can be provided.

Abstract: An acoustic wave device includes a piezoelectric substrate and an IDT electrode including an adhesive layer on the piezoelectric substrate, and an electrode layer on the adhesive layer. The electrode layer and the adhesive layer each include a metal element as a main material, and an additive. The additive in the electrode layer and the additive in the adhesive layer are of the same element.

Abstract: A semiconductor device includes: a semiconductor layer having a main surface; a first conductive type well region formed on a surface portion of the main surface of the semiconductor layer; a second conductive type source region formed on a surface portion of the well region; a second conductive type drain region formed on the surface portion of the well region at an interval from the source region; a planar gate structure formed on the main surface of the semiconductor layer so as to face a first conductive type channel region disposed between the source region and the drain region; and a memory structure disposed adjacent to a lateral side of the planar gate structure, and including an insulating film formed on the channel region and a charge storage film facing the channel region with the insulating film interposed between the charge storage film and the channel region.

Abstract: An acoustic wave device includes a support substrate, a piezoelectric layer on the support substrate, and a functional element on the piezoelectric layer. The support substrate and the piezoelectric layer each have a rectangular or substantially rectangular shape in plan view from a direction normal to the support substrate. At least one corner portion of the piezoelectric layer has a curved shape or a polygonal shape.

Abstract: A semiconductor device includes: a semiconductor layer having a main surface; a first-conduction-type well region formed on a surface portion of the main surface of the semiconductor layer; a second-conduction-type first region formed on a surface portion of the well region; a second-conduction-type second region formed on the surface portion of the well region at an interval from the first region; a first-conduction-type diffusion layer formed on the surface portion of the main surface adjacent to the first region; a planar gate structure formed on the main surface of the semiconductor layer to face a first-conduction-type channel region between the first region and the second region; and a memory structure including a charge storage film arranged adjacent to a lateral side of the planar gate structure on a side of the first region.

Abstract: An acoustic wave device includes a piezoelectric layer and an interdigital transducer disposed on the piezoelectric layer. The interdigital transducer primarily includes Al and includes an additive selected from a group consisting of Nd, Sc, and Ta, and a concentration of the additive in a region opposite to a piezoelectric-layer-side region of the interdigital transducer is higher than a concentration of the additive in the piezoelectric-layer-side region of the interdigital transducer.

Abstract: A semiconductor device includes a semiconductor layer, a source region and a drain region that are formed in the semiconductor layer and at an interval in a first direction, a gate insulating film that is formed such as to cover a channel region between the source region and the drain region, and a gate electrode that is formed on the gate insulating film and opposes the channel region across the gate insulating film. The gate insulating film has a major portion on which the gate electrode is formed and extension portions projecting outward from each of both sides of the major portion in a second direction orthogonal to the first direction and leak current suppressing electrodes are formed on the extension portions.

Abstract: An acoustic wave device includes a piezoelectric substrate and an electrode on the piezoelectric substrate and including first and second layers. The first layer includes Al and Cu. The second layer is on a side opposite to a piezoelectric substrate side of the first layer and includes Al. The first layer includes an Al crystal and at least a portion of CuAl2 crystal grains that are provided in a direction orthogonal or substantially orthogonal to a thickness direction of the piezoelectric substrate. In the electrode, the CuAl2 crystal grains do not extend to the main surface of the second layer on a side opposite to a first layer side.

Abstract: An elastic wave device includes a spacer layer on or above a support substrate and outside a piezoelectric film as seen in a plan view from a thickness direction of the support substrate. A cover layer is disposed on the spacer layer. A through electrode extends through the spacer layer and the cover layer and is electrically connected to the wiring electrode. The wiring electrode includes a first section overlapping the through electrode as seen in the plan view from the thickness direction, a second section overlapping the piezoelectric film as seen in the plan view from the thickness direction, and a step portion defining a step in the thickness direction between the first section and the second section. The spacer layer includes an end portion embedded in the cover layer.

Abstract: A memory cell formed on the surface of a p-well of a semiconductor substrate includes a drain region and a source region that are formed with a channel region therebetween; an insulating film that is formed to cover the channel region; a gate that is formed on the insulating film; sidewall spacers that are formed to be positioned at side surfaces of the gate and directly above the channel region; a salicide block film that is formed to cover a portion of the drain region, a portion of the source regio, the gat, and the sidewall spacers; a drain salicide layer and a source salicide layer that are formed at the salicide block film and on the drain region and the source region exposed from the salicide block film; and a nitride film that is formed to cover the salicide block film, the drain salicide layer, and the source salicide layer.

Abstract: A semiconductor device includes: a semiconductor layer having a main surface; a first conductive type well region formed on a surface portion of the main surface of the semiconductor layer; a second conductive type source region formed on a surface portion of the well region; a second conductive type drain region formed on the surface portion of the well region at an interval from the source region; a planar gate structure formed on the main surface of the semiconductor layer so as to face a first conductive type channel region disposed between the source region and the drain region; and a memory structure disposed adjacent to a lateral side of the planar gate structure, and including an insulating film formed on the channel region and a charge storage film facing the channel region with the insulating film interposed between the charge storage film and the channel region.

Abstract: An electronic component that includes a substrate having a first main surface and a second main surface, an element on the first main surface of the substrate, a first contact electrode electrically connected to the element, an insulating film defining a first opening at a position that has an overlap with the first contact electrode in the plan view of the first main surface, a protective film covering the insulating film in a region including at least a part of the periphery of the first opening, and a first external electrode electrically connected to the first contact electrode and extending over the protective film.

Abstract: An acoustic wave device includes a piezoelectric layer and an interdigital transducer disposed on the piezoelectric layer. The interdigital transducer primarily includes Al and includes an additive selected from a group consisting of Nd, Sc, and Ta, and a concentration of the additive in a region opposite to a piezoelectric-layer-side region of the interdigital transducer is higher than a concentration of the additive in the piezoelectric-layer-side region of the interdigital transducer.

Abstract: An elastic wave device includes a spacer layer on or above a support substrate and outside a piezoelectric film as seen in a plan view from a thickness direction of the support substrate. A cover layer is disposed on the spacer layer. A through electrode extends through the spacer layer and the cover layer and is electrically connected to the wiring electrode. The wiring electrode includes a first section overlapping the through electrode as seen in the plan view from the thickness direction, a second section overlapping the piezoelectric film as seen in the plan view from the thickness direction, and a step portion defining a step in the thickness direction between the first section and the second section. The spacer layer includes an end portion embedded in the cover layer.

Abstract: An electronic component that includes a substrate having a first main surface and a second main surface, an element on the first main surface of the substrate, a first contact electrode electrically connected to the element, an insulating film defining a first opening at a position that has an overlap with the first contact electrode in the plan view of the first main surface, a protective film covering the insulating film in a region including at least a part of the periphery of the first opening, and a first external electrode electrically connected to the first contact electrode and extending over the protective film.