Abstract: In apparatus for successively inspecting an article, for example a telephone cable connector having a plurality of two dimensionally arranged connecting pins, the article is successively conveyed to and mounted on an inspecting table, an image pick-up camera is stepwisely moved for photographing all portions of the connector, and the direction of movement of the camera is alternately reversed.

Abstract: In a system for continuously exposing desired patterns and their backgrounds on the surface of a target, a first electron beam emitted from a first electron gun is converged by condenser lenses and an objective lens to be focused on the surface of the target. A second electron beam emitted from a second electron gun is defocused at the target surface by a condenser lens and a deflecting coil. A deflector selects the first or second electron beams. While the target surface is being scanned with the selected electron beam, the beam is deflected by a scanning deflector. In delineating a pattern, the target surface is scanned with the first electron beam. In delineating a background, on the other hand, the target surface is scanned with the second electron beam.

Abstract: A laser-beam, pattern drawing/inspecting apparatus comprises a reciprocating stage for supporting a printed substrate having an etchant-resistant resist layer coated on it, a laser-beam scanning device having a laser for selectively emitting a first laser beam and a second laser beam less intense than the first laser beam, and an optical system for guiding the first and second laser beams to the printed substrate along the same optical path, the first laser beam scanning the resist layer to draw a pattern thereon, and the second laser beam scanning the resist layer, and a pattern inspection device for receiving the second laser beam reflected from the resist layer, thereby to optically inspect the pattern drawn on the resist layer.

Abstract: A mask inspection arrangement is disclosed including a magnetic disc memory for storing pattern data which has been used for operating a mask drawing apparatus, a data producing device for optically scanning a mask drawn by the mask drawing apparatus and producing measured data indicative thereof, a data converter for converting the pattern data from memory into a reference data in the form of dot pattern data for blanking an electron beam in the mask drawing apparatus, and a comparator for comparing the measured data with the reference data and determining a correlation therebetween.

Abstract: According to the present invention, a simplified process is provided for drawing a picture pattern and an alignment pattern on a substrate at a scaling factor .alpha. by utilizing an energy beam exposure device. According to the invention, a scale conversion of 1/.alpha. is first applied to the alignment mark patterns. The parameters of the exposure device such as beam diameter, beam scanning interval, beam scanning deflection amplitude, frequency division factor, and displacement velocity are altered in accordance with the desired scaling factor .alpha.. The chip pattern data and the altered alignment mark data are then utilized together for drawing the pattern of the substrate without need for re-adjustment during the drawing process.

Abstract: In a control system of an ozonizer system wherein the ozonizer system comprises a plurality of ozonizer modules each consituted by one or more unit ozone generators, and the ozone generated by the ozonizer modules is supplied to one or more ozone utilization devices there are provided computer means responsive to the ozone demand of the ozone utilization devices for determining the quantity of ozone to be generated by the ozonizer modules, and a control device for controlling the operation of the ozonizer modules, especially the power applied thereto in response to the ozone quantity determined by the computer means.