Patents by Inventor Yasunori Doi
Yasunori Doi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9696288Abstract: Provided is a technique to identify a sample substance attached to an inspection target easily and precisely, while improving the rate of operation and reducing the number of persons required for inspection. A trace detecting system includes detection means to detect the size (vertical and horizontal dimensions) of an inspection target, and selects an air nozzle capable of spraying air jet at 15 m/s or more to the surface of the inspection target for air jet spraying.Type: GrantFiled: October 2, 2012Date of Patent: July 4, 2017Assignee: HITACHI, LTD.Inventors: Hideo Kashima, Masakazu Sugaya, Koichi Terada, Yasunori Doi, Yasutaka Suzuki, Hisashi Nagano, Yuichiro Hashimoto, Yasuaki Takada
-
Patent number: 9679106Abstract: A medical information display apparatus according to an embodiment includes: a displaying unit which displays medical information; a study information acquiring part which acquires study information; a to-be-started-app determining part which determines a starting-target application group from the study information acquired by the study information acquiring part; and a controlling unit which displays, on the displaying unit, a plurality of pieces of medical information created respectively by applications in the start target application group determined by the to-be-started-app determining part.Type: GrantFiled: February 26, 2015Date of Patent: June 13, 2017Assignee: Toshiba Medical Systems CorporationInventors: Yosuke Yanagida, Hiromasa Yamagishi, Yasunori Doi
-
Patent number: 9214324Abstract: Provided is a technique of analyzing particles in real time while collecting and condensing the particles continuously. Gas and/or particles as a detection target substance that are attached to an authentication target 2 are removed by air flow from a blowing region 5. The removed sample is sucked and is condensed and sampled at a sampling region 10, and ions of the sample are generated at an ion source 21 and are then subjected to mass analysis at a mass analysis region 23. Determination of the obtained mass spectrum is made as to the presence or not of a mass spectrum derived from the detection target substance, and a monitor 27 displays a result thereof. Thereby, the detection target substance attached to the authentication target 2 can be detected continuously in real time, promptly and with a less error rate.Type: GrantFiled: May 5, 2015Date of Patent: December 15, 2015Assignee: HITACHI, LTD.Inventors: Hisashi Nagano, Yasutaka Iida, Hideo Kashima, Yuichiro Hashimoto, Masuyuki Sugiyama, Masakazu Sugaya, Yasunori Doi, Koichi Terada
-
Publication number: 20150243065Abstract: A medical information display apparatus according to an embodiment includes: a displaying unit which displays medical information; a study information acquiring part which acquires study information; a to-be-started-app determining part which determines a starting-target application group from the study information acquired by the study information acquiring part; and a controlling unit which displays, on the displaying unit, a plurality of pieces of medical information created respectively by applications in the start target application group determined by the to-be-started-app determining part.Type: ApplicationFiled: February 26, 2015Publication date: August 27, 2015Applicants: Kabushiki Kaisha Toshiba, Toshiba Medical Systems CorporationInventors: Yosuke YANAGIDA, Hiromasa Yamagishi, Yasunori Doi
-
Publication number: 20150235831Abstract: Provided is a technique of analyzing particles in real time while collecting and condensing the particles continuously. Gas and/or particles as a detection target substance that are attached to an authentication target 2 are removed by air flow from a blowing region 5. The removed sample is sucked and is condensed and sampled at a sampling region 10, and ions of the sample are generated at an ion source 21 and are then subjected to mass analysis at a mass analysis region 23. Determination of the obtained mass spectrum is made as to the presence or not of a mass spectrum derived from the detection target substance, and a monitor 27 displays a result thereof. Thereby, the detection target substance attached to the authentication target 2 can be detected continuously in real time, promptly and with a less error rate.Type: ApplicationFiled: May 5, 2015Publication date: August 20, 2015Applicant: HITACHI, LTD.Inventors: Hisashi Nagano, Yasutaka Suzuki, Hideo Kashima, Yuichiro Hashimoto, Masuyuki Sugiyama, Masakazu Sugaya, Yasunori Doi, Koichi Terada
-
Patent number: 9040905Abstract: Provided is a technique of analyzing particles in real time while collecting and condensing the particles continuously. Gas and/or particles as a detection target substance that are attached to an authentication target 2 are removed by air flow from a blowing region 5. The removed sample is sucked and is condensed and sampled at a sampling region 10, and ions of the sample are generated at an ion source 21 and are then subjected to mass analysis at a mass analysis region 23. Determination of the obtained mass spectrum is made as to the presence or not of a mass spectrum derived from the detection target substance, and a monitor 27 displays a result thereof. Thereby, the detection target substance attached to the authentication target 2 can be detected continuously in real time, promptly and with a less error rate.Type: GrantFiled: November 8, 2011Date of Patent: May 26, 2015Assignee: HITACHI, LTD.Inventors: Hisashi Nagano, Yasutaka Suzuki, Hideo Kashima, Yuichiro Hashimoto, Masuyuki Sugiyama, Masakazu Sugaya, Yasunori Doi, Koichi Terada
-
Publication number: 20140238106Abstract: Provided is a technique to identify a sample substance attached to an inspection target easily and precisely, while improving the rate of operation and reducing the number of persons required for inspection. A trace detecting system includes detection means to detect the size (vertical and horizontal dimensions) of an inspection target, and selects an air nozzle capable of spraying air jet at 15 m/s or more to the surface of the inspection target for air jet spraying.Type: ApplicationFiled: October 2, 2012Publication date: August 28, 2014Inventors: Hideo Kashima, Masakazu Sugaya, Koichi Terada, Yasunori Doi, Yasutaka Suzuki, Hisashi Nagano, Yuichiro Hashimoto, Yasuaki Takada
-
Publication number: 20140151543Abstract: Provided is a technique of analyzing particles in real time while collecting and condensing the particles continuously. Gas and/or particles as a detection target substance that are attached to an authentication target 2 are removed by air flow from a blowing region 5. The removed sample is sucked and is condensed and sampled at a sampling region 10, and ions of the sample are generated at an ion source 21 and are then subjected to mass analysis at a mass analysis region 23. Determination of the obtained mass spectrum is made as to the presence or not of a mass spectrum derived from the detection target substance, and a monitor 27 displays a result thereof. Thereby, the detection target substance attached to the authentication target 2 can be detected continuously in real time, promptly and with a less error rate.Type: ApplicationFiled: November 8, 2011Publication date: June 5, 2014Applicant: HITACHI, LTD.Inventors: Hisashi Nagano, Yasutaka Suzuki, Hideo Kashima, Yuichiro Hashimoto, Masuyuki Sugiyama, Masakazu Sugaya, Yasunori Doi, Koichi Terada
-
Patent number: 8569719Abstract: A focused ion beam apparatus, including: a sample holder provided with a fixing surface for fixing, via a deposition film, a micro-specimen extracted from a specimen using a method for fabrication by a focused ion beam, in which a width of the fixing surface is smaller than 50 microns; a specimen transferring unit having a probe to which the specimen can be joined through the deposition film, and transferring the micro-specimen extracted from the specimen by the focused ion-beam fabrication method, to the sample holder; and a sample chamber in which the sample, the sample holder and the probe are laid out, wherein, in the sample chamber, the micro-specimen extracted from the specimen by the focused ion-beam fabrication method is fixed to the fixing surface of the sample holder through the deposition film, and the micro-specimen fixed to the fixing surface is fabricated by irradiating the focused ion beam.Type: GrantFiled: December 15, 2011Date of Patent: October 29, 2013Assignee: Hitachi, Ltd.Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Patent number: 8405053Abstract: A focused ion beam apparatus, including: a specimen transferring unit having a probe to which a micro-specimen extracted from a specimen, can be joined through a joining deposition film, for transferring the micro-specimen to a sample holder; and wherein, the specimen transferring unit holds the probe which is joined through the joining deposition film to the micro-specimen extracted from the specimen, and the sample stage moves so that the sample holder mounted on the holder clasp is provided into an irradiated range of the focused ion beam, and the specimen transferring unit approaches the probe to the sample holder, and the gas nozzle supplies the deposition gas so that the micro-specimen is fixed to the sample holder through a fixing deposition film, and the ion beam irradiating optical system irradiates the focused ion beam to the micro-specimen fixed to the sample holder for various procedures.Type: GrantFiled: February 14, 2011Date of Patent: March 26, 2013Assignee: Hitachi, Ltd.Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Publication number: 20120085924Abstract: A focused ion beam apparatus, including: a sample holder provided with a fixing surface for fixing, via a deposition film, a micro-specimen extracted from a specimen using a method for fabrication by a focused ion beam, in which a width of the fixing surface is smaller than 50 microns; a specimen transferring unit having a probe to which the specimen can be joined through the deposition film, and transferring the micro-specimen extracted from the specimen by the focused ion-beam fabrication method, to the sample holder; and a sample chamber in which the sample, the sample holder and the probe are laid out, wherein, in the sample chamber, the micro-specimen extracted from the specimen by the focused ion-beam fabrication method is fixed to the fixing surface of the sample holder through the deposition film, and the micro-specimen fixed to the fixing surface is fabricated by irradiating the focused ion beam.Type: ApplicationFiled: December 15, 2011Publication date: April 12, 2012Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Patent number: 7999240Abstract: A system for analyzing a semiconductor device, including: a first ion beam apparatus including: a sample stage to mount a sample substrate; a vacuum chamber in which the sample stage is placed; an ion beam irradiating optical system to irradiate the sample substrate; a specimen holder that accommodates a plurality of specimens separated from the sample substrate by the irradiation of the ion beam; and a probe to extract the separated specimen from the sample substrate, and to transfer the separated specimen to the specimen holder; a second ion beam apparatus that carries out a finishing process to the specimen; and an analyzer to analyze the finished specimen, wherein the first ion beam apparatus separates the specimen and the probe in a vacuum condition.Type: GrantFiled: July 7, 2008Date of Patent: August 16, 2011Assignee: Hitachi, Ltd.Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Publication number: 20110140006Abstract: A focused ion beam apparatus, including: a specimen transferring unit having a probe to which a micro-specimen extracted from a specimen, can be joined through a joining deposition film, for transferring the micro-specimen to a sample holder; and wherein, the specimen transferring unit holds the probe which is joined through the joining deposition film to the micro-specimen extracted from the specimen, and the sample stage moves so that the sample holder mounted on the holder clasp is provided into an irradiated range of the focused ion beam, and the specimen transferring unit approaches the probe to the sample holder, and the gas nozzle supplies the deposition gas so that the micro-specimen is fixed to the sample holder through a fixing deposition film, and the ion beam irradiating optical system irradiates the focused ion beam to the micro-specimen fixed to the sample holder for various procedures.Type: ApplicationFiled: February 14, 2011Publication date: June 16, 2011Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Patent number: 7791050Abstract: A specimen fabrication apparatus, including: an ion beam irradiating optical system to irradiate a sample placed in a chamber, with an ion beam; a specimen holder to mount a specimen separated by the irradiation with the ion beam; a holder cassette to hold the specimen holder; a sample stage to hold the sample and the holder cassette; and a probe to move the specimen to the specimen holder, wherein the holder cassette is transferred to outside of the chamber in a condition of holding the specimen holder with the specimen mounted.Type: GrantFiled: July 7, 2008Date of Patent: September 7, 2010Assignee: Hitachi, Ltd.Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Patent number: 7525108Abstract: A specimen fabrication apparatus including: a sample stage to mount or hold a sample substrate, an ion beam irradiating optical system to irradiate the sample substrate with an ion beam, a specimen holder to mount a specimen obtained from the sample substrate, a transferring means including a probe, and a deposition-gas supplying source to supply a deposition-gas for forming a deposition-film between the specimen and the probe.Type: GrantFiled: February 2, 2007Date of Patent: April 28, 2009Assignee: Hitachi, Ltd.Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Publication number: 20090008578Abstract: A specimen fabrication apparatus, including: an ion beam irradiating optical system to irradiate a sample placed in a chamber, with an ion beam; a specimen holder to mount a specimen separated by the irradiation with the ion beam; a holder cassette to hold the specimen holder; a sample stage to hold the sample and the holder cassette; and a probe to move the specimen to the specimen holder, wherein the holder cassette is transferred to outside of the chamber in a condition of holding the specimen holder with the specimen mounted.Type: ApplicationFiled: July 7, 2008Publication date: January 8, 2009Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Publication number: 20080296497Abstract: A system for analyzing a semiconductor device, including: a first ion beam apparatus including: a sample stage to mount a sample substrate; a vacuum chamber in which the sample stage is placed; an ion beam irradiating optical system to irradiate the sample substrate; a specimen holder that accommodates a plurality of specimens separated from the sample substrate by the irradiation of the ion beam; and a probe to extract the separated specimen from the sample substrate, and to transfer the separated specimen to the specimen holder; a second ion beam apparatus that carries out a finishing process to the specimen; and an analyzer to analyze the finished specimen, wherein the first ion beam apparatus separates the specimen and the probe in a vacuum condition.Type: ApplicationFiled: July 7, 2008Publication date: December 4, 2008Inventors: Satoshi TOMIMATSU, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Publication number: 20080296516Abstract: A specimen fabrication apparatus, including: an ion beam irradiating optical system to irradiate a sample placed in a chamber with an ion beam; a specimen holder to mount a specimen separated by the irradiation with the ion beam; a holder cassette to hold the specimen holder; a sample stage to hold, the sample and the holder cassette; and a probe to move the specimen to the specimen holder, wherein the holder cassette is transferred to outside of the chamber in a condition of holding the specimen holder with the specimen mounted.Type: ApplicationFiled: July 7, 2008Publication date: December 4, 2008Inventors: Satoshi TOMIMATSU, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Patent number: 7397051Abstract: A specimen fabrication apparatus including: a vacuum chamber that accommodates a sample stage to mount a sample, an irradiating optical system that irradiates a focused ion beam to the sample to form a specimen, and a specimen holder placed in the vacuum chamber, to which said formed specimen is transferred by transferring means while the specimen chamber remains substantially sealed.Type: GrantFiled: February 2, 2007Date of Patent: July 8, 2008Assignee: Hitachi, Ltd.Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
-
Patent number: 7397050Abstract: A specimen fabrication apparatus, including: an ion beam irradiating optical system to irradiate a sample placed in a chamber, with an ion beam, a specimen holder to mount a specimen separated by the irradiation of the ion beam, a holder cassette to hold the specimen holder, and a sample stage to hold the sample and the holder cassette, wherein said holder cassette is transferred to outside of the chamber in a condition of holding said specimen holder with the specimen mounted.Type: GrantFiled: February 2, 2007Date of Patent: July 8, 2008Assignee: Hitachi, Ltd.Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi